Development of a Dynamic Imaging Spectroscopic Ellipsometer Equipped with a CCD Image Sensor

配备CCD图像传感器的动态成像光谱椭偏仪的研制

基本信息

  • 批准号:
    10555238
  • 负责人:
  • 金额:
    $ 8.13万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B).
  • 财政年份:
    1998
  • 资助国家:
    日本
  • 起止时间:
    1998 至 2000
  • 项目状态:
    已结题

项目摘要

A dynamic imaging spectroscopic ellipsometer (DISE) has been constructed using a two-dimensional CCD sensor and a variable wavelength light source. The ellipsometer has been applied to the real-time analysis of growth and dissolution processes of CVD oxide thin films, and also to the analysis of spatial variations in thickness and spectroscopic properties of passive films on stainless steels and crabon steels. The principal findings of this study are summarized as follows :1. The DISE equipment developed enables to be applied to both real-time spectroscopic ellipsometric (RTSE) and imaging ellipsometric (IE) measurements. Spectra with 512 wavelength points could be measured within 100ms by the RTSE mode and images with a 25mm resolution could be obtained within 5s by the IE mode.2. The growth process of ZrO_2 thin films, deposited by MOCVD, was analyzed using RTSE.It was found that the growth of the films proceeds in three consecutive stages ; cluster nucleation, bulk layer growth and surface roughness evolution. It was also demonstrated that the selective dissolution of a Fe_2O_3 component occurs during reductive dissolution of Fe_2O_3-Cr_2O_3 thin films, formed by MOCVD, while that of a Cr_2O_3 component does during oxidative dissolution of the films.3. The changes in spatial distribution of thickness and optical constants of passive films on 18-8 stainless steel were examined in 0.1M-NaCl. It was found that in the incubation period of pitting, the spatial variation in film thickness occurs and the pit tends to initiate at a site where the variation is large. The results of the analysis of spatial distributions of the thickness and optical spectra of passive films on carbon steel (0.12%C) showed that the films formed on a ferrite structure is about 10% thicker than those formed on a pearlite structure.
利用二维CCD传感器和可变波长光源构建了动态成像光谱椭偏仪(DISE)。椭偏仪已用于实时分析CVD氧化物薄膜的生长和溶解过程,以及不锈钢和碳钢上钝化膜厚度的空间变化和光谱性质的分析。本研究的主要成果如下:1.研制的DISE测量装置可同时用于实时光谱椭圆偏振测量(RTSE)和成像椭圆偏振测量(IE)。RTSE模式可在100ms内测量512个波长点的光谱,IE模式可在5s内获得分辨率为25 mm的图像。用RTSE分析了MOCVD法制备的氧化锆薄膜的生长过程,发现薄膜的生长经历了团簇形核、体层生长和表面粗糙度演化三个连续的过程。在MOCVD制备的Fe_2O_3-Cr_2O_3薄膜中,Fe_2O_3组分的选择性溶解发生在还原溶解过程中,而Cr_2O_3组分的选择性溶解发生在薄膜的氧化溶解过程中。研究了18-8不锈钢在0.1M-NaC l溶液中钝化膜厚度和光学常数的空间分布变化。研究发现,在点蚀孕育期内,膜厚存在空间变化,且点蚀倾向于在变化较大的位置开始形成。对碳钢(0.12%C)钝化膜厚度的空间分布和光谱的分析结果表明,在铁素体组织上形成的钝化膜比在珠光体组织上形成的钝化膜厚约10%。

