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Creation of Perfect Surfaces

创造完美表面

基本信息

批准号：
08CE2004
负责人：
MORI Yuzo
金额：
$ 1085.44万
依托单位：
Osaka University
依托单位国家：
日本
项目类别：
Grant-in-Aid for COE Research
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 2002
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08CE2004/
关键词：
Perfect surfaces Ultra precision machining Plasma CVM EEM Atmospheric pressure plasma CVD Electrochemical machining in ultrapure water First-principles molecular dynamics simulation Ultra clean technology 超純粋電解加工第一原理分子動力学シュミレーション STM

项目摘要

"Perfect surfaces"are required in various areas of advanced technology and basic science. The objectives of the present research are to establish new ultra precision machining technology that can be used to create "perfect surfaces" with roughness less than 0.5nm PV and figure accuracy higher than 0.01μm PV for arbitrary shape, and to systematize the technology of ultra precision machining as a new paradigm of natural science.We have constructed Ultra Clean Room with the world's top performance and conducted researches in the following fields ; 1) development of new machining process ; 2) evaluation of machined surfaces and development of new-surface evaluation techniques ; 3) development of measurement and control technology for machining process ; and 4) theoretical study of machining mechanism.In the field 1), we have developed numerically controlled plasma chemical vaporization machining NC-PCVM) system, elastic emission machining (EEM) system, atmospheric pressure plasma chemical … More vapor deposition (AP-PCVD) process at high deposition rates, and hydroxyl electrochemical machining (HECM) process using pure water only. Ultra precision X-ray mirrors, ultra thin SOI wafers, Si thin film solar cells, and HECM damascene process are highlighted as several of numerous outcomes. An ultra precision measuring sytem of figure accuracy and an evaluation system for ultra precisely machined surfaces have been developed in 2), and a diagnostic system for atmospheric pressure plasma in 3). Based on calculated results by the originally developed first-principles methods, we have proposed HECM and clarified its machining mechanism in 4).In summary, we have achieved to create a "perfect surface" with the roughness of three atomic layers (in 0.1μm x 0.1μm area) and the figure accuracy of 1nm PV. Cooperating with outer institutes that need perfect surfaces, we have produced a scanning X-ray microscope system and ultra thin SOI devices. These achievements well surpassed the objectives at the beginning. Less

各种先进技术和基础科学领域都需要“完美表面”。本研究的目标是建立一种新的超精密加工技术，用于制造粗糙度小于0.5nm PV、图形精度高于0.01μ PV的任意形状的“完美表面”，并使超精密加工技术系统化，成为一种新的自然科学范式。我们建设了世界顶级性能的超洁净室，并在以下领域进行了研究：1)开发新的加工工艺；2)加工表面评价及新表面评价技术的发展；3)机械加工过程测控技术的发展；4)加工机理的理论研究。在1)领域，我们开发了数控等离子体化学汽化加工（NC-PCVM）系统、弹性发射加工（EEM）系统、高沉积速率的常压等离子体化学气相沉积（AP-PCVD）工艺和仅使用纯水的羟基电化学加工（HECM）工艺。超精密x射线反射镜、超薄SOI晶圆、硅薄膜太阳能电池和HECM大马士革工艺是众多成果中的几个。2)开发了超精密图形精度测量系统和超精密加工表面评价系统，3)开发了常压等离子体诊断系统。基于最初发展的第一性原理方法的计算结果，我们在4)中提出了HECM并阐明了其加工机理。综上所述，我们已经实现了具有三个原子层（0.1μm x 0.1μm面积）的粗糙度和1nm PV的图形精度的“完美表面”。我们与需要完美表面的外部机构合作，生产了扫描x射线显微镜系统和超薄SOI器件。这些成就远远超过了最初的目标。少