Particles in Plasmas: Electron Transport Coefficients and Discharge Stability
Particles in Plasmas: Electron Transport Coefficients and Discharge Stability
批准号:
8803170
负责人:
Mark Kushner
金额:
$19.95万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-08-15 至 1992-01-31
中文摘要
中低压等离子体和气体放电用于各种技术上重要的应用(例如,等离子体加工,气体激光器,等离子体开关)。这些等离子体的气体环境不可避免地受到来自电极、壁和气相化学反应的灰尘和颗粒物质的污染。在本研究计划中,将建立第一性原理计算机模型来描述粒子物质对等离子体特性的扰动和等离子体不稳定性的引发。开发该模型的目标是预测中低压辉光放电(1atm)中粒子的存在导致的电子传递系数的变化以及电弧和流线的形成;并根据颗粒的大小、类型和分布,对此类排放的容忍度设定操作限制。这项研究的结果将为长寿命气体放电装置的设计者提供一种新的能力,用这种能力来预测和纠正设备在非原始环境中的性能,这些设备必须在这些环境中运行。这里开发的计算技术也将直接适用于预测从电极上的不均匀性开始的流线形成。
英文摘要
Moderate and low pressure plasmas and electrical gas discharges are used in a variety of technologically important applications (e.g., plasma processing, gas lasers, plasma switches). The gaseous environments of these plasmas are unavoidably contaminated with dust and particulate matter originating from electrodes, walls, and gas phase chemical reactions. In this research program, a first principles computer model will be developed to describe the perturbation of plasma properties and the initiation of plasma instabilities by particulate matter. The goals of developing the model are to predict the change in electron transport coefficients and the formation of arcs and streamers resulting from the presence of particulates in moderate to low pressure glow discharges ( 1 atm); and to set operational limits on the tolerance of such discharges to the size, type, and distribution of particles. The results of this study will provide a new capability to the designers of long lived gas discharge devices with which to predict and correct the performance of their devices in the non-pristine environments in which they must operate. The computational techniques developed here will also be directly applicable to predicting the onset of streamer formation from non-uniformities on electrodes.
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GCR: Collaborative Research: Plasma-Biofilm Interactions at the Intersection of Physics, Chemistry, Biology and Engineering
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批准号:2020010
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项目类别:Continuing Grant
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资助金额:$74.0万
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财政年份:2020
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负责人:Mark Kushner
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依托单位:
Collaborative Research: GOALI - Nonlinear Coupling in Pulsed Electronegative Plasmas: Multiple-sources, Multiple-frequencies, Multiple-time scales
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批准号:2009219
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项目类别:Standard Grant
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资助金额:$26.7万
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财政年份:2020
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负责人:Mark Kushner
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依托单位:
Collaborative Research: ECO-CBET: Methane Conversion by Merging Atmospheric Plasma with Transition-Metal Catalysis
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批准号:2032604
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项目类别:Continuing Grant
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资助金额:$50.0万
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财政年份:2020
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负责人:Mark Kushner
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依托单位:
Collaborative Research: Understanding Plasma-Liquid Interactions Through Controlled Plasma-Microdroplet Experiments and Modeling
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批准号:1902878
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项目类别:Standard Grant
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资助金额:$20.0万
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财政年份:2019
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负责人:Mark Kushner
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依托单位:
A Workshop on Science Challenges in Low Temperature Plasma Science and Engineering: Enabling a Future Based on Electricity through Non-Equilibrium Plasma Chemistry
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批准号:1613074
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项目类别:Standard Grant
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资助金额:$3.58万
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财政年份:2016
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负责人:Mark Kushner
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依托单位:
Collaborative Research: GOALI - Non-Equilibrium Processes, Stability, Design and Control of Pulsed Plasmas for Materials Processing
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批准号:1500126
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项目类别:Standard Grant
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资助金额:$1.5万
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财政年份:2015
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负责人:Mark Kushner
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依托单位:
Collaborative Research: CDI-Type II: Cyber-Enabled Studies of Complexity in Nanodusty Plasmas
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批准号:1124724
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项目类别:Standard Grant
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资助金额:$59.08万
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财政年份:2011
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负责人:Mark Kushner
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依托单位:
International Experiences in Low Temperature Plasmas: Student Travel Support to Attend the 2010 Gaseous Electronics Conference, October 4-8, 2010 in Paris, France
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批准号:1038603
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项目类别:Standard Grant
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资助金额:$1.5万
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财政年份:2010
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负责人:Mark Kushner
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依托单位:
Atmospheric Pressure Plasma Processing of Polymers: Plasma Dynamics and Nanoscale Plasma-Surface Interactions
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批准号:0520368
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项目类别:Continuing Grant
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资助金额:$10.39万
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财政年份:2005
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负责人:Mark Kushner
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依托单位:
Atmospheric Pressure Plasma Processing of Polymers: Plasma Dynamics and Nanoscale Plasma-Surface Interactions
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批准号:0315353
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项目类别:Continuing Grant
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资助金额:$32.4万
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财政年份:2003
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负责人:Mark Kushner
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依托单位:
Gordon Research Conference on Plasma Processing Science: Support for Graduate and Post-Doctoral Students
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批准号:0215382
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项目类别:Standard Grant
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资助金额:$0.9万
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财政年份:2002
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负责人:Mark Kushner
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依托单位:
Simulation of 3-dimensional Transport and Transients in Plasma Processing Reactors Using Moderate Parallelism
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批准号:9974962
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项目类别:Continuing Grant
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资助金额:$31.5万
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财政年份:1999
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负责人:Mark Kushner
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依托单位:
Engineering Research Equipment: Moderately Parallel ComputerEquipment for Design of Plasma Equipment for Microelectronics Manufacturing and Environmental Cleanup
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批准号:9500023
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项目类别:Standard Grant
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资助金额:$3.3万
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财政年份:1996
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负责人:Mark Kushner
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依托单位:
Electrode Topography in Plasma Processing Reactors: Uniformity, Dust Particle Trapping and Differential Wafer Charging
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批准号:9404133
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项目类别:Continuing Grant
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资助金额:$26.12万
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财政年份:1994
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负责人:Mark Kushner
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依托单位:
Atmospheric Pressure, Plasma Chemistry, Plasma Dynamics, Particle Effects and Gas Dynamics in Plasma Remediation of Toxic Gases
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批准号:9412565
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项目类别:Standard Grant
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资助金额:$22.76万
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财政年份:1994
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负责人:Mark Kushner
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依托单位:
REU: Modeling of Remote Plasma Assisted Materials Processing: Electron Transport and Selective Chemistry
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批准号:9109326
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项目类别:Continuing Grant
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资助金额:$23.29万
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财政年份:1991
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负责人:Mark Kushner
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依托单位:
Particles in rf Plasma Processing Discharges: Generation, Transport and Plasma Dynamics
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批准号:9113215
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项目类别:Continuing Grant
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资助金额:$22.75万
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财政年份:1991
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负责人:Mark Kushner
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依托单位:
Self-Consistent Monte-Carlo Particle Simulations for Collisional Low Temperature Plasmas: Applications to Magnetron Deposition/Etching Systems
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批准号:8815781
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项目类别:Continuing Grant
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资助金额:$16.82万
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财政年份:1988
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负责人:Mark Kushner
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依托单位:
REG: Computer Equipment for the Computational Gaseous Electronics Group at the University of Illinois
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批准号:8704824
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项目类别:Standard Grant
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资助金额:$1.0万
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财政年份:1987
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负责人:Mark Kushner
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依托单位:
海外基金