On the mechanisms of a plasma diffusion treatment of metallic substrates with controlled actice screen plasma nitriding

该研究项目旨在增加对活性筛网等离子体扩散处理含铁材料在不同介质，特别是含碳介质中的基本机制的认识。基于有效机制的活性屏等离子体治疗知识的发展有助于更好地理解等离子体过程。研究等离子体中发生的反应与在选定的亚铁材料上获得的氮化结果之间的相关性，为在不同的亚铁合金上有针对性地生产具有确定层结构的氮化层和氮碳化层奠定了基础。他们的知识对于通过基于科学的受控过程，受控等离子体渗氮和氮碳渗氮来脱离当前的经验过程控制至关重要。对其主要机制的分析表明，应用强有力的等离子体诊断方法是必要的。从工作报告中可以明显看出，INP Greifswald等离子体物理学家和IWT Freiberg材料工程师在第一个资助期的密切跨学科合作非常有益。通过首次应用原位激光光谱（LAS）结合离地傅立叶变换红外光谱（FTIR），以及Langmuir探针诊断对等离子体扩散处理的基本过程进行分析，有助于更好地了解等离子体扩散处理的一般过程，并对这一过程的特征机理进行了研究。对于向工艺气体中添加CO2和CH4的影响的解释尤其如此。在通过持续合作获得的新见解的基础上，期望对这些过程有新的理解。发展工业上适用的过程监测和控制方法的概念是等离子体诊断工作的一部分。

The research project aims to contribute to increase knowledge of the essential mechanisms of plasma diffusion treatment of ferrous materials with an active screen in different media, particularly carbon-containing media. The development of sound knowledge of the active screen plasma treatment, depending on the effective mechanisms serves a better understanding of the plasma processes. The study of the dependencies between the reactions occurring in the plasma and on the nitriding results obtained on selected ferrous materials achieves the foundations for the targeted production of nitrided layers and nitrocarburized cases with a defined layer structure on different ferrous alloys. Their knowledge is essential for the detachment of the current empirical process control through a science-based controlled process, the controlled plasma nitriding and nitrocarburizing.The analysis of the main mechanisms makes the application of powerful methods of plasma diagnostics necessary. As is apparent from the work report, the close interdisciplinary cooperation between the INP Greifswald plasma physicists and materials engineers from the IWT Freiberg in the first funding period was very beneficial. By the first application of in situLaser spectroscopy (LAS) in combination with ex-situ Fourier transform infrared spectroscopy (FTIR), and the Langmuir probe diagnostic for the analysis of the basic processes of the plasma diffusion treatment a contribution to a better understanding of the general, for this process characteristic mechanisms was done. This is especially true for the interpretation of the effectof CO2 and CH4 additions to the process gas. On the basis of the new insights gained through the continued cooperation a new understanding of the processes is expected.The development of a concept for industrially applicable methods of process monitoring and control is part of the work for plasma diagnostics.