Development and Manufacturing of Maltilayer coated Ceramic-Composite Particles.
Development and Manufacturing of Maltilayer coated Ceramic-Composite Particles.
批准号:
11450242
负责人:
SHINOZAKI Kazuo
金额:
$8.06万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B).
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000
中文摘要
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英文摘要
The purpose of this study is to realize the single crystal like thin films with controlled residual stress by introducing the buffer layer between thin film and substrate. Several kinds of buffer layers with different composition or compositionally gradient were chosen at the standing points of the lattice mismatch and the thermal expansion coefficient difference between the thin film and the substrate.To clarify the effects of residual stress on the electrical properties of the thin film, the electrical properties of the (001) PbTiO_3 thin film deposited on the (100) SrTiO_3 substrates with different residual stresses were measured. The residual stress was changed by the mechanical thinning of the substrate after thin film deposition or mechanical bending of the substrate. Increasing the inplane tensile stress of the thin film, the remnant polarization and the coercive field of the PbTiO_3 were decreasing.The residual stress was successively controlled by introducing the various buffe … More r layers between epitaxially grown (001)Pb(Zr, Ti)O_3 thin film and (100) SrTiO_3 substrate. PbTiO_3 and compositionally gradient films with PbTiO_3→Pb(Zr, Ti)O_3 or PbZrO_3→Pb(Zr, Ti)O_3 were used as buffer layers. Since lattice mismatch among Pb(Zr, Ti)O_3, buffer layer and SrTiO_3 is rather small in this system, the effect of the lattice mismatch might be negligible compared with the effect of thermal expansion coefficient differences. Introducing the buffer layers with higher thermal expansion coefficient than SrTiO_3 and Pb(Zr, Ti)O_3 such as PbTiO_3 or PbTiO_3→Pb(Zr, Ti)O_3, the in-plane tensile stress of the Pb(Zr, Ti) O_3 film was relaxing. In contrast, the buffer layer with lower thermal expansion coefficient such as PbZrO_3→Pb(Zr, Ti)O_3 extended the in-plane tensile stress.From these results we tried to change the electrical properties by introducing the buffer layer. Pt/PbTiO_3 buffer layers with different PbTiO_3 thickness were introduced between epitaxial (001)PbTiO_3 film and (100)SrTiO_3 substrate to realize Pt/PbTiO_3 /Pt/PbTiO_3 buffer/SrTiO_3. Increasing the thickness of the PbTiO_3 buffer, the remnant polarization was increasing by decreasing the in-plane tensile stress. Less
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玄 一,黒柳一誠,脇谷尚樹,篠崎和夫,永谷惟恭: "MOCVD法によるPbTiO_3薄膜の成長様式と成膜速度が配向性に及ぼす影響"日本セラミックス協会学術論文誌. 107〔10〕. 955-960 (1999)
Genichi、Issei Kuroyanagi、Naoki Wakiya、Kazuo Shinozaki、Yoshiyasu Nagatani:“生长模式和沉积速率对 MOCVD 法 PbTiO_3 薄膜取向的影响”日本陶瓷学会杂志 107 [10]。 )
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H.Funakubo,K.Nagashima,K.Shinozaki and N.Mizutani: "Comparison of deposition behavior of Pb(Zr,Ti)O_3 films and its end-member-oxide films prepared by MOCVD"Thin Solid Films. 368. 261-265 (2000)
H.Funakubo、K.Nagashima、K.Shinozaki 和 N.Mizutani:“MOCVD 制备的 Pb(Zr,Ti)O_3 薄膜及其端元氧化物薄膜的沉积行为比较”薄固体薄膜。
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H.Funakubo, K.Nagashima, K.Shinozaki and N.Mizutani: "Comparison of deposition behavior of Pb(Zr, Ti)O_3 films and its end-member-oxide films prepared by MOCVD"Thin Solid Films. 368. 261-265 (2000)
H.Funakubo、K.Nagashima、K.Shinozaki 和 N.Mizutani:“MOCVD 制备的 Pb(Zr, Ti)O_3 薄膜及其端元氧化物薄膜的沉积行为比较”薄固体薄膜。
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A.Endo,A.Iwasaki,N.Wakiya,A.Saiki,K.Shinozaki and N.Mizutani: "Preparation and Properties of PbTiO_3-PbZrO_3 Thin Films by Pulsed MO-Source CVD Method"Key Engineering Materials. 181-182. 77-80 (2000)
A.Endo、A.Iwasaki、N.Wakiya、A.Saiki、K.Shinozaki和N.Mizutani:“脉冲MO源CVD法制备PbTiO_3-PbZrO_3薄膜及其性能”关键工程材料。
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N.Wakiya,S.Nagata,M.Higuchi,K.Shinozaki and N.Mizutani: "Preparation of PbTiO_3 Thin Film by Mist Source Plasma Enhanced Chemical Vapor Deposition (CVD) Using Heptane Solvent"Jpn.J.Appl.Phys. 38[9]. 5326-5331 (1999)
N.Wakiya、S.Nagata、M.Higuchi、K.Shinozaki 和 N.Mizutani:“使用庚烷溶剂通过雾源等离子体增强化学气相沉积 (CVD) 制备 PbTiO_3 薄膜”Jpn.J.Appl.Phys。
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共 17 条
Development of homogeneous solid electrolyte/electrode structureby chemical vapor deposition method
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批准号:23656426
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.5万
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财政年份:2011
-
负责人:SHINOZAKI Kazuo
-
依托单位:
Development of new type sensor structures using epitaxial-thin-film growth technology
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批准号:22360289
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.23万
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财政年份:2010
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负责人:SHINOZAKI Kazuo
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依托单位:
Development of oxide solid electrolyte working at lower temperature by stress controlled film deposition method
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批准号:19360295
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$13.06万
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财政年份:2007
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负责人:SHINOZAKI Kazuo
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依托单位:
Chemical interaction in gaseous phase of MOCVD raw materials and self-assembled ferroelectric thin films
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批准号:15360339
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.92万
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财政年份:2003
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负责人:SHINOZAKI Kazuo
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依托单位:
Molecular genetical analysis of Plant gene expression by phytohormones
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批准号:08454263
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$1.73万
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财政年份:1996
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负责人:SHINOZAKI Kazuo
-
依托单位:
Development and Manufacturing of Maltilayr coated Ceramic-Composite Particles.
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批准号:07555203
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$8.45万
-
财政年份:1995
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负责人:SHINOZAKI Kazuo
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依托单位:
Molecular analysis of plant gene expression by phytohormone abscisic acid.
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批准号:06454017
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.61万
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财政年份:1994
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负责人:SHINOZAKI Kazuo
-
依托单位:
Liquid Phase Formation and Sintering Mechanism of Nitride-Oxide Ceramics.
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批准号:05650629
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.6万
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财政年份:1993
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负责人:SHINOZAKI Kazuo
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依托单位:
Molecular genetical analysis of plant gene expression by phytohormones.
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批准号:01480003
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.22万
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财政年份:1989
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负责人:SHINOZAKI Kazuo
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依托单位:
海外基金