Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing
Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing
批准号:
9310403
负责人:
George Collins
金额:
$2.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1993
资助国家:
美国
项目状态:
已结题
起止时间:
1993-09-01 至 1997-02-28
中文摘要
9310403柯林斯 材料的等离子体和束处理的使用在半导体和集成电路的制造中是普遍存在的。 等离子体处理也由于现代设备的需求不断变化而不断发展。 然而,许多大学的课程中没有光电、磁和微电子器件的等离子体处理。 将开设一门选修本科生或研究生一年级的课程,“材料加工用等离子体和束流诱导化学”。 它将强调基于等离子体的处理(蚀刻,沉积,灰化)的基本原理,但在技术上与制造应用有关。 该课程是为即将进入高科技微/光电子劳动力以及实践工程师的学生。 通过准备可移动的教学材料,包括高质量的讲义、高度相关的录像讲座,将新课程传播和部署到其他大学和行业。 因此,学生在校园以及在远程站点可以很容易地遵循讲座。 教学方法将通过以下方式得到改进:1)将硬拷贝讲义转换为一套基于磁盘的笔记(可以不断更新),2)计算机增强录像带,包括动画、数学运算的图形显示、等离子体处理工具的数字化视频和照片以及这些过程的结果。 将通过国家技术大学以常规录像带和卫星传送的方式传播已完全拟定的课程。
英文摘要
9310403 Collins The use of plasma and beam processing of materials is ibiquitous in the manufacture of semiconductors and integrated circuits. Plasma processing is also continuouslu elvolving due to the changing needs of modern devices. Nevertheless, plasma processing of optoelectronic, magnetic, and microelectronic devices is absent from the curricula of many universities. An elective undergraduate or first year graduate coourse, "Plasma and Beam Induced Chemisty for Materials Processing will be developed". It will emphasize the fundamentals of plama based processing (etchinng, deposition, ashing) and yet be technically current with regard to manufacturing applications. The course is intended for students about to enter the high technology micro /optoelectronics workforce as well as for practicing engineers. Dissemination and deployment of the new course to other universities as well as industry will occur via the preparation of transportable instuctional materials including high quality lecture handout, videotaped lectures whih are highly correlated. Hence, students on campus as well as at remote sites can easily follow the lectures. The pedagogy will be improved by 1) transforming the hard copy lecture handoutsss into a set of disk based notes (which can be continually updated), and 2) computer enhancement of the videotaped lctures to include animation, graphial display of mathermatical operations, and digitized video and photographs of plasma processing tools and results from these processes. The fully developed course will be disseminated via conventional videotapes and satellite transmission through the National Technololgy University.
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Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
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批准号:0097061
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项目类别:Standard Grant
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资助金额:$21.0万
-
财政年份:2001
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负责人:George Collins
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依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
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批准号:9712246
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项目类别:Standard Grant
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资助金额:$9.51万
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财政年份:1997
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负责人:George Collins
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依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
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批准号:9720292
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项目类别:Continuing Grant
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资助金额:$31.1万
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财政年份:1997
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负责人:George Collins
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依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
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批准号:9512857
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项目类别:Standard Grant
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资助金额:$2.08万
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财政年份:1996
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负责人:George Collins
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依托单位:
GOALI/IUCRP: Uniform Grain Size Polysilicon for Thin Film Transistors
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批准号:9424399
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项目类别:Continuing Grant
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资助金额:$33.15万
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财政年份:1995
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负责人:George Collins
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依托单位:
Engineering Faculty Internship: Quantifying Plasma Generated Particle and Charge Build Up Damage in Submicron Manufacturing
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批准号:9311697
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项目类别:Standard Grant
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资助金额:$2.5万
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财政年份:1993
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负责人:George Collins
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依托单位:
Electron Beam Curing of Polymer Resists
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批准号:9108531
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项目类别:Continuing Grant
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资助金额:$31.37万
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财政年份:1992
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负责人:George Collins
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依托单位:
U.S Japan Long Term Visit: Photon and Reactive Gas AssistedHeteroepitaxy of III-V and II-VI Optoelectronic Films
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批准号:9007937
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项目类别:Standard Grant
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资助金额:$17.7万
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财政年份:1991
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负责人:George Collins
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依托单位:
Effects of Photons on Gallium Arsenide Epitaxy
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批准号:9108456
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项目类别:Standard Grant
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资助金额:$3.5万
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财政年份:1991
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负责人:George Collins
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依托单位:
Acquisition of a Liquid Cesium Ion Source
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批准号:9004593
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项目类别:Standard Grant
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资助金额:$2.2万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:9000527
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项目类别:Standard Grant
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资助金额:$0.82万
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财政年份:1990
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负责人:George Collins
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依托单位:
Research on Cylindrical Algebraic Computation
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批准号:8913824
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1990
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负责人:George Collins
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依托单位:
U.S.-China Cooperative Research: Cylindrical Magnetron Plasma Modeling and Associated Laser Rate Equations
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批准号:8913426
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项目类别:Standard Grant
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资助金额:$2.38万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:8903088
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项目类别:Standard Grant
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资助金额:$0.56万
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财政年份:1989
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant - Single Wafer Reactor
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批准号:8906311
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项目类别:Standard Grant
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资助金额:$2.0万
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财政年份:1989
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负责人:George Collins
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依托单位:
Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)
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批准号:8815051
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项目类别:Continuing Grant
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资助金额:$37.13万
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财政年份:1989
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负责人:George Collins
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依托单位:
Hydrogen Assisted Fabrication of Optoelectronic Devices Utilizing GaAs on Si and GaAs on SiO2
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批准号:8806851
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项目类别:Standard Grant
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资助金额:$4.8万
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财政年份:1988
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负责人:George Collins
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依托单位:
Algebraic Algorithms and Systems (Computer Research)
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批准号:8696129
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1986
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负责人:George Collins
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依托单位:
U.S.-Australian Cooperative Research: Electron Beam Pumped Metal Vapor Recombination Lasers at Room Temperature (Elec- trical Engineering)
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批准号:8500540
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项目类别:Standard Grant
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资助金额:$0.64万
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财政年份:1986
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant: Epitaxial Reactor
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批准号:8506506
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项目类别:Standard Grant
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资助金额:$6.8万
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财政年份:1985
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负责人:George Collins
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依托单位:
国内基金
海外基金
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