Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing
Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing
批准号:
9310403
负责人:
George Collins
金额:
$2.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1993
资助国家:
美国
项目状态:
已结题
起止时间:
1993-09-01 至 1997-02-28
中文摘要
9310403柯林斯:在半导体和集成电路的制造中,材料的等离子体和束流加工的使用是普遍存在的。由于现代设备不断变化的需求,等离子体处理也在不断发展。然而,光电子、磁性和微电子设备的等离子体加工在许多大学的课程中都没有。将开设本科生或研究生选修课“材料加工的等离子体和束流诱导化学”。它将强调基于Plama的加工(蚀刻、沉积、灰化)的基本原理,但在制造应用方面在技术上是最新的。本课程面向即将进入高科技微电子/光电子工作岗位的学生以及实习工程师。向其他大学和工业界传播和部署新课程将通过准备可移动的教学材料进行,包括高质量的讲义讲义、录像讲课,这些都是高度相关的。因此,校园内和偏远地点的学生都可以很容易地听懂这些课程。将通过以下方式改进教学方法:1)将硬拷贝讲义转化为一套基于磁盘的笔记(可以不断更新),2)对录像带进行计算机增强,包括动画、数学运算的图形显示,以及等离子体处理工具和这些过程的结果的数字化视频和照片。将通过国家技术大学通过传统录像带和卫星传输传播全面发展的课程。
英文摘要
9310403 Collins The use of plasma and beam processing of materials is ibiquitous in the manufacture of semiconductors and integrated circuits. Plasma processing is also continuouslu elvolving due to the changing needs of modern devices. Nevertheless, plasma processing of optoelectronic, magnetic, and microelectronic devices is absent from the curricula of many universities. An elective undergraduate or first year graduate coourse, "Plasma and Beam Induced Chemisty for Materials Processing will be developed". It will emphasize the fundamentals of plama based processing (etchinng, deposition, ashing) and yet be technically current with regard to manufacturing applications. The course is intended for students about to enter the high technology micro /optoelectronics workforce as well as for practicing engineers. Dissemination and deployment of the new course to other universities as well as industry will occur via the preparation of transportable instuctional materials including high quality lecture handout, videotaped lectures whih are highly correlated. Hence, students on campus as well as at remote sites can easily follow the lectures. The pedagogy will be improved by 1) transforming the hard copy lecture handoutsss into a set of disk based notes (which can be continually updated), and 2) computer enhancement of the videotaped lctures to include animation, graphial display of mathermatical operations, and digitized video and photographs of plasma processing tools and results from these processes. The fully developed course will be disseminated via conventional videotapes and satellite transmission through the National Technololgy University.
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Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
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批准号:0097061
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项目类别:Standard Grant
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资助金额:$21.0万
-
财政年份:2001
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负责人:George Collins
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依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
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批准号:9712246
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项目类别:Standard Grant
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资助金额:$9.51万
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财政年份:1997
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负责人:George Collins
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依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
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批准号:9720292
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项目类别:Continuing Grant
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资助金额:$31.1万
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财政年份:1997
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负责人:George Collins
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依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
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批准号:9512857
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项目类别:Standard Grant
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资助金额:$2.08万
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财政年份:1996
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负责人:George Collins
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依托单位:
GOALI/IUCRP: Uniform Grain Size Polysilicon for Thin Film Transistors
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批准号:9424399
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项目类别:Continuing Grant
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资助金额:$33.15万
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财政年份:1995
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负责人:George Collins
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依托单位:
Engineering Faculty Internship: Quantifying Plasma Generated Particle and Charge Build Up Damage in Submicron Manufacturing
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批准号:9311697
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项目类别:Standard Grant
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资助金额:$2.5万
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财政年份:1993
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负责人:George Collins
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依托单位:
Electron Beam Curing of Polymer Resists
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批准号:9108531
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项目类别:Continuing Grant
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资助金额:$31.37万
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财政年份:1992
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负责人:George Collins
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依托单位:
Effects of Photons on Gallium Arsenide Epitaxy
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批准号:9108456
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项目类别:Standard Grant
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资助金额:$3.5万
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财政年份:1991
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负责人:George Collins
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依托单位:
U.S Japan Long Term Visit: Photon and Reactive Gas AssistedHeteroepitaxy of III-V and II-VI Optoelectronic Films
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批准号:9007937
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项目类别:Standard Grant
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资助金额:$17.7万
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财政年份:1991
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负责人:George Collins
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依托单位:
Acquisition of a Liquid Cesium Ion Source
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批准号:9004593
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项目类别:Standard Grant
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资助金额:$2.2万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:9000527
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项目类别:Standard Grant
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资助金额:$0.82万
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财政年份:1990
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负责人:George Collins
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依托单位:
Research on Cylindrical Algebraic Computation
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批准号:8913824
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1990
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负责人:George Collins
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依托单位:
U.S.-China Cooperative Research: Cylindrical Magnetron Plasma Modeling and Associated Laser Rate Equations
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批准号:8913426
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项目类别:Standard Grant
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资助金额:$2.38万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:8903088
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项目类别:Standard Grant
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资助金额:$0.56万
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财政年份:1989
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant - Single Wafer Reactor
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批准号:8906311
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项目类别:Standard Grant
-
资助金额:$2.0万
-
财政年份:1989
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负责人:George Collins
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依托单位:
Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)
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批准号:8815051
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项目类别:Continuing Grant
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资助金额:$37.13万
-
财政年份:1989
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负责人:George Collins
-
依托单位:
Hydrogen Assisted Fabrication of Optoelectronic Devices Utilizing GaAs on Si and GaAs on SiO2
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批准号:8806851
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项目类别:Standard Grant
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资助金额:$4.8万
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财政年份:1988
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负责人:George Collins
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依托单位:
Algebraic Algorithms and Systems (Computer Research)
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批准号:8696129
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1986
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负责人:George Collins
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依托单位:
U.S.-Australian Cooperative Research: Electron Beam Pumped Metal Vapor Recombination Lasers at Room Temperature (Elec- trical Engineering)
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批准号:8500540
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项目类别:Standard Grant
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资助金额:$0.64万
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财政年份:1986
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant: Epitaxial Reactor
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批准号:8506506
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项目类别:Standard Grant
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资助金额:$6.8万
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财政年份:1985
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负责人:George Collins
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依托单位:
国内基金
海外基金
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