Study on surface coating of ultra-fine particles for EEM machining.
EEM加工用超细颗粒表面涂层研究
基本信息
- 批准号:04555035
- 负责人:
- 金额:$ 4.8万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Developmental Scientific Research (B)
- 财政年份:1992
- 资助国家:日本
- 起止时间:1992 至 1993
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
This study aims at making ultra-fine particles for EEM(Elastic Emission Machining). EEM is one of the most precision machining method, utilizing chemical reaction in solid phase between the pariticle surface and the work surface. So that chemical properties and reactivities of each surface atoms is very important. And it is neccesary to select the optimum combination of the particle and the work to achieve efficient machining properties.Last year, the appratus for making the ultra-fine particles utilizing plasma CVD was designed and constructed. It was found that stable plasma state could be maintained with the condition of continuous feeding the powder particle, and classification of particles with the range from 0.03mum to 1.0mum was possible.This year, polystirene ultra-fine particle coated with alumina(Al_2O_3) was prepared, and applied to EEM machining of Si wafer. The results are shown as follows.These results shows ability of the coating system, and significance of coating method.
本研究的目的是为弹性发射加工(EEM)制造超细颗粒。电火花加工是利用材料表面与工件表面之间的固相化学反应进行精密加工的方法之一。因此,每个表面原子的化学性质和反应性是非常重要的。为了获得高效率的加工性能,必须选择最佳的粒子和加工的组合。去年,设计并制造了利用等离子体CVD制造超细粒子的设备。结果表明,在连续供给粉末颗粒的条件下,可以保持稳定的等离子体状态,并且可以对0.03 μ m ~ 1.0 μ m的颗粒进行分级。今年,制备了氧化铝(Al_2O_3)包覆的聚苯乙烯超细颗粒,并将其应用于硅片的电磁加工。结果表明,该涂层体系具有较好的涂层性能,涂层方法具有重要意义。
项目成果
期刊论文数量(2)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
森勇藏: "超精密加工とマイクロトライボロジー" トライボロジスト. 37. 37-41 (1992)
Yuzo Mori:“超精密加工和微摩擦学”摩擦学家。37. 37-41 (1992)
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
Yuzo Mori: "Microtribology in High Precision Machining" Journal of Japanese Society of Tribologists. 37. 37-41 (1992)
Yuzo Mori:“高精度加工中的微观摩擦学”日本摩擦学会杂志。
- DOI:
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- 影响因子:0
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MORI Yuzo其他文献
MORI Yuzo的其他文献
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{{ truncateString('MORI Yuzo', 18)}}的其他基金
Development of High?precision and High-ef icient Finishing Process of Over Meter Size Photomask Substrate for LCD
米级以上LCD光罩基板高精度、高效率精加工工艺开发
- 批准号:
18206017 - 财政年份:2006
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$ 4.8万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Electrochemical machining using ultrapure water
使用超纯水进行电化学加工
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11305014 - 财政年份:1999
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$ 4.8万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
The development of the equipment for the ultra precision aspherical optics using plasma CVM.
使用等离子CVM的超精密非球面光学设备的开发。
- 批准号:
10355007 - 财政年份:1998
- 资助金额:
$ 4.8万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Creation of Perfect Surfaces
创造完美表面
- 批准号:
08CE2004 - 财政年份:1996
- 资助金额:
$ 4.8万 - 项目类别:
Grant-in-Aid for COE Research
Studies on radical generation mechanism in the atmospheric plasma etching
大气等离子刻蚀中自由基产生机理的研究
- 批准号:
07455063 - 财政年份:1995
- 资助金额:
$ 4.8万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Development of the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD
利用大气等离子体CVD制备EEM超细颗粒装置的开发
- 批准号:
06555038 - 财政年份:1994
- 资助金额:
$ 4.8万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
Study on substrate surface modification by ion beam irradiation
离子束辐照基体表面改性研究
- 批准号:
05452126 - 财政年份:1993
- 资助金额:
$ 4.8万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
Study on Substrate Surface Modification
基材表面改性研究
- 批准号:
01460090 - 财政年份:1989
- 资助金额:
$ 4.8万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
Development of Surface Treatment Method for Ultra-Fine Powder Particles for Elastic Emission Machining (EEM)
弹性发射加工(EEM)用超细粉末颗粒表面处理方法的开发
- 批准号:
01850031 - 财政年份:1989
- 资助金额:
$ 4.8万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research (B).
Crystallographical Control in Urtra-Precision Cutting
超精密切割中的晶体控制
- 批准号:
61460093 - 财政年份:1986
- 资助金额:
$ 4.8万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
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