III-Nitride Deep Ultraviolet Photonic Materials and Structures - Growth, Optical Studies and Applications
III-Nitride Deep Ultraviolet Photonic Materials and Structures - Growth, Optical Studies and Applications
批准号:
0504601
负责人:
Jingyu Lin
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2005
资助国家:
美国
项目状态:
已结题
起止时间:
2005-05-01 至 2009-04-30
中文摘要
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英文摘要
This project represents a multifaceted approach to carry out fundamental research needed to further advance the science and technology of semiconductor deep UV (DUV) photonics. One of the major objectives is to identify and understand fundamental mechanisms associated with epitaxial growth and doping of Al-rich AlGaN alloys and AlN. In particular, mechanisms for the formation of native defects during crystal growth, which act as compensating centers, will be explored by employing a high quality AlN epilayer template, off-axis substrates, a pulsed growth scheme, and delta doping. Research activities and basic understanding on DUV photonic materials and devices based upon the Al-rich AlxGa1-xN alloy system are still in early stages. This research project strives for fundamental understanding of the AlGaN DUV photonic material system as well as addressing important applications. The project addresses fundamental research issues in a topical area of electronic/photonic materials science having high technological relevance. An important feature of the project is the strong emphasis on education, and the integration of research and education. Through direct involvement in research, students will have unique learning and discovery opportunities in the areas of advanced semiconductor materials, nano-fabrication techniques, semiconductor physics, semiconductor materials fabrication and device processing using state-of-the-art epitaxial growth, lithographic patterning, plasma etching, and advanced materials characterization.***
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依托单位: