STUDY OF ULTRA-FINE STRUCTURED OPTICAL COMPONENTS USIING MICROMACHINING

利用微加工技术研究超细结构光学元件

• 批准号: 10305020
• 负责人: HANE Kazuhiro
• 金额: $ 25.22万
• 依托单位: TOHOKU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10305020/
• 关键词: GRATING; ANTI-REFLECTION; MICROMACHINING; SUB-WAVELENGTH; ETCHING; NANO-OPTICS; サブ波長格子; グレーティング; 反射防止; モスアイ構造; 微細格子; 電子線描画; シリコン; 光学素子; 回折格子; 高アスペクト比エッチング; 無反射表面

We proposed a fabrication technique for sub-wavelength grating using electron-beam drawing machine and fast atom beam etching machine. On the surface of nonconductive optical glass, 150nm period surface gratings were fabricated. The etching of the nonconductive surface was carried out by using advantageously the neutral fast atom beam instead of ions in the conventional etching plasma. Without charging the surface, the deep etched profile with high aspect ratio was obtained. Using the proposed method, the reflection from the optical glass surface was suppressed considerably.A program for calculating the rigorous electro-magnetic field in sub-wavelength grating was developed. It was revealed that the reflection properties were influenced very much by the period and aspect ratio of the gratings.Using porous alumina membrane as a mask, the sub-wavelength gratings having 100nm period and the aspect ratio of 6 were fabricated on Si substrate. In the wavelength region from 370nm to 800nm, the superior properties for anti-reflection were obtained. Moreover, sub-wavelength gratings were also fabricated on the surface of the gallium arsenic light emission diode. Using the etching property of GaAs, tapered profile of surface grating was fabricated and a increase of the light emission was successfully obtained. In addition, the combinations between the surface gratings and micro-actuators were also investigated.

提出了一种利用电子束拉丝机和快速原子束刻蚀机制作亚波长光栅的方法。在非导电光学玻璃表面制作了周期为150 nm的表面光栅。通过有利地使用中性快原子束代替常规蚀刻等离子体中的离子来进行非导电表面的蚀刻。在不对表面充电的情况下，获得了具有高纵横比的深蚀刻轮廓。该方法有效地抑制了光学玻璃表面的反射，并编制了计算亚波长光栅中严格电磁场的程序。以多孔氧化铝膜为掩模，在Si衬底上制作了周期为100 nm、深宽比为6的亚波长光栅。在370 ~ 800 nm波长范围内，薄膜具有良好的上级减反射性能。此外，还在砷化镓发光二极管表面制作了亚波长光栅。利用GaAs的刻蚀特性，制作了锥形表面光栅，成功地获得了发光强度的增加。此外，还研究了表面光栅与微致动器的组合。

项目成果

Y.Kanamori,M.Sasaki,K.Hane: "Antireflection structures for visible and infrared wave lengths fabricated on silicon substrates by fast atom beam etching" Proc.Opt.Eng.for Sensing and Nanotechnology. 1(印刷中). (1999)

Y.Kanamori、M.Sasaki、K.Hane：“通过快速原子束蚀刻在硅基底上制造可见光和红外波长的抗反射结构”Proc.Opt.Eng.for Sensing and Nanotechnology 1（正在出版）。 ）

Y.Kanamori, H.Kikuta, K.Hane: "Broadband antireflection gratings for glass substrates fabricated by fast atom beam etching"Jpn. J. Appl. Phys. Part2. 39. L735-L737 (2000)

Y.Kanamori、H.Kikuta、K.Hane：“通过快速原子束蚀刻制造的玻璃基板的宽带抗反射光栅”Jpn。

H.Sai,H.Yagami.Y.Akiyama,Y.Kanamori,K.Hane: "Spectorl control of thermal emission by periodic microstructured surfaces"Journal Optics A : pure Applied Optics. (in press).

H.Sai、H.Yagami.Y.Akiyama、Y.Kanamori、K.Hane：“周期性微结构表面热发射的光谱控制”光学杂志 A：纯应用光学。

Y.Li,M.Sasaki,K.Hane: "A Simple Si Pitch-variable Grating With Shape Memory Alloy Actuator"電気学会論文誌E. 120・11. 503-508 (2000)

Y.Li、M.Sasaki、K.Hane：“带有形状记忆合金执行器的简单硅间距可变光栅”IEEJ Transactions E. 120・11 (2000)。

S.Kumagai,M.Sasaki,M.Koyanagi,K.Hane: "Dominance of Cl_2^- or Cl^+ Ions in Time-Modulated Inductively Coupled Cl_2 Plasma Investigated with Laser-Induced Fluorescence and Probe Measurement "Japan Journal of Applied Phusics. 39. 6980-6984 (2000)

S.Kumagai、M.Sasaki、M.Koyanagi、K.Hane：“用激光诱导荧光和探针测量研究时间调制感应耦合 Cl_2 等离子体中 Cl_2^- 或 Cl^ 离子的优势”日本应用物理学杂志。