课题基金 / 基金详情

SHF: Small: Design/Technology Co-Optimization and Exploration in Emerging Scaling

SHF: Small: Design/Technology Co-Optimization and Exploration in Emerging Scaling
SHF:小型:新兴扩展中的设计/技术协同优化和探索
批准号:
1718570
负责人:
David Pan
金额:
$45.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2017
资助国家:
美国
项目状态:
已结题
起止时间:
2017-07-01 至 2023-06-30

项目摘要

项目成果

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中文摘要
翻译
随着半导体产业达到10nm/7nm及以上的技术节点,更多的创新将通过替代或新兴的缩放来实现,如新的工艺/材料和器件工程,以寻求等效的缩放效果。这种规模需要更紧密的设计和技术协同优化和探索。该项目将寻求开发新的CAD算法、工具和方法,以弥合未来IC设计和新兴规模新时代的技术差距。这项研究如果成功,将对价值3500亿美元的半导体产业产生巨大影响。目前,半导体产业正处于从传统规模向新兴规模过渡的关键时刻。PI将与行业合作伙伴一起进行技术转让,以造福整个行业和社会。这项研究的高度跨学科性质将与课程开发和学生培训/推广活动紧密结合。需要解决的技术问题包括:(1)新的亚分辨率定向自组装(DSA)模式和布局协同优化;(2)考虑到新兴工艺/材料和设计要求,未来混合光刻技术的新掩模和布局优化;(3)未来标准小区和路由体系结构探索;(4)下一代纳米器件的物理设计。
英文摘要
As the semiconductor industry reaches 10nm/7nm technology nodes and beyond, more innovations will be realized through alternative or emerging scaling such as novel process/material and device engineering to seek equivalent scaling effects. Such scaling demands closer design and technology co-optimization and explorations. This project will seek to develop novel CAD algorithms, tools, and methodologies to bridge the future IC design and technology gaps in the new era of emerging scaling. The proposed research, if successful, will have tremendous impacts on the $350 billion semiconductor industry which is at a critical point, transitioning from conventional scaling to emerging scaling. The PI will work with industry collaborators for technology transfer to benefit the overall industry and society. The highly interdisciplinary nature of this research will be tightly integrated into curriculum development and student training/outreach activities. The technical problems to be addressed include: (1) new sub-resolution directed-self-assembly (DSA) patterning and layout co-optimizations; (2) new mask and layout optimizations for future hybrid lithography technologies considering emerging processes/materials and design requirements; (3) future standard cell and routing architecture exploration; (4) physical design for next-generation nano-devices.
期刊论文(22)
专著(0)
科研奖励(0)
会议论文
DOI: 10.23919/date56975.2023.10137055
发表时间: 2023-04
期刊: 2023 Design, Automation & Test in Europe Conference & Exhibition (DATE)
影响因子: --
作者: [Hyunsu Chae;B. Mutnury;Keren Zhu;D. Wallace;D. Winterberg;D. D. Araujo-D.;J. Reddy;Adam R. Klivans;D. Pan]
通讯作者: Hyunsu Chae;B. Mutnury;Keren Zhu;D. Wallace;D. Winterberg;D. D. Araujo-D.;J. Reddy;Adam R. Klivans;D. Pan
DOI: 10.1109/tcad.2021.3124762
发表时间: 2022-10
期刊: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
影响因子: 2.9
作者: [Martin Rapp;H. Amrouch;Yibo Lin;Bei Yu;D. Pan;M. Wolf;J. Henkel]
通讯作者: Martin Rapp;H. Amrouch;Yibo Lin;Bei Yu;D. Pan;M. Wolf;J. Henkel
A Tale of EDA's Long Tail: Long-Tailed Distribution Learning for Electronic Design Automation
EDA 长尾故事:电子设计自动化的长尾分布学习
DOI: 10.1145/3551901.3556485
发表时间: 2022
期刊: MLCAD '22: Proceedings of the 2022 ACM/IEEE Workshop on Machine Learning for CAD
影响因子: --
作者: [Zixuan Jiang, Mingjie Liu]
通讯作者: Zixuan Jiang, Mingjie Liu
DOI: 10.1145/3287624.3287685
发表时间: 2019-01
期刊: 2019 24th Asia and South Pacific Design Automation Conference (ASP-DAC)
影响因子: --
作者: [Ying Chen;Yibo Lin;Tianyang Gai;Yajuan Su;Yayi Wei;D. Pan]
通讯作者: Ying Chen;Yibo Lin;Tianyang Gai;Yajuan Su;Yayi Wei;D. Pan
16
    Collaborative Research: SaTC: CORE: Medium: Security and Robustness for Intermittent Computing Using Cross-Layer Post-CMOS Approaches
    • 批准号:
      2303116
    • 项目类别:
      Continuing Grant
    • 资助金额:
      $40.0万
    • 财政年份:
      2023
    • 负责人:
      David Pan
    • 依托单位:
    SHF: Medium: Integrating Human and Machine Intelligence for Next Generation Interactive Analog IC Design
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      1704758
    • 项目类别:
      Continuing Grant
    • 资助金额:
      $80.0万
    • 财政年份:
      2017
    • 负责人:
      David Pan
    • 依托单位:
    Collaborative Research: From High-level Synthesis to Layout: a Cross-layer Methodology for Large-scale Reliable IC Design
    • 批准号:
      1255816
    • 项目类别:
      Continuing Grant
    • 资助金额:
      $10.5万
    • 财政年份:
      2013
    • 负责人:
      David Pan
    • 依托单位:
    SHF: SMALL: GOALI: Design for Manufacturability in Extreme Scaling with Emerging Nanolithography
    • 批准号:
      1218906
    • 项目类别:
      Standard Grant
    • 资助金额:
      $36.0万
    • 财政年份:
      2012
    • 负责人:
      David Pan
    • 依托单位:
    国内基金
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    昼夜节律性small RNA在血斑形成时间推断中的法医学应用研究
    • 批准号:
    • 项目类别:
      省市级项目
    • 资助金额:
      --
    • 批准年份:
      2024
    • 负责人:
    • 依托单位:
    tRNA-derived small RNA上调YBX1/CCL5通路参与硼替佐米诱导慢性疼痛的机制研究
    • 批准号:
    • 项目类别:
      省市级项目
    • 资助金额:
      10.0万元
    • 批准年份:
      2022
    • 负责人:
      张祥忠
    • 依托单位:
    Small RNA调控I-F型CRISPR-Cas适应性免疫性的应答及分子机制
    Small RNAs调控解淀粉芽胞杆菌FZB42生防功能的机制研究
    • 批准号:
      31972324
    • 项目类别:
      面上项目
    • 资助金额:
      58.0万元
    • 批准年份:
      2019
    • 负责人:
      高学文
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