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Creation of Perfect Surfaces

Creation of Perfect Surfaces
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批准号:
08CE2004
负责人:
MORI Yuzo
金额:
$1085.44万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for COE Research
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 2002

项目摘要

项目成果

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中文摘要
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英文摘要
"Perfect surfaces"are required in various areas of advanced technology and basic science. The objectives of the present research are to establish new ultra precision machining technology that can be used to create "perfect surfaces" with roughness less than 0.5nm PV and figure accuracy higher than 0.01μm PV for arbitrary shape, and to systematize the technology of ultra precision machining as a new paradigm of natural science.We have constructed Ultra Clean Room with the world's top performance and conducted researches in the following fields ; 1) development of new machining process ; 2) evaluation of machined surfaces and development of new-surface evaluation techniques ; 3) development of measurement and control technology for machining process ; and 4) theoretical study of machining mechanism.In the field 1), we have developed numerically controlled plasma chemical vaporization machining NC-PCVM) system, elastic emission machining (EEM) system, atmospheric pressure plasma chemical … More vapor deposition (AP-PCVD) process at high deposition rates, and hydroxyl electrochemical machining (HECM) process using pure water only. Ultra precision X-ray mirrors, ultra thin SOI wafers, Si thin film solar cells, and HECM damascene process are highlighted as several of numerous outcomes. An ultra precision measuring sytem of figure accuracy and an evaluation system for ultra precisely machined surfaces have been developed in 2), and a diagnostic system for atmospheric pressure plasma in 3). Based on calculated results by the originally developed first-principles methods, we have proposed HECM and clarified its machining mechanism in 4).In summary, we have achieved to create a "perfect surface" with the roughness of three atomic layers (in 0.1μm x 0.1μm area) and the figure accuracy of 1nm PV. Cooperating with outer institutes that need perfect surfaces, we have produced a scanning X-ray microscope system and ultra thin SOI devices. These achievements well surpassed the objectives at the beginning. Less
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会议论文
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通讯作者:
Y.Mori: "Sub-micron focusing by reflective optics for scanning x-ray microscopy"Proc. SPIE. 4782. 58-64 (2002)
Y.Mori:“用于扫描 X 射线显微镜的反射光学器件的亚微米聚焦”Proc。
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森勇藏: "大気圧プラズマCVDによるSiの高速エピタキシャル成長(第2報)-成膜温度と投入電力が結晶性に及ぼす影響-"2002年度精密工学会春季学術講演会講演論文集. (2002)
Yuzo Mori:“通过大气压等离子体CVD进行Si的高速外延生长(第2次报告)-成膜温度和输入功率对结晶度的影响-”2002年日本精密工程学会春季学术会议论文集(2002年)。
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森勇藏: "超純水のみによる電気化学的加工法の研究-陰極表面における加工現象"精密工学会誌. (投稿中).
森雄三:“仅使用超纯水的电化学加工方法的研究-阴极表面的加工现象”日本精密工程学会杂志(正在提交)。
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484
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