Surfactant Sputtering - Investigation of fundamental processes

表面活性剂溅射 - 基本过程研究

• 批准号: 120298999
• 负责人: Professor Dr. Hans Christian Hofsäss
• 金额: --
• 依托单位: II. Physikalisches Institut - Atom- und Kernphysik
• 依托单位国家: 德国
• 项目类别: Research Grants
• 财政年份: 2009
• 资助国家: 德国
• 起止时间: 2008-12-31 至 2014-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/120298999?language=en
• 关键词: Surfactant; Sputtering; Investigation; fundamental; processes

A novel sputter erosion technique, which was newly developed by the applicant and Dr. K. Zhang and recently filed as patent application, shall be investigated regarding the fundamental processes and the application potential. This sputter technique utilizes a steady state coverage of a surface with foreign- or self atoms (surfactants = surface active agents) with an area density up to 1016 atoms/cm2, which is achieved by simultaneous ion irradiation and deposition of atoms onto a substrate. The coverage with surfactants can be laterally varied in a controlled manner. The surfactants cause a dramatic reduction of the substrate sputtering yield on atomic up to macroscopic length scales. Depending on the surfactant-substrate combination, a homogeneous surface coverage, island or cluster formation, attachment to surface defects, or the formation of surface-near compounds or alloys may arise. As a consequence, either smoothing of the surface or the formation of a variety of novel surface patterns, or controlled shaping of surfaces due lateral gradients of the surfactant coverage is possible. The dynamic processes responsible for smoothing, surface pattern formation, generation of ultrathin surfactant films and shaping of surfaces due to anisotropic ion beam erosion shall be investigated.

本文介绍了一种新的溅射腐蚀技术，该技术是由申请人和K.张先生及最近申请为专利之本公司将就其基本方法及应用潜力进行调查。这种溅射技术利用了表面的稳态覆盖与外来或自原子（表面活性剂=表面活性剂）的面积密度高达1016原子/平方厘米，这是通过同时离子照射和原子沉积到基板上实现的。表面活性剂的覆盖率可以以受控的方式横向变化。表面活性剂导致原子到宏观长度尺度上的衬底溅射产率的急剧降低。取决于表面-基底组合，可能出现均匀的表面覆盖、岛或簇形成、附着于表面缺陷或形成表面附近的化合物或合金。因此，由于表面活性剂覆盖的横向梯度，表面的平滑或各种新颖表面图案的形成或表面的受控成形是可能的。应研究由于各向异性离子束侵蚀导致的平滑、表面图案形成、表面活性剂膜的生成和表面成形的动态过程。

项目成果

Surface instability and pattern formation by ion-induced erosion and mass redistribution

离子引起的侵蚀和质量重新分布导致的表面不稳定性和图案形成

• DOI: 10.1007/s00339-013-8170-9
• 发表时间: 2014
• 期刊: Applied Physics A
• 作者: H. Hofsäss

A modification to the Sigmund model of ion sputtering

离子溅射西格蒙德模型的修正

• DOI: 10.1063/1.4904438
• 发表时间: 2014
• 期刊: Journal of Applied Physics
• 影响因子: 3.2
• 作者: R. M. Bradley;H. Hofsäss
• 通讯作者: H. Hofsäss

Propagation of ripple patterns on Si during ion bombardment

• DOI: 10.1103/physrevb.88.075426
• 发表时间: 2013-08
• 期刊: Physical Review B
• 影响因子: 3.7
• 作者: H. Hofsäss;Kun Zhang;Hans-Gregor Gehrke;C. Brüsewitz

Ion beam induced surface patterns due to mass redistribution and curvature-dependent sputtering

由于质量重新分布和曲率相关溅射而导致的离子束诱导表面图案

• DOI: 10.1103/physrevb.86.235414
• 发表时间: 2012
• 期刊: Physical Review B
• 影响因子: 3.7
• 作者: Omar Bobes;Kun Zhang;Hans Hofsäss
• 通讯作者: Hans Hofsäss

The role of phase separation for self-organized surface pattern formation by ion beam erosion and metal atom co-deposition

• DOI: 10.1007/s00339-012-7285-8
• 发表时间: 2013-05-01
• 期刊: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
• 影响因子: 2.7
• 作者: Hofsaess, H.;Zhang, K.;Broetzmann, M.
• 通讯作者: Broetzmann, M.