Development of High Speed Sub-Nanometer Positioning Table System for Future ULSI Production

为未来超大规模集成电路生产开发高速亚纳米定位工作台系统

• 批准号: 08555033
• 负责人: SHINNO Hidenori
• 金额: $ 9.22万
• 依托单位: Tokyo Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1996
• 资助国家: 日本
• 起止时间: 1996 至 1997
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08555033/
• 关键词: Table System; Positioning Control; Semiconductor equipment; High Seed Positioning; Sub-Nanometer; Linear Motor; Laser Feedback; Accuracy of Motion; レ一ザ-フィードバック; 電気粘性流体

With the demands for higher machining accuracy and higher productivity, high speed ultraprecision positioning technologies are increasingly required. Especially, requirements for the table system of semiconductor equipment, such as a step and scan exposure system, are not only good positioning stability but also nanometer order tracking accuracy.In this research project, therefore, a high speed sub-nanometer positioning table system driven by a blushless DC linear motor and guided by an aerostatic bearing has been developed. As a result, the following available results could be obtained.(1) Yawing error of 1.5murad at traveling length of 300mm(2) Sub-nanometer order positioning resolution(3) Settling time of 0.34s for a 60mm point-to-point motion with a positioning error of less than 5nm(4) Tracking error (sigma) of 20nm at feed rate of 200mm/s

随着更高加工精度和更高生产率的要求，对高速超精密定位技术的需求越来越大。尤其是半导体设备的工作台系统，如步进扫描曝光系统，不仅要求良好的定位稳定性，而且要求纳米级跟踪精度。因此，本研究项目开发了一种由无刷直流直线电机驱动、空气静压轴承引导的高速亚纳米级定位工作台系统。 (1) 行程长度为 300mm 时，偏航误差为 1.5murad (2) 亚纳米级定位分辨率 (3) 60mm 点对点运动的稳定时间为 0.34s，定位误差小于 5nm (4) 进给速度为 200mm/s 时，跟踪误差（西格玛）为 20nm