Acquisition of a Sputter Deposition System for Thin Films Research and Education

采购用于薄膜研究和教育的溅射沉积系统

• 批准号: 0215902
• 负责人: Joost Vlassak
• 金额: $ 16.3万
• 依托单位: Harvard University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-08-15 至 2004-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0215902&HistoricalAwards=false
• 关键词: Acquisition; Sputter; Deposition; System; Thin

This award from the Instrumentation for Materials Research Program will support faculty in the Applied Physics and Applied Mechanics groups at Harvard University with the acquisition of a thin film deposition system with in-situ stress monitor. The system will be used for the growth of metal films that range in thickness from tens of nanometers to several micrometers, for a comprehensive study of thin film mechanical properties. The main focus of this study is the deformation behavior of elemental metal and alloy films. Basic deformation mechanisms and interactions with microstructural features such as grain size, grain orientation, grain boundaries, interfaces, surfaces, and dislocation substructure will be explored. Alloy films will be used to investigate precipitation hardening and the shape memory effect in thin films. The deposition system will also support research on self-organized nanostructure evolution and amorphous metallic films. Students at the undergraduate, graduate, and postdoctoral levels will use the system.This award from the IMR Program will support faculty in the Applied Physics and Applied Mechanics groups in the Division of Engineering and Applied Sciences at Harvard University with the acquisition of a thin film deposition system with in-situ stress monitor. The system will be used in graduate research projects on thin film mechanics, self-organized nanostructure evolution, and amorphous metallic films. In addition to the graduate research program, a special program will be set up to involve undergraduate students in original thin films research in the framework of an independent research course offered by the Division. The deposition system will also significantly advance undergraduate education through the development of special laboratory sessions for an Introductory Materials Science course. These sessions will serve as a first introduction to thin film technology, but are also intended to foster interest in advanced Materials Engineering studies.

该奖项来自材料研究仪器项目，将支持哈佛大学应用物理和应用力学小组的教师获得一种带有地应力监测仪的薄膜沉积系统。该系统将用于生长厚度从几十纳米到几微米的金属薄膜，用于薄膜机械性能的全面研究。本研究的主要焦点是元素金属和合金薄膜的变形行为。基本的变形机制及其与微观结构特征的相互作用，如晶粒尺寸、晶粒取向、晶界、界面、表面和位错子结构。合金薄膜将用于研究薄膜的沉淀硬化和形状记忆效应。该沉积系统还将支持自组织纳米结构演化和非晶金属薄膜的研究。本科生、研究生和博士后级别的学生将使用该系统。IMR项目授予的这一奖项将用于支持哈佛大学工程与应用科学系应用物理和应用力学组的教师，以获得带有地应力监测仪的薄膜沉积系统。该系统将用于薄膜力学、自组织纳米结构演化和非晶金属薄膜的研究生研究项目。除了研究生研究项目外，还将设立一个特别项目，在该部门提供的独立研究课程的框架内，让本科生参与原创薄膜研究。该沉积系统还将通过开发材料科学入门课程的特殊实验室课程，显著推进本科教育。这些课程将作为薄膜技术的首次介绍，但也旨在培养对先进材料工程研究的兴趣。