Engineering Faculty Internship: Quantifying Plasma Generated Particle and Charge Build Up Damage in Submicron Manufacturing
Engineering Faculty Internship: Quantifying Plasma Generated Particle and Charge Build Up Damage in Submicron Manufacturing
批准号:
9311697
负责人:
George Collins
金额:
$2.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1993
资助国家:
美国
项目状态:
已结题
起止时间:
1993-08-15 至 1995-01-31
中文摘要
拟议工作将处理两个相互关联的问题: 不希望的基于等离子体的颗粒产生和产生的等离子体 对底层设备的损坏。 两项研究都强烈建议 影响加工模具的成品率, 等离子体环境的常见问题。 最初的重点将是 在聚合物光致抗蚀剂的等离子体灰化中 在制造周期中,因此可以利用 生产力 通过光学测量的原位等离子体条件 方法将与后处理颗粒分布相关 以及等离子体对器件结构的损伤。 如果成功的结果将允许更高的产量和更大的 提高半导体器件生产的生产率。
英文摘要
The propose work will address two interrelated issues: undesired plasma based particle generation and plasma created damage to underlying devices. Both proposed studies strongly impact the yield of working die in manufacturing and share the common issues of a plasma environment. The initial focus will be in plasma ashing of polymer photoresist which occurs 10 - 15 times in the manufacturing cycle and is therefore leveraged to productivity. In-situ plasma conditions as measured by optical methods will be correlated with post-process particle distributions on wafers as well as plasma damage to device structures. If successful to results will allow higher yields and greater productivity in the production of semiconductor devices.
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会议论文
Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
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批准号:0097061
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项目类别:Standard Grant
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资助金额:$21.0万
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财政年份:2001
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负责人:George Collins
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依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
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批准号:9712246
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项目类别:Standard Grant
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资助金额:$9.51万
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财政年份:1997
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负责人:George Collins
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依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
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批准号:9720292
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项目类别:Continuing Grant
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资助金额:$31.1万
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财政年份:1997
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负责人:George Collins
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依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
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批准号:9512857
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项目类别:Standard Grant
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资助金额:$2.08万
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财政年份:1996
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负责人:George Collins
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依托单位:
GOALI/IUCRP: Uniform Grain Size Polysilicon for Thin Film Transistors
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批准号:9424399
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项目类别:Continuing Grant
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资助金额:$33.15万
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财政年份:1995
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负责人:George Collins
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依托单位:
Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing
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批准号:9310403
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项目类别:Standard Grant
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资助金额:$2.5万
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财政年份:1993
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负责人:George Collins
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依托单位:
Electron Beam Curing of Polymer Resists
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批准号:9108531
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项目类别:Continuing Grant
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资助金额:$31.37万
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财政年份:1992
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负责人:George Collins
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依托单位:
Effects of Photons on Gallium Arsenide Epitaxy
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批准号:9108456
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项目类别:Standard Grant
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资助金额:$3.5万
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财政年份:1991
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负责人:George Collins
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依托单位:
U.S Japan Long Term Visit: Photon and Reactive Gas AssistedHeteroepitaxy of III-V and II-VI Optoelectronic Films
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批准号:9007937
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项目类别:Standard Grant
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资助金额:$17.7万
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财政年份:1991
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负责人:George Collins
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依托单位:
Acquisition of a Liquid Cesium Ion Source
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批准号:9004593
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项目类别:Standard Grant
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资助金额:$2.2万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:9000527
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项目类别:Standard Grant
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资助金额:$0.82万
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财政年份:1990
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负责人:George Collins
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依托单位:
Research on Cylindrical Algebraic Computation
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批准号:8913824
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1990
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负责人:George Collins
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依托单位:
U.S.-China Cooperative Research: Cylindrical Magnetron Plasma Modeling and Associated Laser Rate Equations
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批准号:8913426
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项目类别:Standard Grant
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资助金额:$2.38万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:8903088
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项目类别:Standard Grant
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资助金额:$0.56万
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财政年份:1989
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant - Single Wafer Reactor
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批准号:8906311
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项目类别:Standard Grant
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资助金额:$2.0万
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财政年份:1989
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负责人:George Collins
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依托单位:
Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)
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批准号:8815051
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项目类别:Continuing Grant
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资助金额:$37.13万
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财政年份:1989
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负责人:George Collins
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依托单位:
Hydrogen Assisted Fabrication of Optoelectronic Devices Utilizing GaAs on Si and GaAs on SiO2
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批准号:8806851
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项目类别:Standard Grant
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资助金额:$4.8万
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财政年份:1988
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负责人:George Collins
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依托单位:
Algebraic Algorithms and Systems (Computer Research)
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批准号:8696129
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1986
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负责人:George Collins
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依托单位:
U.S.-Australian Cooperative Research: Electron Beam Pumped Metal Vapor Recombination Lasers at Room Temperature (Elec- trical Engineering)
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批准号:8500540
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项目类别:Standard Grant
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资助金额:$0.64万
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财政年份:1986
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant: Epitaxial Reactor
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批准号:8506506
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项目类别:Standard Grant
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资助金额:$6.8万
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财政年份:1985
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负责人:George Collins
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依托单位:
海外基金