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Hydrogen in Silicon Dioxide Thin Films Studied by Nuclear Magnetic Resonance

Hydrogen in Silicon Dioxide Thin Films Studied by Nuclear Magnetic Resonance
通过核磁共振研究二氧化硅薄膜中的氢
批准号:
8918834
负责人:
Karen Gleason
金额:
$0.0万
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-01-15 至 1993-09-30

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中文摘要
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英文摘要
.he goal of the research is to provide new experimental data in order to evaluate scientific theses on the role of hydrogen in silicon dioxide and to provide a basis for atomic-scale modeling of this materials system. Nuclear magnetic resonance is being used to determine the atomic bonding configuration of hydrogen atoms in silicon dioxide grown by thermal and chemical vapor deposition techniques. The data will be analyzed in terms of oxidation kinetics, passivation and electronic defects in silicon dioxide.
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海外基金
Silicon-Tethered 分子内 Corey-Chaykovsky 反应和 Tandem Heterocyclopropylolefin 环化反应研究
  • 批准号:
    20802044
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    18.0万元
  • 批准年份:
    2008
  • 负责人:
    宋振雷
  • 依托单位: