Crystal Growth of Free Standing 3C-SiC Using Air-Bridge Structure
Crystal Growth of Free Standing 3C-SiC Using Air-Bridge Structure
批准号:
15360010
负责人:
NISHINO Shigehiro
金额:
$8.38万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2004
中文摘要
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英文摘要
Silicon carbide(SiC) is a promising material for the next generation. Among SiC polytypes, Cubic SiC (3C-SiC) has advanced electrical properties, like high low-field electron mobility and high saturated electron drift velocity. Heteroepitaxial growth of 3C-SiC on Si substrates allows a significant cost advantage in the fabrication of large-diameter wafers. However, the lower quality of this material grown heteroepitaxially on Si has hindered its development. A large number of defects such as misfit dislocations, twins, stacking faults and cracks have been identified at the SiC/Si interface, owning to the mismatches in both the lattice constant and the thermal expansion coefficients between the 3C-SiC films and Si substrates.This study reports on heteroepitaxial growth of 3C-SiC on Si substrate with air-bridge structure in order to reduce the high density of defects and the strain in the 3C-SiC epilayer. It has been necessary to investigate the epitaxial growth close to the 3C-SiC/Si in … More terface. 3C-SiC layer was grown mainly on a (111)-oriented silicon substrate by using Si2(CH3)6 (Hexamathyldisilane : HMDS). The crystallinity and surface morphology of 3C-SiC grown on Si(111) depended on the carbonization process. The diameter of each 3C-SiC island depended on the temperature of CVD growth at an early stage of epitaxial growth of 3C-SiC on Si substrate.Three-dimensional fine was formed by using "micro-channel epitaxy(MCE)", "facet-initiated lateral epitaxial overgrowth(FILEO)", "air-bridged structural growth(ASG)" and "lateral epitaxial overgrowth(LEO)". FILEO, ASG and LEO have the fabrication procedure within two CVD growth steps. The crystallinity of ELO formed in MCE became like polycrystalline without the control of nucleation and growth. In FILEO, triangular pyramid of 3C-SiC was formed by {110} facet, owning to the difference of growth rate along between [110] and [111] direction. The crystallinity of bridged regions above air-gap was improved from Raman spectra, compared with seed regions combined Si substrate in ASG. The crystallinity of ELO regions was inferior to that of seed regions in LEO. This result may be improved by close control of experimental parameters at initial stage of 3C-SiC grown on Si substrates. Less
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Raman microprobe mapping of residual microstresses in 3C-SiC film epitaxial lateral growth
3C-SiC 薄膜外延横向生长残余微应力的拉曼微探针图
DOI:
--
发表时间:
2004
期刊:
Applied Surface Science 228
影响因子:
--
作者:
[C.J.Lee, G.Pezzottie, Y.Okui, S.Nishino]
通讯作者:
S.Nishino
Suppression mechanism of double positioning growth in 3C-SiC(111) crystal by using an off-axis Si(110) substrate
离轴Si(110)衬底对3C-SiC(111)晶体双定位生长的抑制机制
DOI:
--
发表时间:
2005
期刊:
Mater.Sci.Forum 353-356
影响因子:
--
作者:
[M.Nakamura, T.Isshiki, T.Nishiguchi, K.Nishio, S.Ohshima, S.Nishino]
通讯作者:
S.Nishino
Micorstuructures in the Pendio epitaxial layer of 3C-SiC on Si substrate
Si衬底上3C-SiC Pendio外延层的微结构
DOI:
--
发表时间:
2005
期刊:
Mater.Sci.Forum 353-356
影响因子:
--
作者:
[A.Shoji, M.Nakamura, K.Mitikami, T.Isshiki, S.Ohshima, S.Nishino]
通讯作者:
S.Nishino
Effect of the substrate off-axis on the suppression of twin formation in CVD growth of (111)3C-SiC on (110)Si substrate
(110)Si衬底上CVD生长(111)3C-SiC时衬底偏轴对抑制孪晶形成的影响
DOI:
--
发表时间:
2005
期刊:
Materials Science Forum 483-485
影响因子:
--
作者:
[T.Nishiguchi, M.Nakamura, K.Nishio, T.Isshiki, S.Ohshima, S.Nishino]
通讯作者:
S.Nishino
Structural Analysis of (211) 3C-SiC on (211) Si Substrates Grown by Chemical Vapor Deposition
化学气相沉积 (211) Si 衬底上 (211) 3C-SiC 的结构分析
DOI:
--
发表时间:
2005
期刊:
Materials Science forum 483-485
影响因子:
--
作者:
[T.Nishiguchi, Y.Mukai, M.Nakamura, K.Nishio, T.Isshiki, S.Ohshima, S.Nishino]
通讯作者:
S.Nishino
共 21 条
Crystal growth of 3C-SiC on Si substrates by channel epitaxy method
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批准号:13450012
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.54万
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财政年份:2001
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负责人:NISHINO Shigehiro
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依托单位:
Epitaxial Growth of High Quality SiC by Sublimation Close Space Technique with High Growtn Rate
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批准号:09450011
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.83万
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财政年份:1997
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负责人:NISHINO Shigehiro
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依托单位:
Low Temperature Growth of Semiconductor Sic by Photo-Plasma Double Excitation
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批准号:01550016
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.28万
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财政年份:1989
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负责人:NISHINO Shigehiro
-
依托单位:
国内基金
海外基金
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单晶3C-SiC中应力诱导缺陷的各向异性演化规律及其动力学机理研究
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批准号:JCZRLH202600088
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项目类别:省市级项目
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资助金额:--
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批准年份:2026
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负责人:
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依托单位:
3C-SiC外延生长中堆垛层错的抑制机制及电学输运性能
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批准号:JCZRLH202500981
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负责人:
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基于金刚石纳米锥群刃的多能场复合3C-SiC微纳结构广域成形机理
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批准号:52375441
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资助金额:50万元
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批准年份:2023
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负责人:徐锋
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4H/3C-SiC异构结制备及其电学特性研究
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批准号:62374116
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批准年份:2023
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负责人:韦文生
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依托单位:
快重离子辐照3C-SiC材料蠕变效应的研究
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批准号:U1832133
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项目类别:联合基金项目
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资助金额:54.0万元
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批准年份:2018
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负责人:李炳生
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依托单位:
具有荧光协同效应NMOFs/一维3C-SiC材料优化设计及对典型PAHs识别机制研究
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批准号:21771165
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负责人:崔节虎
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广谱光吸收的上转换发光增强3C-SiC纳米复合结构设计及光解水研究
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批准号:51372169
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资助金额:78.0万元
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批准年份:2013
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负责人:何芳
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依托单位:
3C-SiC纳米复合结构的构建及其电子态和发光特性研究
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资助金额:36.0万元
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负责人:吴兴龙
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依托单位:
3C-SiC自支撑衬底及其金属氧化物场效应晶体管(MOSFETs)研究
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批准号:60606003
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资助金额:34.0万元
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批准年份:2006
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负责人:罗木昌
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