Research of the fabrication for arbitrary 3D structure devices using synchrotron radiation (SR)

利用同步辐射（SR）制造任意3D结构器件的研究

• 批准号: 13450299
• 负责人: HATTORI Tadashi
• 金额: $ 9.6万
• 依托单位: Himeji Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-13450299/
• 关键词: Synchrotron orbit radiation; LIGA; Micromachine; X-ray mask; Microfabrication; Microsystems; MEMS; NEMS; Micro Mold; ナノ・マイクロファブリケーション; マイクロ・ナノファブリケイション

LIGA (German acronym for Lithographite Galvanoformung and Abformung) process, that utilizes a useful industrial application of synchrotron radiation (SR), is one of the promising technologies for fabrication of extremely tall three-dimensional (3D) microstructures with a large aspect ratio. Because X ray mask used in the present LIGA process has the uniform thickness of an absorber, the fabrication with flexibility in vertical-directions is very restricted.In this research, we proposed the new LIGA process using the X-ray mask absorbers with thickness variation in vertical direction. Moreover, this process is verified to give the fabrication with having flexibility in vertical-directions.10.The lighting-Panel (LP) for liquid crystal display (LCD) with the accurate 3D microstructures were designed simulation tool and actually they were fabricated using the X mask developed by this research The size of optical dot array conical patterns of the height 60μm formed on LP, for achieving high and uniform luminosity has to be less than several hundred and aspect ratio must be optimized

LIGA（德语Lithographite Galvanoformung和Abformung的首字母缩写）工艺利用同步辐射（SR）的有用的工业应用，是用于制造具有大纵横比的极高的三维（3D）微结构的有前途的技术之一。由于目前的LIGA工艺中使用的X射线掩模具有均匀的吸收体厚度，因此在垂直方向上的柔性制造受到很大限制，在本研究中，我们提出了新的LIGA工艺，使用X射线掩模吸收体在垂直方向上的厚度变化。10.设计了具有精确三维微结构的液晶显示器（LCD）照明面板（LP）的模拟工具，并使用本研究开发的X掩模实际制造了它们。LP上形成的高度为60μm的光学点阵锥形图案的尺寸，为了获得高且均匀的发光度，必须小于几百，

项目成果

服部 正: "放射光を用いた3次元マイクロ構造創製"日本機械学会 関東支部第8期講演会. WS.4-6. 41-42 (2002)

Tadashi Hattori：“利用同步加速器辐射创建三维微结构”日本机械工程师学会关东分会第八届年会 WS.41-42 (2002)。

X.C.Shan, R.Maeda, T.Ikehara, H.Mekaru, T.Hattori: "Fabrication of X-ray masks and applications for optical switch molding"Sensors and Actuators A. Vol.108, Issies 1-3. 224-229 (2003)

X.C.Shan、R.Maeda、T.Ikehara、H.Mekaru、T.Hattori：“X 射线掩模的制造和光学开关成型的应用”传感器和执行器 A. Vol.108，Issies 1-3。

Harutaka Mekaru, Yuichi Utsumi, Tadashi Hattori: "Quasi-3D microstructure fabrication technique utilizing hard X-ray lithography of synchrotron radiation"Microsystem Technologies. No.9. 36-40 (2002)

Harutaka Mekaru、Yuichi Utsumi、Tadashi Hattori：“利用同步辐射硬 X 射线光刻的准 3D 微结构制造技术”Microsystem Technologies。

Harutaka Mekaru, Yuichi Utsumi, Tadashi Hattori: "Current Status of LIGA Process at "NewSUBARU""JMSE/AMSE International Conference on Materials and Proceeding 2002. 589-592 (2002)

Harutaka Mekaru、Yuichi Utsumi、Tadashi Hattori：““NewSUBARU”LIGA 流程的现状”JMSE/AMSE 国际材料会议和会议记录 2002. 589-592 (2002)

Harutaka Mekaru, Yuichi Utsumi, Tadashi Hattori: "Effects of Synchrotron Radiation Spectrum Energy on Polymetyl Methacrylate Photosensitivity to Deep X-ray Lithography"Japan Society of Applied Physics. Vol.42, No.6B. 3807-3810 (2003)

Harutaka Mekaru、Yuichi Utsumi、Tadashi Hattori：“同步辐射光谱能量对聚甲基丙烯酸甲酯对深 X 射线光刻光敏性的影响”日本应用物理学会。