III-Nitride Deep Ultraviolet Photonic Materials and Structures - Growth, Optical Studies and Applications

III 氮化物深紫外光子材料和结构 - 生长、光学研究和应用

• 批准号: 0504601
• 负责人: Jingyu Lin
• 金额: --
• 依托单位: Kansas State University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-05-01 至 2009-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0504601&HistoricalAwards=false
• 关键词: III; Nitride; Deep; Ultraviolet; Photonic

This project represents a multifaceted approach to carry out fundamental research needed to further advance the science and technology of semiconductor deep UV (DUV) photonics. One of the major objectives is to identify and understand fundamental mechanisms associated with epitaxial growth and doping of Al-rich AlGaN alloys and AlN. In particular, mechanisms for the formation of native defects during crystal growth, which act as compensating centers, will be explored by employing a high quality AlN epilayer template, off-axis substrates, a pulsed growth scheme, and delta doping. Research activities and basic understanding on DUV photonic materials and devices based upon the Al-rich AlxGa1-xN alloy system are still in early stages. This research project strives for fundamental understanding of the AlGaN DUV photonic material system as well as addressing important applications. The project addresses fundamental research issues in a topical area of electronic/photonic materials science having high technological relevance. An important feature of the project is the strong emphasis on education, and the integration of research and education. Through direct involvement in research, students will have unique learning and discovery opportunities in the areas of advanced semiconductor materials, nano-fabrication techniques, semiconductor physics, semiconductor materials fabrication and device processing using state-of-the-art epitaxial growth, lithographic patterning, plasma etching, and advanced materials characterization.***

该项目代表了一种多方面的方法，以进一步推进半导体深紫外线（DUV）光子学的科学和技术所需的基础研究。主要目标之一是识别和理解与富含Al的Algan合金和ALN掺杂相关的基本机制。特别是，将通过采用高质量的ALN Epiolayer模板，离轴底物，脉冲生长方案和Delta掺杂来探索晶体生长过程中天然缺陷的机制。研究活动以及基于富含ALXGA1-XN合金系统的DUV光子材料和设备的基本了解仍处于早期阶段。该研究项目致力于对Algan Duv光子材料系统以及解决重要应用的基本了解。 该项目解决了具有高技术相关性的电子/光子材料科学主题领域的基本研究问题。该项目的一个重要特征是对教育以及研究和教育的融合非常重视。通过直接参与研究，学生将在先进的半导体材料，纳米制作技术，半导体物理学，半导体材料制造和设备加工的领域中拥有独特的学习和发现机会。