Development of the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD
Development of the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD
批准号:
06555038
负责人:
MORI Yuzo
金额:
$4.48万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
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英文摘要
This study aims at making ultra-fine particles for EEM (Elastic Emission Machining). EEM is one of the most precision machining method, utilizing chemical reaction in solid phase between the particle surface and the work surface. So that chemical properties and reactivities of each surface atoms is very important. And it is neccesary to select the optimum combination of the particle and the work to achieve efficient machining properties.To protect atmospheric plasma from arc discharge, the electrode surface was coated with ceramics. And the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD was realized. Using the appratus, it was found that ultra-fine particles (about 50nm in diameter) of Si was made from SiH_4, and that SiH_4 was decomposed more efficiently by using He than Ar as carrier gas. It was also found that to collect the ultra-fine particles just after the plasma region dispersively directly to the pure water (the atmospheric pressure's merit), the collection efficency of the ultra-fine particles was up to nearly 100%.
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Crystallographical Control in Urtra-Precision Cutting
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依托单位:
海外基金