MRI: Acquisition of an E-beam Lithography System for Nanoscale Science and Engineering
MRI: Acquisition of an E-beam Lithography System for Nanoscale Science and Engineering
批准号:
0216374
负责人:
Leigh Smith
金额:
$40.7万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2002
资助国家:
美国
项目状态:
已结题
起止时间:
2002-08-15 至 2006-07-31
中文摘要
这项来自主要研究仪器计划的奖项支持辛辛那提大学购买电子束光刻系统:Raith-150。来自物理系、电气工程系、光电子系和材料科学系的15个跨学科小组将代表南俄亥俄州的6所主要大学使用该仪器。该仪器将为尺寸低至10 nm的结构的纳米加工提供基础,将支持纳米电子学,光子和电子纳米结构,纳米生物电子学和新型显微镜领域的研究。这些领域的进展都取决于Raith-150系统提供的纳米制造能力。纳米电子学(如纳米传输实验)、光子纳米结构(如强耦合量子点系统)的工作将带来新的基本认识,包括纳米生物电子学(如生物芯片和光学集成电路)在内的技术相关领域预计将取得新的具有挑战性的进展,并将为研究人员开发新的工具(如新型显微镜)。这项活动的一个关键部分是教育和培训本科生,研究生和博士后研究员在现代电子束光刻方法。 这项来自主要研究仪器计划的奖项支持辛辛那提大学购买电子束光刻系统:Raith-150。来自物理系、电气工程系、光电子系和材料科学系的15个跨学科小组将代表南俄亥俄州的6所主要大学使用该仪器。该仪器将为尺寸低至10 nm的结构的纳米加工提供基础,将支持纳米电子学,光子和电子纳米结构,纳米生物电子学和新型显微镜领域的研究。这些领域的进展都取决于Raith-150系统提供的纳米制造能力。纳米电子学(如纳米传输实验)、光子纳米结构(如强耦合量子点系统)的工作将带来新的基本认识,预计在包括纳米生物电子学(如生物芯片和光学集成电路)在内的技术相关领域将取得新的具有挑战性的进展,并将为研究人员开发新的工具(如新型显微镜)。这项活动的一个关键部分是教育和培训本科生,研究生和博士后研究员在现代电子束光刻方法。
英文摘要
This award from the Major Research Instrumentation program supports the University of Cincinnati with the acquisition of an e-beam lithography system: the Raith-150. Fifteen interdisciplinary group of faculty from departments of physics, electrical engineering, optoelectronics, and materials science representing the 6 major universities in Southern Ohio will make use of the instrument. The instrument, which will provide the foundation for nanofabrication of structures with sizes down to 10 nm, will support research in the areas of Nanoelectronics, Photonic and Electronic Nanostructures, Nano BioElectronics, and Novel Microscopies. Advances in each of these areas depend crucially on the ability to carry out the nanofabrication provided by the Raith-150 system. New fundamental understanding will result from the work on nanoelectronics (e.g.nanotransport experiments), photonic nanostructures (e.g. strongly coupled quantum dots systems), new and challenging advances is expected in technologically relevant areas including nano bio-electronics (e.g. biochips and optical integrated circuits), and new tools for researchers will be developed (e.g. novel microscopies). A key part of the activity is the education and training of undergraduates, graduate students, and post-doctoral fellows in modern methods of e-beam lithography. This award from the Major Research Instrumentation program supports the University of Cincinnati with the acquisition of an e-beam lithography system: the Raith-150. Fifteen interdisciplinary group of faculty from departments of physics, electrical engineering, optoelectronics, and materials science representing the 6 major universities in Southern Ohio will make use of the instrument. The instrument, which will provide the foundation for nanofabrication of structures with sizes down to 10 nm, will support research in the areas of Nanoelectronics, Photonic and Electronic Nanostructures, Nano BioElectronics, and Novel Microscopies. Advances in each of these areas depend crucially on the ability to carry out the nanofabrication provided by the Raith-150 system. New fundamental understanding will result from the work on nanoelectronics (e.g.nanotransport experiments), photonic nanostructures (e.g. strongly coupled quantum dots systems), new and challenging advances is expected in technologically relevant areas including nano bio-electronics (e.g. biochips and optical integrated circuits), and new tools for researchers will be developed (e.g. novel microscopies). A key part of the activity is the education and training of undergraduates, graduate students, and post-doctoral fellows in modern methods of e-beam lithography.
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海外基金