CONTROL OF FREE RADICALS FOR CONSTRUCTION OF MESOSCOPIC STRUCTURES OF MATERIALS
CONTROL OF FREE RADICALS FOR CONSTRUCTION OF MESOSCOPIC STRUCTURES OF MATERIALS
批准号:
05237102
负责人:
SHIMIZU Isamu
金额:
$50.05万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research on Priority Areas
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 1995
中文摘要
利用椭圆偏振光谱、水溶液中的扫描隧道显微镜(AFM)、傅立叶变换红外光谱(FTIR-ATR)等手段对半导体摩尔微观结构进行了实时控制。主要研究结果如下:(1)利用生长过程中的自由基控制中程结构,获得了高质量的氢化非晶硅,其间隙为1.55 eV~2.10 eV,即所谓的“化学退火法”。(2)通过椭圆偏振光谱原位观察,控制表面反应,在玻璃衬底上生长出高质量的多晶硅薄膜。(3)在FTIR-ATR观察下,通过控制自由基在硅片上的表面反应,发展了高流动性化学气相沉积在硅片上形成精细图形的新技术。(4)为了制备高质量的非晶硅,对等离子体中产生的自由基进行了诊断性研究。因此,通过精确控制离子入射到生长表面,获得了具有高载流子迁移率的a-Si:H薄膜。(5)利用原子力显微镜(STM)对电化学电位控制下的扫描隧道显微镜(STM)进行实时观察,揭示了用HF或NH4F溶液对Si(111)、(001)进行化学刻蚀的原子尺度机理。(6)通过控制氢等离子体制备了硅纳米晶颗粒,并用原子力显微镜对其进行了操纵,在颗粒中观察到了单电子隧穿和可见光发射等量子尺寸效应。
英文摘要
The real time control of the mososcopic structures of semiconductors was made by means of free radicals under the in situ observation with spectroscopic ellipsometry, STM (AFM) in an aqueous solution, FTIR-ATR,etc.Followings are the outstanding findings resulted in : (1) High quality hydrogenated amorphous silicon with the gaps from 1.55eV to 2.10eV was fabricated by controlling the medium range structures with the aid of free radicals during the growth, so called "Chemical Annealing". (2) High quality polycrystalline silicon thin films were grown on glass substrate under control of the surface reaction under the in situ observation with spectroscopic ellipsometry. (3) Novel technique termed the high fluidity CVD was developed by controlling surface reaction of free radicals under the observation with FTIR-ATR for making fine patterns on Si wafer. (4) A diagnostic study was carried out on the free radicals generated in plasma for the aim of making high quality amorphous silicon. Consequently, a-Si : H films showing high carriers mobility were achieved by the precise control of ions impinging on the growing surface. (5) The mechanism in atomic scale was revealed for the chemical etching of Si (111), (001) with HF or NH4F solution under the real time observation with STM (AFM) under controlling the electrochemical potentials. (6) Silicon nanocrystalline particles were fabricated by controlling hydrogen plasma and were manipulated with a AFM.Some quanmsize effets such as a single electron tunneling and the emission of visible light were practically observed in the particles.
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R.W.Collins,I.Shimizu: "Insitu observation using spectroscopic ellipsometry of surface of semiconductive thin films" OYO-BUTSURI. 65. 237-243 (1996)
R.W.Collins,I.Shimizu:“使用光谱椭圆光度法对半导体薄膜表面进行原位观察”OYO-BUTSURI。
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通讯作者:
M.Otabe,T.Katani,T.Ifuku,H.Yajima and S.Oda: "Nanocrystalline silicon formation in SiH_4 plasma cells" J.Non-cryst.Solids. 198-200. 875-878 (1996)
M.Otabe、T.Katani、T.Ifuku、H.Yajima 和 S.Oda:“SiH_4 等离子体细胞中纳米晶硅的形成”J.Non-cryst.Solids。
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M.Otobe: "Fabrication of nanocrystalline Si by SiH_4 plasma cell" Mat. Res. Soc. Symp. Proc.377. 51-56 (1995)
M.Otobe:“通过 SiH_4 等离子体电池制造纳米晶硅”Mat。
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M.Otobe: "Selective Etching of Hydrogenated Amorphous Silicon by Hydrogen Plasma" Jpn.J.Appl.Phys.33. 4442-4445 (1994)
M.Otobe:“氢等离子体对氢化非晶硅的选择性蚀刻”Jpn.J.Appl.Phys.33。
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K. kaji: "Atomic scale etching process ofn-Si(111)in NH_4F solution: In situ scanning tunneling microscopy" J. Appl. Phys.78. 5727-5733 (1995)
K. kaji:“NH_4F 溶液中 n-Si(111) 的原子尺度蚀刻过程:原位扫描隧道显微镜” J. Appl。
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共 43 条
Rhythm generation in honeybees: feeding cycle and period
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批准号:13640679
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.64万
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财政年份:2001
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依托单位:
Molecular neuro-physiological study of insect diapause mechanism
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Inventory systems for conservation of tropical rainforest
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财政年份:1998
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依托单位:
Structure control of semiconductor hetero-ineterfaces utilizing 'hydrogen atom' as mediators
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批准号:09305002
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$19.78万
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财政年份:1997
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负责人:SHIMIZU Isamu
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依托单位:
Investigation : on of insect Photoperidic receptor using moleculer Biology
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财政年份:1996
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依托单位:
Fabrication of Stable Amorphous Silicon
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批准号:05044084
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依托单位:
Physiological Research of Photoperiodic nesporse of insect using laser micro-beam.
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批准号:03640602
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资助金额:$1.15万
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财政年份:1991
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负责人:SHIMIZU Isamu
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依托单位:
Analysis of Chemical Reactions for Control of Si-Network-from Amorphous to Single Crystal-
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批准号:02402021
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项目类别:Grant-in-Aid for General Scientific Research (A)
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资助金额:$13.06万
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财政年份:1990
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负责人:SHIMIZU Isamu
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依托单位:
海外基金