A thorough Investigation of Negative Capacitance Model for Ferroelectric-Gated MOSFETs
A thorough Investigation of Negative Capacitance Model for Ferroelectric-Gated MOSFETs
批准号:
1941316
负责人:
Tso-Ping Ma
金额:
$25.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2020
资助国家:
美国
项目状态:
已结题
起止时间:
2020-03-01 至 2022-02-28
中文摘要
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英文摘要
PROJECT ABSTRACTProposal Title:Negative Capacitance: Scientific Facts or Fiction - A Thorough Examination of Ferroelectric-Gated Field-Effect Transistor ModelsNontechnical AbstractThe concept of “negative capacitance” (NC), recently brought to light, is one of the most novel and exciting ideas that emerged in the last decade or so in the semiconductor community, as it promises to enable field-effect transistor (FET) integrated circuits (ICs) to perform at speeds exceeding the limit predicted by the conventional theory, even with reduced power consumption. Consequently, many researchers and engineers throughout the world have been actively working on various aspects of NC transistors since its introduction, resulting in numerous publications with varying degrees of quality and sensibility. The research reports have caused wide spread confusion and conflicting conclusions. The objective of this research is to obtain a comprehensive understanding of the NC model of ferroelectric-gated FETs by conducting a thorough investigation of all aspects of this topic, and to disseminate widely the findings with a goal to foster its healthy development in the semiconductor community.Technical AbstractTo achieve this objective, an exhaustive study of the published literature will be made to thoroughly investigate both theoretical and experimental aspects of negative capacitance models of ferroelectric-gated field-effect transistors (FeFETs) in order to identify and to articulate valid as well as false claims. Many cleverly constructed experiments are proposed to confirm or debunk the prevailing NC models of FeFETs, and to convincingly expose the false claims as supported by the revelation of their underlying causes.The intellectual significance of this project stems from the fact that it addresses an issue of both intense scientific interest and significant technological importance. On the scientific side, the NC model is one of the most striking ideas in the last decade or so, which have generated intense interests in the semiconductor community worldwide. On the technological side, the NC associated with FeFETs promises to provide a very low subthreshold-swing solution just when the conventional scaling based on the Moore’s Law is nearing its end. The findings of this study are intended to provide an important and unbiased reference, if not the key reference, for the study of the negative capacitance in the context of FeFETs for next-generation integrated circuits.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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Dual-storage-port Nonvolatile SRAM based on Back-end-of-the-line Processed Hf0.5Zr0.5O2 Ferroelectric Capacitors Towards 3D Selector-free Cross-point Memory
基于后端处理 Hf0.5Zr0.5O2 铁电电容器的双存储端口非易失性 SRAM,实现 3D 无选择器交叉点存储器
DOI:
10.1109/jeds.2020.3019024
发表时间:
2020
期刊:
IEEE transactions on electron devices
影响因子:
3.1
作者:
[Jiang, Hao, Li, Owen, Chen, Wenliang, and Ma, T.P.]
通讯作者:
and Ma, T.P.
DOI:
10.1109/led.2020.3020857
发表时间:
2020-09
期刊:
IEEE Electron Device Letters
影响因子:
4.9
作者:
[Zhan Liu;Hao Jiang;Brandon Ordway;T. Ma]
通讯作者:
Zhan Liu;Hao Jiang;Brandon Ordway;T. Ma
DOI:
10.1109/led.2020.3011037
发表时间:
2020-09-01
期刊:
IEEE ELECTRON DEVICE LETTERS
影响因子:
4.9
作者:
[Deng, Shan, Liu, Zhan, Ni, Kai]
通讯作者:
Ni, Kai
A Reliability Study of Thickness Dependence of HfO2-based 3D-FeRAM Cell
HfO2 基 3D-FeRAM 单元厚度依赖性的可靠性研究
DOI:
--
发表时间:
2020
期刊:
IEEE Semiconductor Interface Specialist Conference
影响因子:
--
作者:
[Maher, Olivier, Jiang, Hao, Liu, Zhan, and Ma, T.P.]
通讯作者:
and Ma, T.P.
NSF/ENG/ECCS-BSF: Dynamically configurable memory technology based on ferroelectric-gated field effect transistors
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批准号:1609162
-
项目类别:Standard Grant
-
资助金额:$34.5万
-
财政年份:2016
-
负责人:Tso-Ping Ma
-
依托单位:
Inelastic Electron Tunneling Spectroscopy Studies of Advanced Gate Dielectrics
-
批准号:0096762
-
项目类别:Continuing Grant
-
资助金额:$35.15万
-
财政年份:2001
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负责人:Tso-Ping Ma
-
依托单位:
Gate Dielectric for Scaled CMOS Technology
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批准号:9817869
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项目类别:Continuing Grant
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资助金额:$18.0万
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财政年份:1999
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负责人:Tso-Ping Ma
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依托单位:
Jet Vapor Deposited Silicon Nitride Films for ULSI Applications
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批准号:9520430
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项目类别:Continuing Grant
-
资助金额:$25.0万
-
财政年份:1995
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负责人:Tso-Ping Ma
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依托单位:
U.S.-China Cooperative Research: Studies of Nitrided and Fluorinated Thin Gate Oxides for Advanced MOS Technology
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批准号:9424636
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项目类别:Standard Grant
-
资助金额:$13.66万
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财政年份:1995
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负责人:Tso-Ping Ma
-
依托单位:
Channel Mobility Degradation in Very ThinGate Oxide MOSFET's
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批准号:8722501
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项目类别:Standard Grant
-
资助金额:$8.0万
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财政年份:1988
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负责人:Tso-Ping Ma
-
依托单位:
Channel Mobility Degradation in Very Thin Gate Oxide MOSFETs
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批准号:8412832
-
项目类别:Continuing Grant
-
资助金额:$22.2万
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财政年份:1984
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负责人:Tso-Ping Ma
-
依托单位:
Optoelectronic Properties of Mis (Metal-Insulator- Semiconductor) Tunnel Junctions
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批准号:8308403
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项目类别:Continuing Grant
-
资助金额:$4.7万
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财政年份:1983
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负责人:Tso-Ping Ma
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依托单位:
Engineering Specialized Research Equipment: Research Ellipsometer For Thin Film Measurements
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批准号:7910888
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项目类别:Standard Grant
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资助金额:$1.5万
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财政年份:1979
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负责人:Tso-Ping Ma
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依托单位:
Optoelectronic Properties of Tunnel Junctions
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批准号:7906933
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项目类别:Continuing Grant
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资助金额:$12.58万
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财政年份:1979
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负责人:Tso-Ping Ma
-
依托单位:
海外基金