High Throughput Laser-Assisted Near Field Nanoprocessing

本项目旨在为高通量和低成本的激光辅助纳米制造提供一种新的方法。已完成的研究表明，通过近场光学显微镜(NSOM)进行纳米级激光能量限制在精确表面修饰方面具有巨大潜力。基于NSOM的智能方法使激光辅助的纳米级直接写入各种材料体系具有极高的特征分辨率和极其精确的布局。此外，自组装胶体微球阵列方法已经证明了高度一致和可重复的特征生产的可能性。在这些工作的基础上，我们将展示一种真正灵活、无掩膜和主动控制的纳米制造系统的可行性，该系统能够通过光化学和光物理修改过程产生可扩展的生产能力和任意图案的生产。广泛影响表面纳米特征的制造在关键新兴技术领域有许多重要的应用，包括制造纳米电光机械集成器件。该项目的完成将为纳米流体、掩模制造和修复以及纳米光刻等关键应用开辟道路。

This project aims at introducing a new approach for the high-throughput and cost-effective laser-assisted nanomanufacturing. Research done has shown the great potential of nanoscale laser energy confinement via near-field-optical microscopes (NSOMs) for precise surface modification.Intellectual Merit NSOM-based methods enable laser-assisted nanoscale direct writing of a diverse range of material systems in both additive and subtractive manner with superb feature resolution and extremely precise placement. Furthermore, the self-assembled colloidal microsphere array approach has proven the possibility of highly consistent and repeatable feature production. On the basis of these efforts, we will demonstrate the feasibility of a truly flexible, maskless and actively controlled nanomanufacturing system capable of yielding scalable throughput and arbitrary pattern production via photochemical and photophysical modification processes.Broader ImpactsThe production of surface nanofeatures has many important applications in critical emerging technology fields, including the fabrication of nano-electro-photo-mechanical integrated devices. Completion of this project will open the way to key applications on nanofluidics, mask fabrication and repair and nanolithography.