MATERIAL STRENGTH STUDY ON GROWTH OF HIGH QUALITY BULK SINGLE CRYSTALS FOR ELECTRONIC/OPTICAL DEVICES
MATERIAL STRENGTH STUDY ON GROWTH OF HIGH QUALITY BULK SINGLE CRYSTALS FOR ELECTRONIC/OPTICAL DEVICES
批准号:
06452152
负责人:
MIYAZAKI Noriyuki
金额:
$3.2万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
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英文摘要
1. A computer code was developed for for evaluating the dislocation density of Si, GaAs and InP bulk single crystals during the Czochralski growth using a dislocation kinetics model called the Haasen-Sumino model. The following are the research results obtained from the analyzes using this computer code. (1) The rate of dislocation multiplication is faster in the order of GaAs, InP and Si. Even in the case of Si, the dislocation density reaches a steady state value within a few seconds, and InP and GaAs have faster rate of dislocation multiplication by more than a hundred times and a thousand times, respectively. (2) InP and GaAs have larger dislocation density at a steady state than Si. (3) A continuous simulation for the CZ growth process gives a W-type distribution of dislocation density along a diameter of a bulk single crystal, which is observed in a real bulk single crystal. This verifies the computer simulation.2. The following are results of the research on the relation between … More the thermal stress during the growth of a LiNbO_3 (LN) single crystal and its quality. (1) Thermal stress is higher in the a-axis pulling than in the c-axis pulling. This verifies the empirical fact that cracking is easier to occur in the a-axis pulling than in the c-axis pulling. (2) According to the thermal stress analysis, a single crystal grown in the a-axis direction has a wider region of low thermal stress in its internal part than a single crystal grown in the c-axis direction. This implies that the a-axis pulling gives a bulk single crystal with higher quality than the c-axis pulling. The examination of the quality of single crystals with the x-ray topograph reveals high quality of a single crystal grown in the a-axis pulling which has fewer subgrains than a single crystal grown in the c-axis direction. It is shown that the results of the thermal stress analysis give effective information on the growth method of a single crystal with high quality. (3) Failure of a LN Single crystal due to thermal stress occurs at the cleavage planes and may be dominated by the tensile stress normal to the cleavage planes. The failure stress shows the Weibull distribution. Less
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宮崎則幸: "CZ育成LN単結晶の熱応力解析" 日本結晶成長学会誌. 22. 39-42 (1995)
Noriyuki Miyazaki:“CZ 生长的 LN 单晶的热应力分析”日本晶体生长学会杂志 22. 39-42 (1995)。
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N.MIYAZAKI,H.UCHIDA,T.MUNAKATA,K.FUJIOKA and Y.SUGINO: "Dislocation Density Analysis of Bulk Single Silicon Crystal Using Dislocation Kinetics Model, Mechanics and Materials for Electronic Packaging." ASME. AMD-Vol.195. 59-64 (1994)
N.MIYAZAKI、H.UCHIDA、T.MUNAKATA、K.FUJIOKA 和 Y.SUGINO:“使用位错动力学模型、电子封装力学和材料对体单硅晶体进行位错密度分析”。
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N. MIYAZAKI: "Finite Element Analyses of Cracking in Lithium Niobate Single Crystal" Computational Mechanics'95. Vol.1. 586-591 (1995)
N.宫崎:“铌酸锂单晶裂纹的有限元分析”计算力学95。
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N.MIYAZAKI,H.UCHIDA and A.HATTORI: "Finite Element Analyzes of Cracking in Lithium Niobate" Computational Mechanics '95. Vol.1. 586-591 (1995)
N.MIYAZAKI、H.UCHIDA 和 A.HATTORI:“铌酸锂裂纹的有限元分析”计算力学 95。
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通讯作者:
N. MIYAZAKI: "Dislocation Density Analysis of Bulk Single Silicon Crystal Growth Using Dislocation Kinetics Model" Mechanics and Materials for Electronics Packaging. ASME AMD-Vol.195. 59-64 (1994)
N. MIYAZAKI:“使用位错动力学模型对体单硅晶体生长的位错密度分析”电子封装力学和材料。
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共 10 条
Development of Birefringence Analysis Code for Single Crystal Optical Elements
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批准号:24656086
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
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财政年份:2012
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负责人:MIYAZAKI Noriyuki
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依托单位:
Analytical and Experimental Study on the Mechanical Strength Evaluation of Advanced Devices
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批准号:18206015
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$31.53万
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财政年份:2006
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负责人:MIYAZAKI Noriyuki
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依托单位:
Development of Integrated Analysis System for manufacturing high quality devices
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批准号:15360058
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.22万
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财政年份:2003
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负责人:MIYAZAKI Noriyuki
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依托单位:
Development of Virtual Experiment System for Growth Process of Functional Crystals
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批准号:11555035
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.8万
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财政年份:1999
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负责人:MIYAZAKI Noriyuki
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依托单位:
THERMAL STRESS ESTIMATION FOR LARGE DIAMETER SILICON SINGLE CRYSTAL USING MATERIAL PROPERTIES OBTAINED FROM MOLECULAR DYNAMICS METHOD
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批准号:08455064
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$3.84万
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财政年份:1996
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负责人:MIYAZAKI Noriyuki
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依托单位:
Material strength study on cracking of oxide bulk single crystals for optelectronic use
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批准号:04650089
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.34万
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财政年份:1992
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负责人:MIYAZAKI Noriyuki
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依托单位:
Estimation of Thermal Stress During Growth Process of Bulk Single Crystals used in Electronic Devices
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批准号:02650074
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$0.9万
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财政年份:1990
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负责人:MIYAZAKI Noriyuki
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依托单位:
海外基金