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Interlinked Nanorod Coatings

Interlinked Nanorod Coatings
互连纳米棒涂层
批准号:
0727413
负责人:
Daniel Gall
金额:
$18.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2007
资助国家:
美国
项目状态:
已结题
起止时间:
2007-08-01 至 2009-07-31

项目摘要

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中文摘要
翻译
本研究项目探索了一种利用物理气相沉积过程中的原子遮蔽效应来制造高强度多孔涂层的新方法。关键思想是采用多源同时定向沉积来构建纳米棒阵列,并依次改变沉积角度,通过控制棒分支和棒合并来实现相互连接,从而产生三维互联的纳米棒网络。所提出的方法建立在最近开发的同时对掠角沉积(SO-GLAD)技术的基础上,该技术在视线沉积过程中利用局部原子阴影效应来创建独特的自组织多组分纳米结构阵列。纳米棒网络将在专用的超高真空溅射沉积系统中沉积。同时,将使用从头算、分子动力学和晶格蒙特卡罗方法的组合来模拟生长。这项研究将导致在实验和理论上对创建纳米结构涂层的新方法的基本科学理解。新方法将适用于广泛的材料系统,从韧性金属到耐腐蚀陶瓷,在未来的核聚变和裂变反应堆中有潜在的应用,作为抗辐射涂层,作为燃料电池的多孔导电催化剂支撑结构,以及作为纳米机器人和人造皮肤中压力传感器的活性纳米结构。该项目的一个完整的教育组成部分侧重于纳米科学和技术的研究生培训,并探索在本科课程中引入纳米制造概念。
英文摘要
This research project explores a new approach for creating high-strength porous coatings by exploiting atomic shadowing effects during physical vapor deposition. The key idea is to employ simultaneous directional deposition from multiple sources to build nanorod arrays, and to sequentially vary the deposition angles to cause interlinking by controlled rod-branching and rod merging, producing three-dimensional interconnected nanorod networks. The proposed approach builds on a recently developed simultaneous opposite glancing angle deposition (SO-GLAD) technique which utilizes local atomic shadowing effects during line-of-sight deposition to create unique self-organized multi-component nanostructure arrays. Nanorod networks will be deposited in a dedicated ultra-high vacuum sputter deposition system. In parallel, the growth will be simulated using a combination of ab initio, molecular dynamics, and lattice Monte Carlo approaches.This research will lead to the basic scientific understanding, both in experiment and theory, of a new approach to create nanostructured coatings. The new approach will be applicable to a wide range of materials systems, ranging from ductile metals to corrosion-resistant ceramics, with potential applications as radiation-resistant coatings in future nuclear fusion and fission reactors, as porous conductive catalyst support structures for fuel-cells, and as active nanostructures for pressure sensors in nanorobots and artificial skins. An integral educational component of the project focuses on graduate student training in nanoscience and technology, and explores the introduction of nanomanufacturing concepts in an undergraduate course.
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Collaborative Research: FuSe: Interconnects with Co-Designed Materials, Topology, and Wire Architecture
  • 批准号:
    2328906
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $118.6万
  • 财政年份:
    2023
  • 负责人:
    Daniel Gall
  • 依托单位:
E2CDA: Type I: Collaborative Research: Interconnects Beyond Cu
  • 批准号:
    1740271
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $8.0万
  • 财政年份:
    2017
  • 负责人:
    Daniel Gall
  • 依托单位:
Metal-insulator Transitions in 2D and 3D Refractory Nitrides
  • 批准号:
    1712752
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $45.67万
  • 财政年份:
    2017
  • 负责人:
    Daniel Gall
  • 依托单位:
DMREF/Collaborative Research: Nitride Discovery - Creating the Knowledge Base for Hard Coating Synthesis
  • 批准号:
    1629230
  • 项目类别:
    Standard Grant
  • 资助金额:
    $42.97万
  • 财政年份:
    2016
  • 负责人:
    Daniel Gall
  • 依托单位:
海外基金