Study on layout design station with custom LSI
Study on layout design station with custom LSI
批准号:
59850058
负责人:
ESASHI Masayoshi
金额:
$3.52万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research
财政年份:
1984
资助国家:
日本
项目状态:
已结题
起止时间:
1984 至 1985
中文摘要
开发了高效设计LSI版图的版图设计工作站。本系统具有专用硬件,使小区操作快捷,并具有设计规则校验等功能。这就建立了半自动设计站,实现了低级操作的自动化。这将带来快速的责任感,从而充分利用设计师的直觉。本研究得到以下结果:硬件。研制了一种具有128个处理机单元的位图模式数据二维并行处理系统。高速交换网络,即二维轴移器,可实现高效的二维存储器访问,实现自定义lsi。系统各部分分别用于并行处理、存储、显示与绘图、地址计算和微程序控制,组装成一个整体系统,并对系统的各项性能进行了验证。软件。编写了设计规则校核等微程序,实现了系统的实际运行。该系统作为平面布局设计工作站或单元自动机仿真工作站的有效性也得到了进一步的发展,从而证明了该系统具有进行一般二维并行处理的能力。
英文摘要
The layout design station for the efficient design of LSI layout is developed. This system has a special purpose hardware to make neighborhood operations fast and has functions as design rule check etc.. This constructs semiautomatic design station which automates low level operations. This brings out quick responsability to make the most of the intuition of the designer.Following results are obtained in this study.1. Hardware. Two dimentional parallel processing system, which operates on the bit map pattern data with 128 processor elements, is developed. High speed switching network i.e. two dimentional oarrel shifter, which enables efficient two dimentional memory access, is implemented as custom LSIs. Each parts of the system that are for parallel processing, for memory, for display and draw, for address caliculation and for microprogram control respectively are assembled to total system and all performances of this system is certified.2. Software. The microprogram for design rule check etc. are made to operate this system practically. The effectiveness as a layout design station or that for the simulation of cell automatone are also developed and then this presents the ability of this system for general two dimentional parallel processing.
期刊论文(2)
专著(0)
科研奖励(0)
会议论文
電子通信学会技術研究報告. SSD 85-51. (1985)
IEICE 技术研究报告。SSD 85-51。
DOI:
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发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
Institute of Electronics and Communication Engineers of Japan Technical Report. SSD 85-51. (1985)
日本电子通信工程师学会技术报告。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
Massive Parallel Electron Beam Lithography System
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依托单位:
海外基金