Strukturnahe Modellierung von Nanoscale Multiple-Gate FETs zur Schaltungssimulation
Strukturnahe Modellierung von Nanoscale Multiple-Gate FETs zur Schaltungssimulation
批准号:
182932826
负责人:
Professor Dr.-Ing. Alexander Klös
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2010
资助国家:
德国
项目状态:
已结题
起止时间:
2009-12-31 至 2012-12-31
中文摘要
对于集成电路的仿真,网络仿真器中使用了所谓的紧凑模型。它们允许在合理的计算时间内分析复杂的电路。为了提高数值效率,需要对建模时必须考虑的物理效应进行深入研究,而这些物理效应可以忽略不计。通过对原始项目提案的扩展,多栅极FET的分析建模目标通过引入新型器件结构(如无结MOSFET)得到了补充。该项目重点关注以下效应的建模:- 多栅MOSFET中的载流子约束-弹道载流子输运-SOI结构中的自热效应。
英文摘要
For the simulation of integrated circuits are so-called compact models used in network simulators. They allow analysis of complex circuits in a reasonable computation time. The demand for numerical efficiency requires a thorough investigation of physical effects which must be taken into account in modeling and which in contrast can be neglected.Through the extension of the project with respect to the original project proposal the objectives for analytical modeling of multiple-gate FETs are complemented by the inclusion of novel device structures such as junction-less MOSFETs.The project focuses on modeling of the following effects:- carrier confinement in multiple-gate MOSFETs- ballistic carrier transport- self-heating effects in SOI structures.Furthermore model equations for intrinsic capacitances will be derived.
期刊论文(4)
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DOI:
10.1016/j.sse.2013.02.044
发表时间:
2013-12
期刊:
Solid-state Electronics
影响因子:
1.7
作者:
[T. Holtij;M. Schwarz;A. Kloes;B. Iñíguez]
通讯作者:
T. Holtij;M. Schwarz;A. Kloes;B. Iñíguez
DOI:
10.1109/ted.2013.2281615
发表时间:
2014-02-01
期刊:
IEEE TRANSACTIONS ON ELECTRON DEVICES
影响因子:
3.1
作者:
[Holtij, Thomas, Graef, Michael, Iniguez, Benjamin]
通讯作者:
Iniguez, Benjamin
Analytical compact modeling framework for the 2D electrostatics in lightly doped double-gate MOSFETs
轻掺杂双栅极 MOSFET 中二维静电的分析紧凑建模框架
DOI:
10.1016/j.sse.2011.11.023
发表时间:
2012
期刊:
Solid-state Electronics
影响因子:
1.7
作者:
[M. Schwarz, T. Holtij, A. Kloes, B. Iñíguez]
通讯作者:
B. Iñíguez
Performance Study of a Schottky Barrier Double-Gate MOSFET Using a Two-Dimensional Analytical Model
使用二维解析模型研究肖特基势垒双栅极 MOSFET 的性能
DOI:
10.1109/ted.2012.2235146
发表时间:
2013
期刊:
IEEE Transactions on Electron Devices
影响因子:
3.1
作者:
[M. Schwarz, T. Holtij, A. Kloes, B. Iniguez]
通讯作者:
B. Iniguez
海外基金