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Two-Stage Buffer Layers for Solar Power in a InGaP - Si Double Junction Cell

Two-Stage Buffer Layers for Solar Power in a InGaP - Si Double Junction Cell
InGaP-Si 双结电池中用于太阳能的两级缓冲层
批准号:
1214172
负责人:
Wiley Kirk
金额:
$32.21万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2012
资助国家:
美国
项目状态:
已结题
起止时间:
2012-02-09 至 2015-02-28

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AbstractIntellectual MeritThe objective of this project is to monolithically integrate In0.50Ga0.50P on Si wafer substrates by using a thin nucleation layer of Ge followed by a metamorphic buffer comprised of step-graded InxGa1-xP. The thin 3 ML Ge layer will provide a nucleation template for the step-graded InxGa1-xP as well as provide a coherent, pseudomorphic interface at the top surface of the Si bottom p-n junction. We will be able to solve two key materials science issues together ? (i) provide nucleation for III-P semiconductors that normally do not interface well directly with Si atoms and (ii) provide a clean interfacial layer that can electrically passivate the n-type Si emitter layer of the Si bottom p-n junction. Broader ImpactThe National Academy of Engineering selected the top 14 engineering challenges for the 21st century facing humanity worldwide. Challenge #1 - "Make Solar Energy Economical? by ?overcoming the barriers to widespread solar power generation." Our project provides a way to address this societal grand challenge by demonstrating a two stage metamorphic buffer designed to monolithically integrate In0.50Ga0.50P and Si, despite lattice mismatch, into an efficient, affordable and nontoxic solar cell. Two graduate students will be engaged in semiconductor material characterization and epitaxial thin film synthesis. In addition, we will select a K-12 teacher from a local Independent School District to participate in a 6-week summer program. This program will focus on engaging the teacher with our research and the subsequent development of classroom materials for teaching future scientists, engineers, and technologists.
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Workshop: Designed Quantum Materials Workshop; To be Held at The National Institute of Standards and Technology, in Gaithersburg, MD January 23-24, 2018
  • 批准号:
    1747578
  • 项目类别:
    Standard Grant
  • 资助金额:
    $1.2万
  • 财政年份:
    2017
  • 负责人:
    Wiley Kirk
  • 依托单位:
GOALI: Nanomanufacturing of Atomically Precise Bipolar Electronic Devices
  • 批准号:
    1563233
  • 项目类别:
    Standard Grant
  • 资助金额:
    $20.0万
  • 财政年份:
    2016
  • 负责人:
    Wiley Kirk
  • 依托单位:
Two-Stage Buffer Layers for Solar Power in a InGaP - Si Double Junction Cell
  • 批准号:
    1002133
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2010
  • 负责人:
    Wiley Kirk
  • 依托单位:
Graduate Student Industrial Fellowship: Investigation of Transport Properties in Bipolar Quantum Resonant Tunneling Transistors
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