Study on layout design station with custom LSI
Study on layout design station with custom LSI
批准号:
59850058
负责人:
ESASHI Masayoshi
金额:
$3.52万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research
财政年份:
1984
资助国家:
日本
项目状态:
已结题
起止时间:
1984 至 1985
中文摘要
开发了用于大规模集成电路版图高效设计的版图设计工作站。该系统具有专用硬件,使邻域运算快速进行,并具有设计规则检查等功能。这就构成了半自动设计工作站,使低级操作自动化。这就带来了快速的反应能力,使设计者的直觉最大化。硬件.本文介绍了一个由128个处理器组成的二维并行处理系统。高速开关网络,即二维阵列移位器,它使有效的二维存储器访问,实现为定制LSI。将系统的并行处理、存储、显示与绘图、地址计算和微程序控制等各部分分别组装成整个系统,并对系统的各项性能进行了验证.软件并编制了设计规则检查等微程序,使该系统实际运行。作为布局设计站或模拟元胞自动机的有效性也得到了发展,这表明该系统具有一般二维并行处理的能力。
英文摘要
The layout design station for the efficient design of LSI layout is developed. This system has a special purpose hardware to make neighborhood operations fast and has functions as design rule check etc.. This constructs semiautomatic design station which automates low level operations. This brings out quick responsability to make the most of the intuition of the designer.Following results are obtained in this study.1. Hardware. Two dimentional parallel processing system, which operates on the bit map pattern data with 128 processor elements, is developed. High speed switching network i.e. two dimentional oarrel shifter, which enables efficient two dimentional memory access, is implemented as custom LSIs. Each parts of the system that are for parallel processing, for memory, for display and draw, for address caliculation and for microprogram control respectively are assembled to total system and all performances of this system is certified.2. Software. The microprogram for design rule check etc. are made to operate this system practically. The effectiveness as a layout design station or that for the simulation of cell automatone are also developed and then this presents the ability of this system for general two dimentional parallel processing.
期刊论文(2)
专著(0)
科研奖励(0)
会议论文
電子通信学会技術研究報告. SSD 85-51. (1985)
IEICE 技术研究报告。SSD 85-51。
DOI:
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发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
Institute of Electronics and Communication Engineers of Japan Technical Report. SSD 85-51. (1985)
日本电子通信工程师学会技术报告。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
Massive Parallel Electron Beam Lithography System
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项目类别:Grant-in-Aid for Scientific Research (S)
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依托单位:
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批准号:10044112
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财政年份:1998
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依托单位:
Flexible micro motion-systems having distributed actuators
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财政年份:1995
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依托单位:
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批准号:03102001
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财政年份:1991
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依托单位:
Joint Study on Integrated Clinical Analysis System
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财政年份:1991
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依托单位:
Implantable Pressure Measurement System
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负责人:ESASHI Masayoshi
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依托单位:
海外基金