Metalorganic Chemical Vapor Deposition of High Temperature Superconducting Films

金属氧化物的金属有机化学气相沉积是一种 在电子工业中已建立的生产技术 薄膜绝缘体和透明导体， 特性. 应用于新型超导陶瓷材料 该方法可以在氧气中产生膜， 烧结、可在单晶上外延生长的薄膜 高纯度的基板和薄膜， 组成和晶相。 第一阶段的目标是 表明金属有机化学气相沉积 氧化锆、氧化铝、涂层氧化铝上的钇钡铜氧化物 或钛酸锶产生均匀的超导膜， 光滑的表面

Metalorganic chemical vapor deposition of metallic oxides is an established technology in the electronics industry for production of thin film insulators and transparent conductors with tailored properties. Applied to the new superconducting ceramic materials this process could produce films in oxygen which do not require sintering, films which may grow epitaxially on single crystal substrates and films of exceptionally high purity with uniform composition and crystal phases. The objective of Phase I is to demonstrate that metalorganic chemical vapor deposition of yttrium-barium-copper-oxide on zirconia, alumina, coated alumina or strontium titanate yields a uniform superconducting film with a smooth surface.