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Ring Laser Gyroscopes by MEMS Technology

Ring Laser Gyroscopes by MEMS Technology
采用 MEMS 技术的环形激光陀螺仪
批准号:
15310107
负责人:
MAENAKA Kazusuke
金额:
$7.68万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2005

项目摘要

项目成果

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中文摘要
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英文摘要
In this research project, we have established basic technologies for MEMS-based Ring Laser Gyroscope (MEMS RLG). At first, we newly suggested an optical closed-loop by (111) mirror which results from wet anisotropic etching of single crystalline silicon-wafer with (110) surface orientation. The optimum etching condition, effect of miss-alignment, etc. were investigated and we found that the (111) mirror have sufficient quality for an optical mirror at the optimum conditions. Other required optical elements such as lenses and prisms were realized by photo-sensitive epoxy resin and their optical characteristics were examined and confirmed that they are useful for optical-devices. Moreover, alignment and clumping structures for laser diode chip were also constructed by this resin. Then, we combine the mirror fabrication-process and epoxy-resin based process in batch manner, which enables mass production and low cost. In order to improve reflectance of the mirror, we developed direct gold-electroplating technique for silicon surface. This technique eliminates the complicated process to deposit a metal film to the each mirrors by sputtering or evaporation. Many numbers of techniques mentioned above are very useful not only for MEMS RLG but for many devices in optical MEMS field. Now, we have a plan of collaboration with some industries to develop the MEMS RLG which can be put on the market.
期刊论文(14)
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会议论文
マイクロミラー設計に向けた厚膜フォトレジストSU-8の粘弾性特性評価
用于微镜设计的厚膜光刻胶 SU-8 的粘弹性特性评估
DOI: --
发表时间: 2004
期刊: 電気学会研究会資料 MSS-05-3
影响因子: --
作者: [Y.Mizugaki, H.Shimada, T.Fujita, T.Fujita et al., T.Namazu, T.Namazu et al., 瀧尾健一]
通讯作者: 瀧尾健一
Improvement of Etched Surface of Silicon (110) Plane Using anIodine-supersaturated KOH Etchant
使用碘过饱和KOH蚀刻剂改善硅(110)面的蚀刻表面
DOI: --
发表时间: 2003
期刊: Micronanoelectronic Technology Vol.40,No.6
影响因子: --
作者: [Y.Mizugaki, H.Shimada, T.Fujita, T.Fujita et al., T.Namazu, T.Namazu et al., 瀧尾健一, K.Takio et al., Y.Jing]
通讯作者: Y.Jing
DOI: --
发表时间: 2003
期刊: Papers on Technical Meeting, IEEJ (in Japanese) PHS-03-17
影响因子: --
作者: [Y.Mizugaki, H.Shimada, T.Fujita, T.Fujita et al., T.Namazu, T.Namazu et al., 瀧尾健一, K.Takio et al., Y.Jing, Y.Jing, Yupeng Jing, 中道傑, Y.Jing et al., Y.Jing et al., Yupeng Jing et al., S.Nakamichi et al.]
通讯作者: S.Nakamichi et al.
Selective and Direct Gold Electroplating on Silicon Surface for MEMS Applications
用于 MEMS 应用的硅表面选择性直接镀金
DOI: --
发表时间: 2006
期刊: Tech.Dig.of the 19th IEEE Int.Conf, on Microelectromechanical Systems
影响因子: --
作者: [Y.Mizugaki, H.Shimada, T.Fujita]
通讯作者: T.Fujita
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