项目成果

期刊论文数量(10)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Takeo Kubota: "Real Time Spectroscopic Ellipsometry Study on Growth Process of ZrO_2 Thin Films in Metallorganic Chemical Vapor Deposition"Journal of the Electrochemical Society. 148(印刷中). (2001)
Takeo Kubota:“金属有机化学气相沉积中 ZrO_2 薄膜生长过程的实时光谱椭圆测量”,电化学学会杂志 148(出版中)。
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窪田壮男: "減圧CVDにより作製したFe_2O_3-Cr_2O_3薄膜の溶解過程のリアルタイムエリプソメトリー解析"材料と環境. 48巻10号. 639-646 (1999)
Takeo Kubota:“低压CVD制备的Fe_2O_3-Cr_2O_3薄膜溶解过程的实时椭圆光度分析”材料与环境,第48卷,第10期。639-646(1999)。
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    0
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Takeo Kubota: "Real-Time Spectroscopic Ellipsometry Analysis of Dissolution Process of Fe_2O_3-Cr_2O_3 Films Formed by Low Pressure CVD"Zairyo-to-Kankyo. 48 10. 639-646 (1999)
Takeo Kubota:“低压CVD形成的Fe_2O_3-Cr_2O_3薄膜溶解过程的实时光谱椭圆光度分析”Zairyo-to-Kankyo。
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    0
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窪田壮男: "減圧CVDにより作製したFe_2O_3-Cr_2O_3薄膜の溶解過程のリアルタイム分光エリプソメトリー解析"材料と環境. 48・10. 639-646 (1999)
Takeo Kubota:“低压CVD制备的Fe_2O_3-Cr_2O_3薄膜溶解过程的实时光谱椭圆光度分析”材料与环境48・10(1999)。
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    0
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Takeo Kubota: "Real Time Spectroscopic Ellipsometry Study on Growth Process of ZrO_2 Thin Films in Metallorganic Chemical Vapor Deposition"Journal of the Electrochemical Society. 148(in press). (2001)
Takeo Kubota:“金属有机化学气相沉积中ZrO_2薄膜生长过程的实时光谱椭圆光度研究”电化学会杂志。
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SUGIMOTO Katsuhisa其他文献

SUGIMOTO Katsuhisa的其他文献

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{{ truncateString('SUGIMOTO Katsuhisa', 18)}}的其他基金

Development of Low-Alloy Steel for High Level Radioactive Waste Disposal Container
高放射性废物处置容器用低合金钢的开发
  • 批准号:
    12450287
  • 财政年份:
    2000
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Corrosion Mechanism of Metals and Alloys in CFィイD24ィエD2/OィイD22ィエD2 Plasma Downstream Environments
CF D24 D2/O D22 D2 等离子体下游环境中金属和合金的腐蚀机理
  • 批准号:
    09450264
  • 财政年份:
    1997
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Analysis of Mechanism of Reactive Ion Etching by Real-time Spectroscopic Ellipsometry
实时光谱椭偏仪分析反应离子刻蚀机理
  • 批准号:
    07455284
  • 财政年份:
    1995
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Development of Multichannel Spectroscopic and Macroscopic Ellipsometer
多通道光谱宏观椭偏仪的研制
  • 批准号:
    07555510
  • 财政年份:
    1995
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Quantitative Evaluation of Pinehole Defects in Corrosion-Resistant Thin Films Prepared by Dry Coating Process
干法涂覆耐腐蚀薄膜中针孔缺陷的定量评价
  • 批准号:
    06303006
  • 财政年份:
    1994
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for Co-operative Research (A)
Synthesis of Artificial Passivation Films by MOCVD
MOCVD 合成人工钝化膜
  • 批准号:
    05453086
  • 财政年份:
    1993
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Development of Noble Metal-Gate TiO_2 Schottky Diode DH sensor
贵金属栅TiO_2肖特基二极管DH传感器的研制
  • 批准号:
    05555186
  • 财政年份:
    1993
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
Microscopic Ellipsometric Analysis of Thin Films Formed by Chemical Vapor Deposition
化学气相沉积薄膜的显微椭偏分析
  • 批准号:
    02650505
  • 财政年份:
    1990
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
Development of a Nb-Doped TiO_2 Semiconductor pH Sensor for the Use in High-Temperature Aqueous Solutions
用于高温水溶液的掺铌TiO_2半导体pH传感器的研制
  • 批准号:
    02555145
  • 财政年份:
    1990
  • 资助金额:
    $ 8.13万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)

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