Microfabrication of RF-MEMS devices using synchrotron x-ray lithography

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Radio frequency (RF) wireless systems are constantly being pushed to higher frequencies, while continuing trends towards ever smaller, more power efficient, and cheaper wireless devices are severely challenging traditional technologies. RF micro-electro-mechanical-systems (RF MEMS) devices can offer improved isolation, lower power dissipation, and reduced size and weight, and are poised to replace conventional devices and even enable new circuit architectures in future wireless applications.Fabrication of RF MEMS devices is typically based on surface microfabrication techniques, restricting devices to flat 2D structures. Synchrotron-based deep X-ray lithography (XRL) is a fundamentally different microfabrication approach, enabling 3D vertical wall structures with heights of hundreds of microns or even millimetres. Exploiting the 3rd dimension offers tremendous opportunity for novel RF devices, and Dr. Klymyshyn's group has adapted synchrotron XRL processes to produce high-performance RF coupler, resonator, and variable impedance structures. The research program is unique in Canada, and also an international collaboration between USaskatchewan, TRLabs, and the Inst. of Microstructure Technology, Research Center Karlsruhe (FZK), Germany.Research will continue to develop new vertical RF MEMS devices, and also extend these to more complicated circuits such as filters and diplexers to produce entirely new structures. The research will also assist in developing Canada's first XRL facility (SyLMAND - Synchrotron Laboratory for Micro/Nano Devices), at the Canadian Light Source, one of the largest scientific projects in Canada. Currently under construction, SyLMAND will provide the unique capabilities of XRL to Canadian researchers for applications in many fields including telecom, aerospace, sensing, microfluidics, and medicine.