Development of the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD

利用大气等离子体CVD制备EEM超细颗粒装置的开发

• 批准号: 06555038
• 负责人: MORI Yuzo
• 金额: $ 4.48万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research (B)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-06555038/
• 关键词: EEM; atmospheric plasma; ultra-fine particle; SiH_4; plasma CVD; 微細粉末

This study aims at making ultra-fine particles for EEM (Elastic Emission Machining). EEM is one of the most precision machining method, utilizing chemical reaction in solid phase between the particle surface and the work surface. So that chemical properties and reactivities of each surface atoms is very important. And it is neccesary to select the optimum combination of the particle and the work to achieve efficient machining properties.To protect atmospheric plasma from arc discharge, the electrode surface was coated with ceramics. And the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD was realized. Using the appratus, it was found that ultra-fine particles (about 50nm in diameter) of Si was made from SiH_4, and that SiH_4 was decomposed more efficiently by using He than Ar as carrier gas. It was also found that to collect the ultra-fine particles just after the plasma region dispersively directly to the pure water (the atmospheric pressure's merit), the collection efficency of the ultra-fine particles was up to nearly 100%.

本研究的目的是为弹性发射加工（EEM）制造超细颗粒。电火花加工是利用粒子表面与工件表面之间的固相化学反应进行加工的一种精密加工方法。因此，每个表面原子的化学性质和反应性是非常重要的。为了获得高的加工性能，必须选择最佳的粒子和功的组合。为了防止电弧放电对大气等离子体的影响，在电极表面涂覆陶瓷。实现了利用常压等离子体化学气相沉积法制备电子显微镜用超细粒子的装置。实验结果表明，以SiH_4为原料，可以制备出直径约50 nm的硅超细颗粒，以He为载气比以Ar为载气更能有效地分解SiH_4。实验还发现，在等离子体区之后直接将超细颗粒分散收集到纯水中（大气压的优点），超细颗粒的收集效率接近100%。