Research of the fabrication for arbitrary 3D structure devices using synchrotron radiation (SR)

LIGA工艺是利用同步辐射(SR)的工业应用，是制造大纵横比超高三维(3D)微结构的一种很有前途的技术。由于目前LIGA工艺中使用的X射线掩模具有均匀的吸收体厚度，垂直方向的柔性制造受到很大的限制，本研究提出了一种采用垂直方向厚度变化的X射线掩模吸收体的LIGA新工艺。10.设计了具有精确三维微结构的液晶显示器照明面板(LP)，并实际使用本研究开发的X掩模进行了制作。为了获得高且均匀的亮度，必须优化长宽比，并在其上形成高度为60μm的光学点阵圆锥图案

LIGA (German acronym for Lithographite Galvanoformung and Abformung) process, that utilizes a useful industrial application of synchrotron radiation (SR), is one of the promising technologies for fabrication of extremely tall three-dimensional (3D) microstructures with a large aspect ratio. Because X ray mask used in the present LIGA process has the uniform thickness of an absorber, the fabrication with flexibility in vertical-directions is very restricted.In this research, we proposed the new LIGA process using the X-ray mask absorbers with thickness variation in vertical direction. Moreover, this process is verified to give the fabrication with having flexibility in vertical-directions.10.The lighting-Panel (LP) for liquid crystal display (LCD) with the accurate 3D microstructures were designed simulation tool and actually they were fabricated using the X mask developed by this research The size of optical dot array conical patterns of the height 60μm formed on LP, for achieving high and uniform luminosity has to be less than several hundred and aspect ratio must be optimized