On the mechanisms of a plasma diffusion treatment of metallic substrates with controlled actice screen plasma nitriding

该研究项目旨在帮助增加对黑色金属材料在不同介质中，特别是含碳介质中的等离子体扩散处理的基本机制的了解。对活性屏等离子体处理的有效机制的了解有助于更好地理解等离子体工艺。对等离子体中发生的反应与在选定的铁基材料上获得的氮化结果之间的依赖性的研究为在不同的铁基合金上有针对性地生产具有定义的层结构的氮化层和氮碳共渗层奠定了基础。他们的知识对于通过基于科学的受控工艺（受控等离子体渗氮和氮碳共渗）脱离当前的经验工艺控制至关重要。对主要机理的分析使得有必要应用强大的等离子体诊断方法。从工作报告中可以明显看出，INP格赖夫斯瓦尔德等离子体物理学家和IWT弗赖贝格材料工程师在第一个资助期内的密切跨学科合作非常有益。通过首次应用原位激光光谱（LAS）结合非原位傅里叶变换红外光谱（FTIR）和朗缪尔探针诊断技术对等离子体扩散处理的基本过程进行分析，有助于更好地理解该过程的一般特征机理。这对于解释CO2和CH4添加到工艺气体中的效果尤其如此。在持续合作所获得的新见解的基础上，预计将对过程有新的理解。开发工业上适用的过程监测和控制方法的概念是等离子体诊断工作的一部分。

The research project aims to contribute to increase knowledge of the essential mechanisms of plasma diffusion treatment of ferrous materials with an active screen in different media, particularly carbon-containing media. The development of sound knowledge of the active screen plasma treatment, depending on the effective mechanisms serves a better understanding of the plasma processes. The study of the dependencies between the reactions occurring in the plasma and on the nitriding results obtained on selected ferrous materials achieves the foundations for the targeted production of nitrided layers and nitrocarburized cases with a defined layer structure on different ferrous alloys. Their knowledge is essential for the detachment of the current empirical process control through a science-based controlled process, the controlled plasma nitriding and nitrocarburizing.The analysis of the main mechanisms makes the application of powerful methods of plasma diagnostics necessary. As is apparent from the work report, the close interdisciplinary cooperation between the INP Greifswald plasma physicists and materials engineers from the IWT Freiberg in the first funding period was very beneficial. By the first application of in situLaser spectroscopy (LAS) in combination with ex-situ Fourier transform infrared spectroscopy (FTIR), and the Langmuir probe diagnostic for the analysis of the basic processes of the plasma diffusion treatment a contribution to a better understanding of the general, for this process characteristic mechanisms was done. This is especially true for the interpretation of the effectof CO2 and CH4 additions to the process gas. On the basis of the new insights gained through the continued cooperation a new understanding of the processes is expected.The development of a concept for industrially applicable methods of process monitoring and control is part of the work for plasma diagnostics.