Synthesis of Artificial Passivation Films by MOCVD

MOCVD 合成人工钝化膜

• 批准号: 05453086
• 负责人: SUGIMOTO Katsuhisa
• 金额: $ 4.86万
• 依托单位: TOHOKU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1993
• 资助国家: 日本
• 起止时间: 1993 至 1994
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-05453086/
• 关键词: Chemical vapor diposition; Metalorganic; Artificial passivation film; Corrosion resistance; Ellipsometry

A series of Fe_2O_3-Cr_2O_3-NiO composite oxide thin films were formed on Pt by a MOCVD method. The corrosion resistance of the films was examined in 5M-HCI by measuring the film thickness and the chemical analysis of the test solution. The decrease rates of film thickness as a function of potential were also examined in 1M-H_2SO_4 using insitu ellipsmetry under potentiostatic control. The dissolution rate of Fe_2O_3-Cr_2O_3 and NiO-Cr_2O_3 composite films decreased exponentially with an increase in the cationic mass fraction of Cr^<3+> ions, X_<Cr>, of the films. The reduction dissolution of Fe_2 O_3 and the oxidation dissolution of Cr_2O_3 proceeded in the cathodic and anodic polarization ranges, respectively. The intrinsic passivity range where no dissolution of Fe_2O_3-Cr_2O_3 films occurred was found between the above two dissolution ranges. The addition of Ta_2O_5 to Fe_2O_3-Cr_2O_3 films provided a beneficial effect to suppress the oxidation dissolution of the films. The activation time of Fe coated with Fe_2O_3-Cr_2O_3 (X_<Cr>>0.5) and Fe_2O_3-Cr_2O_3-Ta_2O_5 (X_<Cr>>0.3, X_<Ta>>0.3) films in H_2SO_4, HCI and NaOH solutions increased with increasing film thickness, and reached a maximum in the thickness range of 70-100 nm.

采用MOCVD方法在Pt表面制备了一系列Fe_2O_3-Cr_2O_3-NiO复合氧化物薄膜。通过测量膜厚度和测试溶液的化学分析来检查膜在5 M-HCl中的耐腐蚀性。在1 M-H_2SO_4溶液中，采用恒电位控制下的原位椭偏法研究了膜厚随电位的变化规律。Fe_2O_3-Cr_2O_3和NiO-Cr_2 O_3复合膜的溶解速率随膜中Cr^&lt;3+&gt;离子的阳离子质量分数X_的增加呈指数下降<Cr>。Fe_2O_3的还原溶解和Cr_2O_3的氧化溶解分别在阴极和阳极极化区进行。Fe_2O_3-Cr_2O_3膜的本征钝化区位于两个溶解区之间。在Fe_2O_3-Cr_2O_3薄膜中添加Ta_2O_5对抑制薄膜的氧化溶解有一定的作用。Fe_2O_3-Cr_2O_3（X_<Cr>&gt;0.5）和Fe_2O_3-Cr_2O_3-Ta_2O_5（X_<Cr>&gt;0.3，X_<Ta>&gt;0.3）薄膜在H_2SO_4、HCl和NaOH溶液中的活化时间随薄膜厚度的增加而增加，在70-100 nm范围内达到最大值。

项目成果

Shigeaki Tanaka: "Corrosion Characteristics of Fe_2O_3‐Cr_2O_3 Artificial Passivation Films under Potentiostatic Control" Materials Science and Engineering A. (印刷中).

Shigeaki Tanaka：“恒电位控制下Fe_2O_3-Cr_2O_3人工钝化膜的腐蚀特性”材料科学与工程A.（出版中）。

Katsuhisa Sugimoto et al.: "Corrosion Resistance of Artificial Passivation Films of Fe_2O_3-Cr_2O_3-NiO Formed by Metal-Organic Chemical Vapor Deposition" Journal of the Electro-chemical Society. 140. 1586-1592 (1993)

Katsuhisa Sugimoto等人：“金属有机化学气相沉积形成的Fe_2O_3-Cr_2O_3-NiO人工钝化膜的耐腐蚀性”电化学会杂志。

Shigeaki Tanaka et al.: "Corrosion Characteristics of Fe_2O_3-Cr_2O_3 Artificial Passivation Films Under Potentiostatic Control" Materials Science and Engineering. A (in press). (1995)

Shigeaki Tanaka等：“恒电位控制下Fe_2O_3-Cr_2O_3人工钝化膜的腐蚀特性”材料科学与工程。

Katsuhisa Sugimoto: "Corrosion Resistance of Artificial Passivation Films Fe_2O_3‐Cr_2O_3‐NiO Formed by Metalorganic Chemical Vapor Deposition" Journal of the Electrochemical Society. 140. 1586-1592 (1993)

Katsuhisa Sugimoto：“金属有机化学气相沉积形成的人工钝化膜 Fe_2O_3-Cr_2O_3-NiO 的耐腐蚀性”电化学学会杂志 140. 1586-1592 (1993)。

Katsuhisa Sugimoto: "Corrosion Resistance of Artificial Passivation Films of Fe_2O_3-Cr_2O_3-NiO Formed by Metalorganic Chemical Vapor Deposition" Journal of the Electrochemical Society. 140. 1586-1592 (1993)

Katsuhisa Sugimoto：“金属有机化学气相沉积形成的Fe_2O_3-Cr_2O_3-NiO人工钝化膜的耐腐蚀性”电化学学会杂志。