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Use of carbon nanocoil as catalyst support for development of high-performance fuel cell

Use of carbon nanocoil as catalyst support for development of high-performance fuel cell
使用碳纳米线圈作为催化剂载体开发高性能燃料电池
批准号:
22760208
负责人:
SUDA Yoshiyuki
金额:
$2.58万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2011

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中文摘要
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英文摘要
When carbon nanocoils(CNCs) are used in fuel cell electrodes, the diffusion of fuel and gas, and the removal of reaction products, becomes considerably smoother. In this research project, I used CNC as an anode or cathode catalyst support material in direct methanol fuel cells(DMFCs). Other carbon nanoparticles, Arc-Black(AcB) and Vulcan, were also used as catalyst supports to compare with the CNCs. Compared with the catalyst layers of AcB and Vulcan, the catalyst layer of CNCs was confirmed to have several voids. As for the anode catalysts, the voltages of the PtRu/CNC and PtRu/Vulcan became almost the same at a high current density. As for the cathode catalysts, the power density of Pt/CNC was 1. 2 times higher than that of Pt/Vulcan and 1. 6 times higher than that of Pt/AcB. These results clearly show that CNC is a good catalyst support for fuel cell.
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Removal of diamond-like carbon film by oxygen-dominated plasma beam converted from filtered carbon-cathodic arc
过滤碳阴极电弧转化的氧主导等离子束去除类金刚石碳膜
DOI: --
发表时间: 2011
期刊: Japanese Journal of Applied Physics
影响因子: 1.5
作者: [H. Tanoue, M. Kamiya, Y. Suda, S. Oke, H. Takikawa, Y. Hasegawa, M. Taki, N. Tsuji, T. Ishikawa, H. Yasui]
通讯作者: H. Yasui
高品質DLC膜形成に向けた真空アークプラズマビームの制御
真空电弧等离子束控制可形成高质量 DLC 薄膜
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [Shinichiro MUROOKA, Keisuke TOMODA, Nobukazu HOSHI, Junnosuke HARUNA, Meifen CAO, Atsuhiro YOSHIZAKI and Keiichi HIRATA, 滝川浩史]
通讯作者: 滝川浩史
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [Qi Zhang, Xiangdong Sun, Yanru Zhong, Biying Ren and Mikihiko Matsui, 柏木大幸]
通讯作者: 柏木大幸
真空アークプラズマを用いたDLC:Si:H膜の合成
采用真空电弧等离子体合成 DLC:Si:H 薄膜
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [加藤, 佐野, 鈴置, 須藤利文, 田上英人]
通讯作者: 田上英人
125
    Technology of Formation of Ge Virtual Substrates by Growth of Ge Flat Films Directly on Si Using Sputter Epitaxy Method
    Observation of electromagnetic induction phenomena of a nanometer-scale coil
    • 批准号:
      25630110
    • 项目类别:
      Grant-in-Aid for Challenging Exploratory Research
    • 资助金额:
      $2.58万
    • 财政年份:
      2013
    • 负责人:
      SUDA Yoshiyuki
    • 依托单位:
    Technology of Formation of Ge Flat Film Directly on Si by P SurfactantEffect and Sputter Epitaxy Method
    High-Density New Two-Terminal Resistive Nonvolatile Memory Using SiC and Its Integration Technology
    海外基金