Theoretical Studies of Etching and Growth Dynamics at Surfaces

这个项目属于分析化学和表面化学的一般领域，属于界面过程理论的子领域。在这项为期三年的持续资助期间，Garrison教授和她的学生将应用分子动力学技术来理解表面过程的三个重要领域，即半导体的分子束外延生长，氟对硅表面的蚀刻以及高能（KeV）粒子与固体表面的相互作用。这项研究建立在加里森教授在美国国家科学基金会（NSF）资助CHE-8713796下的成就之上，代表了理论在复杂的、具有巨大技术重要性的现实世界问题上的重大实际应用。与合作者实验室中这些系统的最先进的实验研究相一致，加里森教授的研究为理论结构的评估和理论指导实验的执行提供了一个独特的框架。此外，该项目为培养年轻的理论家提供了一个独特的环境，他们将有能力解决材料化学中的挑战性问题。这项研究对微电子制造、材料加工和表面分析等技术重要领域产生了广泛的影响。

This project is in the general area of analytical and surface chemistry and in the subfield of theory of interfacial processes. During the tenure of this three-year continuing grant, Professor Garrison and her students will apply molecular dynamics techniques to an understanding of three important areas of surface processes, namely the molecular beam epitaxial growth of semiconductors, the etching of silicon surfaces by fluorine, and the interaction of energetic (KeV) particles with solid surfaces. This research, which builds on Professor Garrison's accomplishments under NSF grant CHE-8713796, represents significant practical applications of theory to complex, real-world problems of immense technological importance. In concert with state-of-the-art experimental studies of these systems in the laboratories of collaborators, Professor Garrison's research provides a unique framework both for the evaluation of theoretical constructs and for the theoretically guided execution of experiments. Additionally, this project offers a unique environment for the training of young theorists who will be well-equipped to address challenging problems in materials chemistry. This research impacts broadly on the technologically important areas of microelectronics fabrication, materials processing, and surface analysis.