High Throughput Laser-Assisted Near Field Nanoprocessing

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This project aims at introducing a new approach for the high-throughput and cost-effective laser-assisted nanomanufacturing. Research done has shown the great potential of nanoscale laser energy confinement via near-field-optical microscopes (NSOMs) for precise surface modification.Intellectual Merit NSOM-based methods enable laser-assisted nanoscale direct writing of a diverse range of material systems in both additive and subtractive manner with superb feature resolution and extremely precise placement. Furthermore, the self-assembled colloidal microsphere array approach has proven the possibility of highly consistent and repeatable feature production. On the basis of these efforts, we will demonstrate the feasibility of a truly flexible, maskless and actively controlled nanomanufacturing system capable of yielding scalable throughput and arbitrary pattern production via photochemical and photophysical modification processes.Broader ImpactsThe production of surface nanofeatures has many important applications in critical emerging technology fields, including the fabrication of nano-electro-photo-mechanical integrated devices. Completion of this project will open the way to key applications on nanofluidics, mask fabrication and repair and nanolithography.