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Research on Dynamics of Two-dimensional Carriers in Ultrathin semiconductor Heterostructure Devices

Research on Dynamics of Two-dimensional Carriers in Ultrathin semiconductor Heterostructure Devices
超薄半导体异质结构器件中二维载流子动力学研究
批准号:
61460122
负责人:
SAKAKI Hiroyuki
金额:
$4.35万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1986
资助国家:
日本
项目状态:
已结题
起止时间:
1986 至 1987

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中文摘要
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英文摘要
Dynaics of carriers in quantum wells ( Ws) and related hetero- structures (HS) are the key factor that dominates the performances of various quatntum HS devices; in this project, we investigate dynamics in W lasers, resonant tunneling diodes (RTD), and HSFETs.(1) Recombination dynamics in Ws: Although a controversy exists as to the relative roles of excitons and free carriers in Ws, the radiative recombination in W lasers may well be dominated by the free carrier process, since excitons are quenched under a high excitation condition. The lifetime of such free carriers is determined by using picosecond laser pulse and found to be well explained by the theory of band-to-band transition.(2) Tunneling dynamics in RTDs: Since electrons tunneling through double-barrier RTDs involves the multiple reflection, it may lead to an intrinsic time delay. We have successfully measured this delay for the first time and nave shown that this delay is well explained by the theory.(3) Acceleration dynamics in HSFETs: The velocity-field relationship of electrons is established for HEMT and other HSFETs and key mechamisms for velocity saturation are disclosed. Implementation of thie finding to HEMT device modeling has shown the importance of low field mobility for the achievement of high gm and high drain current.
期刊论文(32)
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会议论文
H. Sakaki: "Roles of low field mobility and its carrier-concentration dependence in high electron mobility transistors and other field effect transistors" IEEE Electron Device Letters.
H. Sakaki:“低场迁移率的作用及其在高电子迁移率晶体管和其他场效应晶体管中的载流子浓度依赖性”IEEE 电子器件快报。
DOI: --
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通讯作者:
Kazuhiko Hirakawa;Hiroyuki Sakaki: Physical Review B. Vol.33No.12. 8291-8303 (1986)
平川和彦;榊宏之:《物理评论 B》第 33 卷第 12 卷。
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通讯作者:
K. Hirakawa: Applid Physics Letters. 49. 889-891 (1986)
K. Hirakawa:应用物理快报。
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通讯作者:
K. Yokoyama: IEEE Electron Device Letters. EDL-8. 73-75 (1987)
K. Yokoyama:IEEE 电子设备通讯。
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通讯作者:
16
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    • 批准号:
      23360164
    • 项目类别:
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    • 资助金额:
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    • 财政年份:
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    • 依托单位:
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    • 资助金额:
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    • 项目类别:
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    • 资助金额:
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    • 财政年份:
      2000
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