Materials for new semiconductor lasers; atomically-controlled, growth of rare-earth-doped III-V semiconductors with high quality
Materials for new semiconductor lasers; atomically-controlled, growth of rare-earth-doped III-V semiconductors with high quality
批准号:
13555002
负责人:
FUJIWARA Yasufumi
金额:
$8.06万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2003
中文摘要
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英文摘要
Rare-earth (RE) doped semiconductors have gained significant attention as a promising new class of materials that emit light from the RE 4f shell by means of electrical injection, in which the energy of electron-hole pairs is transferred to the RE shell. The intra-4f shell transitions of RE ions give rise to sharp emission lines whose wavelengths are largely independent of both the host materials and temperature. This stability occurs because the filled outer 5s and 5p electron shells. screen transitions within the inner 4f electron shell from the interaction with the host. The intra-4f shell transitions from the first excited state (4^I_<13/2>) to the ground state (4^I_<15/2>) of Er^<3+> ions at around 1.5 μm is of special interest because the wavelength matches the minimum loss region of silica fibers used in optical communications.In this research project, we investigated atomically-controlled growth of Er-doped GaAs with high quality for new-type light-emitting devices. Results obt … More ained experimentally are summarized as follows1)By optimizing reactor structure and growth temperature, the abrupt change in composition at the heterointerface consisting of different group-V elements was successfully obtained.2)Er-20 configuration was selectively formed by codoping Er and O to GaAs, resulting in the increase in PL intensity by two orders in magnitude: The amount of O in growth ambient played an important role for the intensity increase.3)Er-related luminescence was observed in GaInP/GaAs : Er, O/GaAs doubleheterostructures by injecting, current at room temperature. The EL spectrum was dominated by Er-20 lines, suggesting a successful formation of the Er-20 center and a preferential excitation of the center by current injection.4)The current density dependence of the EL intensity revealed an extremely large excitation cross section of Er ions by current injection, approximately 10^<-15> cm^2. The large excitation cross section was confirmed by time-resolved measurements. of the EL intensity. It is by two orders in magnitude larger than that of Er-doped Si LEDs (6x10^<-17> cm^2). Less
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Y.FUJIWARA: "Extremely large Er excitation cross section in r,O-codoped GaAs light emitting diodes grown by organometallic vapor phase epitaxy"Materials Research Society Symposium Proceedings, Progress in Semiconductors II, Electronic and Optoelectronic A
Y.FUJIWARA:“通过有机金属气相外延生长的 r,O-共掺杂 GaAs 发光二极管中的极大 Er 激发截面”材料研究学会研讨会论文集,半导体进展 II,电子和光电 A
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H.OHTA: "Codoping effects of O_2 into Er-doped InP epitaxial layer grown by OMVPE"Physica E. 10(1-3). 399-402 (2001)
H.OHTA:“O_2 共掺杂到通过 OMVPE 生长的掺铒 InP 外延层中的效应”Physica E. 10(1-3)。
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A.Koizumi, Y.Fujiwara, K.Inoue, A.Urakami, T.Yoshikane, Y.Takeda: "Room-temperature 1.54μm light emission from Er, O-codoped GaAs/GaInP LEDs grown by low-pressure organometallic vapor phase epitaxy"Japanese Journal of Applied Physics. 42(4B). 2223-2225 (2
A.Koizumi、Y.Fujiwara、K.Inoue、A.Urakami、T.Yoshikane、Y.Takeda:“低压有机金属气相生长的 Er、O 共掺杂 GaAs/GaInP LED 的室温 1.54μm 光发射外延”日本应用物理学杂志.42(4B).2223-2225(2
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J.Yoshikawa, S.Okubo, H.Ohta, T.Koide, T.Kawamoto, Y.Fujiwara, Y.Takeda: "ESR study of heavily doped GaAs : Er grown by organometallic vapor phase epitaxy"EPR in the 21st Century : Basics, Applications to aterial, Life, Earth Sciences (edited by A.Kawamor
J.Yoshikawa、S.Okubo、H.Ohta、T.Koide、T.Kawamoto、Y.Fujiwara、Y.Takeda:“重掺杂 GaAs 的 ESR 研究:通过有机金属气相外延生长的 Er”21 世纪的 EPR :
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藤原 康文: "希土類添加III-V族半導体による電流注入型発光デバイス"応用物理. 73(2). 224-228 (2004)
Yasufumi Fujiwara:“使用稀土掺杂 III-V 半导体的电流注入型发光器件”应用物理学 73(2) (2004)。
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共 31 条
Development of highly efficient wavelength-conversion materials for next-generation solar cells using rare-earth ions doped in semiconductors
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批准号:16K14233
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.33万
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财政年份:2016
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of quantum informative function using rare-earth ions doped well-controllably in semiconductors
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批准号:26630131
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.41万
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财政年份:2014
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of bright red light-emitting devices by elucidation and control of light-emitting mechanism in rare-earth-doped nitride semiconductors
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批准号:24226009
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项目类别:Grant-in-Aid for Scientific Research (S)
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资助金额:$136.12万
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财政年份:2012
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of terahertz emitters and detectors using rare-earth-doped semiconductors
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批准号:23656220
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
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财政年份:2011
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of advanced luminescent functionality by control of atomic configuration in rare-earth doped semiconductors
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批准号:20900123
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项目类别:
-
资助金额:$0.0万
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财政年份:2008
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负责人:FUJIWARA Yasufumi
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依托单位:
Development of Properties and Functionalities by Precise Control of Rare-Earth Doping
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批准号:19GS1209
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项目类别:Grant-in-Aid for Creative Scientific Research
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资助金额:$336.96万
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财政年份:2007
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负责人:FUJIWARA Yasufumi
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依托单位:
Investigation for improved performance of new-type extremely-stable-wavelength light-emitting devices based on rare-earth-doped III-V semiconductors
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批准号:15360164
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.54万
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财政年份:2003
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负责人:FUJIWARA Yasufumi
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依托单位:
Atomically-controlled growth and properties of low-dimensional lanthanoide/semiconductor quantum structures
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批准号:11450119
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.7万
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财政年份:1999
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负责人:FUJIWARA Yasufumi
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依托单位:
ATOMIC-LAYER CONTROLLED SUPER-HETEROEPITAXY AND PROPERTIES OF LANTHANOIDE/SEMICONDUCTOR STRUCTURES
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批准号:08650009
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.47万
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财政年份:1996
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负责人:FUJIWARA Yasufumi
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依托单位:
海外基金