Investigation for improved performance of new-type extremely-stable-wavelength light-emitting devices based on rare-earth-doped III-V semiconductors
Investigation for improved performance of new-type extremely-stable-wavelength light-emitting devices based on rare-earth-doped III-V semiconductors
批准号:
15360164
负责人:
FUJIWARA Yasufumi
金额:
$9.54万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2005
中文摘要
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英文摘要
Rare-earth (RE) doped semiconductors have gained significant attention as a promising new class of materials that emit light from the RE 4f shell by means of electrical injection, in which the energy of electron-hole pairs is transferred to the RE shell. The intra-4f shell transitions of RE ions give rise to sharp emission lines whose wavelengths are largely independent of both the host materials and temperature. This stability occurs because the filled outer 5s and 5p electron shells screen transitions within the inner 4f electron shell from the interaction with the host. The intra-4f shell transitions from the first excited state (^4I_<13/2>) to the ground state (^4I_<15/2>) of Er^<3+> ions at around 1.5 μm is of special interest because the wavelength matches the minimum loss region of silica fibers used in optical communications.In this research project, we investigated new-type extremely-stable-wavelength light-emitting devices with Er,O-codoped GaAs (GaAs:Er,O) to get a clue for … More their improved performance. Results obtained experimentally are summarized as follows :1) Er-related luminescence was observed in GaInP/GaAs:Er,O/GaAs doubleheterostructures by injecting current at room temperature. The EL spectrum was dominated by Er-2O lines, suggesting a successful formation of the Er-2O center and preferential excitation of the center by current injection.2) The current density dependence of the EL intensity revealed an extremely large excitation cross section of Er ions by current injection, approximately 10^<-15> cm^2. The large excitation cross section was confirmed by time-resolved measurements of the EL intensity. It is by two orders in magnitude larger than that of Er-doped Si LEDs (6 x 10^<-17> cm^2).3) Carrier dynamics in GaAs:Er,O were investigated in a picosecond time scale by a pump and probe reflection technique. Time-resolved reflectivity exhibited a characteristic dip ; a steep decrease to negative in less than 1 ps and then an increase in more than 100 ps. The reflectivity increase at the initial stage, consisting of two components, depended strongly on Er concentration. The Er-concentration dependence on the components reveals that an initial faster decay is due to the capture of nonequilibrium carriers by a trap induced by Er and O codoping Less
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Injection-type light-emitting devices using rare-earth-doped III-V semiconductors
使用稀土掺杂III-V族半导体的注入型发光器件
DOI:
--
发表时间:
2004
期刊:
Oyo Buturi [in Japanese] 73(2)
影响因子:
--
作者:
[Y.Fujiwara, A.Koizumi, Y.Takeda]
通讯作者:
Y.Takeda
Nonequilibrium carrier dynamics studied in Er,O-codoped GaAs by pump-probe reflection technique
利用泵浦探针反射技术研究 Er,O 共掺杂 GaAs 中的非平衡载流子动力学
DOI:
--
发表时间:
2005
期刊:
Materials Research Society Symposium Proceedings, Rare-Earth Doping for Optoelectronic Applications 866
影响因子:
--
作者:
[K.Nakamura, Y.Fujiwara, Y.Fujiwara, Y.Fujiwara]
通讯作者:
Y.Fujiwara
Direct observation of trapping of photoexcited carriers in Er,O-codoped GaAs
直接观察 Er,O 共掺杂 GaAs 中光生载流子的捕获
DOI:
--
发表时间:
2006
期刊:
Physica B 376-377
影响因子:
--
作者:
[M.de Boissieu, S.Francoual, Y.Kaneko, T.Ishimasa, K.Nakamura]
通讯作者:
K.Nakamura
Effects of S-doping and subsequent annealing on photoluminescence around 1.54μm from Er-containing ZnO
S掺杂和随后的退火对含Er ZnO 1.54μm 附近光致发光的影响
DOI:
--
发表时间:
2005
期刊:
Materials Science Forum 475-479
影响因子:
--
作者:
[Z.Zhou, N.Sato, T.Komaki, A.Koizumi, T.Komori, M.Morinaga, Y.Fujiwara, Y.Takeda]
通讯作者:
Y.Takeda
Extremely large Er excitation cross section in Er,O-codoped GaAs light emitting diodes grown by organometallic vapor phase epitaxy
有机金属气相外延法生长的 Er,O 共掺杂 GaAs 发光二极管具有极大的 Er 激发截面
DOI:
--
发表时间:
2003
期刊:
Materials Research Society Symposium Proceedings, Progress in Semiconductors II, Electronic and Optoelectronic Applications 744
影响因子:
--
作者:
[Y.Fujiwara, A.Koizumi, K.Inoue, A.Urakami, T.Yoshikane, Y.Takeda]
通讯作者:
Y.Takeda
共 37 条
Development of highly efficient wavelength-conversion materials for next-generation solar cells using rare-earth ions doped in semiconductors
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批准号:16K14233
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.33万
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财政年份:2016
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of quantum informative function using rare-earth ions doped well-controllably in semiconductors
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批准号:26630131
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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财政年份:2014
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依托单位:
Development of bright red light-emitting devices by elucidation and control of light-emitting mechanism in rare-earth-doped nitride semiconductors
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批准号:24226009
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项目类别:Grant-in-Aid for Scientific Research (S)
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资助金额:$136.12万
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财政年份:2012
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of terahertz emitters and detectors using rare-earth-doped semiconductors
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批准号:23656220
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
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财政年份:2011
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of advanced luminescent functionality by control of atomic configuration in rare-earth doped semiconductors
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批准号:20900123
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项目类别:
-
资助金额:$0.0万
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财政年份:2008
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of Properties and Functionalities by Precise Control of Rare-Earth Doping
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批准号:19GS1209
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项目类别:Grant-in-Aid for Creative Scientific Research
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资助金额:$336.96万
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财政年份:2007
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负责人:FUJIWARA Yasufumi
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依托单位:
Materials for new semiconductor lasers; atomically-controlled, growth of rare-earth-doped III-V semiconductors with high quality
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批准号:13555002
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.06万
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财政年份:2001
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负责人:FUJIWARA Yasufumi
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依托单位:
Atomically-controlled growth and properties of low-dimensional lanthanoide/semiconductor quantum structures
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批准号:11450119
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.7万
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财政年份:1999
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负责人:FUJIWARA Yasufumi
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依托单位:
ATOMIC-LAYER CONTROLLED SUPER-HETEROEPITAXY AND PROPERTIES OF LANTHANOIDE/SEMICONDUCTOR STRUCTURES
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批准号:08650009
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.47万
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财政年份:1996
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负责人:FUJIWARA Yasufumi
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依托单位:
海外基金