Development of High Speed Sub-Nanometer Positioning Table System for Future ULSI Production

随着对加工精度和生产率的要求越来越高，对高速超精密定位技术的要求也越来越高。特别是半导体设备的工作台系统，如步进扫描曝光系统，不仅要求具有良好的定位稳定性，而且要求具有纳米级的跟踪精度，因此，本研究项目开发了一种由无刷直流直线电机驱动、空气静压轴承引导的高速亚纳米级定位工作台系统。结果表明：(1)在行程300 mm时的偏航误差为1.5-2；(2)亚纳米量级的定位分辨率；(3)60 mm点对点运动的建立时间为0.34s，定位误差小于5 nm；(4)进给速度为200 mm/S时，跟踪误差为20 nm

With the demands for higher machining accuracy and higher productivity, high speed ultraprecision positioning technologies are increasingly required. Especially, requirements for the table system of semiconductor equipment, such as a step and scan exposure system, are not only good positioning stability but also nanometer order tracking accuracy.In this research project, therefore, a high speed sub-nanometer positioning table system driven by a blushless DC linear motor and guided by an aerostatic bearing has been developed. As a result, the following available results could be obtained.(1) Yawing error of 1.5murad at traveling length of 300mm(2) Sub-nanometer order positioning resolution(3) Settling time of 0.34s for a 60mm point-to-point motion with a positioning error of less than 5nm(4) Tracking error (sigma) of 20nm at feed rate of 200mm/s