Development of Integrated Analysis System for manufacturing high quality devices
Development of Integrated Analysis System for manufacturing high quality devices
批准号:
15360058
负责人:
MIYAZAKI Noriyuki
金额:
$9.22万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2005
中文摘要
点击翻译按钮获取中文摘要
英文摘要
The present research was performed to develop an integrated analysis system for manufacturing high quality devices, which comprises computer codes for the dislocation density analysis during single crystal growth process, for the dislocation density analysis during ingot annealing process, and for the dislocation density analysis during manufacturing devices on wafers. In the integrated analysis system for manufacturing high quality devices, these subsystems are sequentially connected to deal with the whole process of manufacturing devices. The following are results of the present research.(1)We developed a dislocation density analysis code, in which crystal anisotropy is neglected or approximately considered.(2)We proposed a modified Haasen-Alexander-Sumino (HAS) model as a constitutive equation to take account of the annihilation of dislocations. In this model, the dislocation density has a positive value or a negative value in accordance with the direction of the resolved shear stre … More ss, and the model is able to represent not only the dislocation multiplication but also the annihilation of dislocations. We also proposed the constitutive equation by considering the kinds of dislocations, i.e. screw dislocation, edge dislocation and mixed dislocation. We incorporated these constitutive equations into the three-dimensional finite element computer code for ingot annealing process, in which crystal anisotropy is exactly taken into account. We applied this computer code to the dislocation density analyses of compound semiconductor crystals such as GaAs and InP during ingot annealing process.(3)We utilized the modified HAS model to take account of the annihilation of dislocations in the dislocation density analysis code for GaAs thin film deposition on the Si substrate. We applied this computer code to the rapid thermal annealing (RPA) process, in which the annihilation of dislocations must be taken into account. The computer code successfully provides the decrease of dislocation density by the RPA process, which agrees with the experimental observation.(4)We successfully connected above three subsystems. Less
期刊论文(27)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
半導体単結晶育成過程の転位密度評価シミュレーション(1)
半导体单晶生长过程的位错密度评估模拟(一)
DOI:
--
发表时间:
2005
期刊:
機械の研究 57・6
影响因子:
--
作者:
[N.MIYAZAKI, N.MIYAZAKI, N.Miyazaki, N.Miyazaki, N.MIYAZAKI, 宮崎則幸, 宮崎則幸]
通讯作者:
宮崎則幸
DOI:
--
发表时间:
2005
期刊:
Transactions of the Japan Society of Mechanical Engineers, Series A Vol.71, No.704
影响因子:
--
作者:
[N.MIYAZAKI, N.MIYAZAKI, N.Miyazaki, N.Miyazaki, N.MIYAZAKI, 宮崎則幸, 宮崎則幸, 宮崎則幸, N.MIYAZAKI, N.MIYAZAKI, N.MIYAZAKI]
通讯作者:
N.MIYAZAKI
Three-Dimensional Dislocation Density Analysis of InP Bulk Single Crystal during Ingot Annealing Process
InP块体单晶铸锭退火过程中的三维位错密度分析
DOI:
--
发表时间:
2003
期刊:
Transactions of the Japan Society for Computational Engineering and Science Vol.5
影响因子:
--
作者:
[宮崎則幸, 小泉直義, 宮崎則幸, N.MIYAZAKI, N.MIYAZAKI]
通讯作者:
N.MIYAZAKI
単結晶の熱応力負荷割れ
单晶热应力开裂
DOI:
--
发表时间:
2004
期刊:
材料 53・11
影响因子:
--
作者:
[宮崎則幸, 小泉直義]
通讯作者:
小泉直義
半導体単結晶育成過程の転位密度評価シミュレーション(2)
半导体单晶生长过程的位错密度评估模拟(2)
DOI:
--
发表时间:
2005
期刊:
機械の研究 57・7
影响因子:
--
作者:
[N.MIYAZAKI, N.MIYAZAKI, N.Miyazaki, N.Miyazaki, N.MIYAZAKI, 宮崎則幸, 宮崎則幸, 宮崎則幸]
通讯作者:
宮崎則幸
共 19 条
Development of Birefringence Analysis Code for Single Crystal Optical Elements
-
批准号:24656086
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.58万
-
财政年份:2012
-
负责人:MIYAZAKI Noriyuki
-
依托单位:
Analytical and Experimental Study on the Mechanical Strength Evaluation of Advanced Devices
-
批准号:18206015
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$31.53万
-
财政年份:2006
-
负责人:MIYAZAKI Noriyuki
-
依托单位:
Development of Virtual Experiment System for Growth Process of Functional Crystals
-
批准号:11555035
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$4.8万
-
财政年份:1999
-
负责人:MIYAZAKI Noriyuki
-
依托单位:
THERMAL STRESS ESTIMATION FOR LARGE DIAMETER SILICON SINGLE CRYSTAL USING MATERIAL PROPERTIES OBTAINED FROM MOLECULAR DYNAMICS METHOD
-
批准号:08455064
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$3.84万
-
财政年份:1996
-
负责人:MIYAZAKI Noriyuki
-
依托单位:
MATERIAL STRENGTH STUDY ON GROWTH OF HIGH QUALITY BULK SINGLE CRYSTALS FOR ELECTRONIC/OPTICAL DEVICES
-
批准号:06452152
-
项目类别:Grant-in-Aid for General Scientific Research (B)
-
资助金额:$3.2万
-
财政年份:1994
-
负责人:MIYAZAKI Noriyuki
-
依托单位:
Material strength study on cracking of oxide bulk single crystals for optelectronic use
-
批准号:04650089
-
项目类别:Grant-in-Aid for General Scientific Research (C)
-
资助金额:$1.34万
-
财政年份:1992
-
负责人:MIYAZAKI Noriyuki
-
依托单位:
Estimation of Thermal Stress During Growth Process of Bulk Single Crystals used in Electronic Devices
-
批准号:02650074
-
项目类别:Grant-in-Aid for General Scientific Research (C)
-
资助金额:$0.9万
-
财政年份:1990
-
负责人:MIYAZAKI Noriyuki
-
依托单位:
海外基金