GOALI: Precursors for the Atomic Layer Deposition Growth of Transition Metal Thin Films

GOALI：过渡金属薄膜原子层沉积生长的前驱体

• 批准号: 0910475
• 负责人: Charles Winter
• 金额: $ 45万
• 依托单位: Wayne State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-06-01 至 2012-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0910475&HistoricalAwards=false
• 关键词: GOALI; Precursors; Atomic; Layer; Deposition

In this GOALI project funded by the Inorganic, Bioinorganic, and Organometallic Chemistry Program of the Chemistry Division, Charles Winter of Wayne State University and Dr. Marek Boleslawski of Sigma-Aldrich Fine Chemicals (SAFC Hitech) Corporation will develop and test chemical precursors for atomic layer deposition (ALD) film growth techniques. A primary target film composition will be the Cu/Mn alloy, because these films have been shown to form 2-8 nm MnSixOy diffusion barriers between the silica/silicon and copper layers. Such Cu diffusion barriers are critical for the microelectronics industry in their quest for fabricating smaller feature sizes on silicon chips. Presently, only sputtering methods are capable of forming requisite Cu/Mn alloy films, and they provide poor coverage when applied to substrates with very small feature sizes. A central feature of the collaborative project will be sending Wayne State University students to SAFC Hitech for 3 to 6 month internships to gain an industrial perspective on the electronic chemical field. Students from Wayne State University will also travel to the laboratories of Professor Lauri Niinist at the Helsinki University of Technology for 6-8 week visits to participate in film growth and characterization experiments.

在这个守门员项目中，由韦恩州立大学的Charles Winter Sigrate和Sigma-Aldrich Fine Chemicals的Marek Boleslawski（SAFC Hitech）Corporation的Charles Winter Suprive的无机，生物有机和有机金属化学计划资助，将开发和测试原子层沉积物（ALD）膜增长技术的化学体前体。 主要的靶膜组成将是CU/MN合金，因为这些膜已显示出在二氧化硅/硅和铜层之间形成2-8 nm MNSIXOY扩散屏障。 这种CU扩散障碍对于微电子行业来说至关重要，他们追求在硅芯片上制造较小的功能尺寸。 目前，只有溅射方法才能形成必要的Cu/Mn合金膜，并且当将其应用于具有很小尺寸的基板时，它们的覆盖范围较差。 该协作项目的一个核心特征是将韦恩州立大学的学生送往SAFC HITECH进行3至6个月的实习，以获得对电子化学领域的工业视角。 韦恩州立大学的学生还将前往赫尔辛基技术大学劳里·尼纳教授的实验室，进行6-8周的访问，参加电影的成长和表征实验。