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Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing

Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing
工程研究部署教学计划:用于材料加工的等离子体和束诱导化学
批准号:
9310403
负责人:
George Collins
金额:
$2.5万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1993
资助国家:
美国
项目状态:
已结题
起止时间:
1993-09-01 至 1997-02-28

项目摘要

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中文摘要
翻译
在半导体和集成电路的制造中,使用等离子体和光束加工材料是无处不在的。由于现代设备不断变化的需求,等离子体处理也在不断发展。然而,许多大学的课程中缺少光电、磁和微电子器件的等离子体处理。开设本科或研究生一年级的选修课“材料加工中的等离子体和光束诱导化学”。它将强调基于等离子体的处理(蚀刻,沉积,灰化)的基本原理,但在制造应用方面技术上是最新的。本课程面向即将进入高科技微/光电子行业的学生以及实习工程师。新课程的传播和部署将通过编写可运输的教学材料,包括高质量的讲义和高度相关的录像讲座来进行。因此,无论是在校内还是在远程站点的学生都可以很容易地跟上讲座。教学方法将通过以下方式得到改进:1)将讲课讲义的硬拷贝转化为一套基于磁盘的笔记(可以不断更新);2)对讲课录像进行计算机增强,包括动画、数学运算的图形显示,以及等离子处理工具和这些过程的结果的数字化视频和照片。经过充分编制的课程将通过国家技术大学通过传统录像带和卫星传输进行传播。
英文摘要
9310403 Collins The use of plasma and beam processing of materials is ibiquitous in the manufacture of semiconductors and integrated circuits. Plasma processing is also continuouslu elvolving due to the changing needs of modern devices. Nevertheless, plasma processing of optoelectronic, magnetic, and microelectronic devices is absent from the curricula of many universities. An elective undergraduate or first year graduate coourse, "Plasma and Beam Induced Chemisty for Materials Processing will be developed". It will emphasize the fundamentals of plama based processing (etchinng, deposition, ashing) and yet be technically current with regard to manufacturing applications. The course is intended for students about to enter the high technology micro /optoelectronics workforce as well as for practicing engineers. Dissemination and deployment of the new course to other universities as well as industry will occur via the preparation of transportable instuctional materials including high quality lecture handout, videotaped lectures whih are highly correlated. Hence, students on campus as well as at remote sites can easily follow the lectures. The pedagogy will be improved by 1) transforming the hard copy lecture handoutsss into a set of disk based notes (which can be continually updated), and 2) computer enhancement of the videotaped lctures to include animation, graphial display of mathermatical operations, and digitized video and photographs of plasma processing tools and results from these processes. The fully developed course will be disseminated via conventional videotapes and satellite transmission through the National Technololgy University.
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Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
  • 批准号:
    0097061
  • 项目类别:
    Standard Grant
  • 资助金额:
    $21.0万
  • 财政年份:
    2001
  • 负责人:
    George Collins
  • 依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
  • 批准号:
    9712246
  • 项目类别:
    Standard Grant
  • 资助金额:
    $9.51万
  • 财政年份:
    1997
  • 负责人:
    George Collins
  • 依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
  • 批准号:
    9720292
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $31.1万
  • 财政年份:
    1997
  • 负责人:
    George Collins
  • 依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
  • 批准号:
    9512857
  • 项目类别:
    Standard Grant
  • 资助金额:
    $2.08万
  • 财政年份:
    1996
  • 负责人:
    George Collins
  • 依托单位:
国内基金
海外基金
Research on Quantum Field Theory without a Lagrangian Description
  • 批准号:
    24ZR1403900
  • 项目类别:
    省市级项目
  • 资助金额:
    --
  • 批准年份:
    2024
  • 负责人:
    SATOSHI NAWATA
  • 依托单位:
Cell Research
Cell Research
Cell Research (细胞研究)