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Hydrogen Assisted Fabrication of Optoelectronic Devices Utilizing GaAs on Si and GaAs on SiO2

Hydrogen Assisted Fabrication of Optoelectronic Devices Utilizing GaAs on Si and GaAs on SiO2
利用 Si 上的 GaAs 和 SiO2 上的 GaAs 进行氢辅助制造光电器件
批准号:
8806851
负责人:
George Collins
金额:
$4.8万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-08-15 至 1989-10-31

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英文摘要
The research involves the study of hydrogen atoms in the MOCVD growth process and is highly innovative. Because of its strong relation to materials, only "bridging" support can be recommended until the PI submits a proposal that addresses issues of common interest to the Lightwave Technology Program and DMR. The work has already attracted the interest of ATT Bell Labs and could have important impact on layer growth. //
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Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
  • 批准号:
    0097061
  • 项目类别:
    Standard Grant
  • 资助金额:
    $21.0万
  • 财政年份:
    2001
  • 负责人:
    George Collins
  • 依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
  • 批准号:
    9712246
  • 项目类别:
    Standard Grant
  • 资助金额:
    $9.51万
  • 财政年份:
    1997
  • 负责人:
    George Collins
  • 依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
  • 批准号:
    9720292
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $31.1万
  • 财政年份:
    1997
  • 负责人:
    George Collins
  • 依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
  • 批准号:
    9512857
  • 项目类别:
    Standard Grant
  • 资助金额:
    $2.08万
  • 财政年份:
    1996
  • 负责人:
    George Collins
  • 依托单位:
海外基金