Study on effect of discharge frequency on particle growth in high frequency plasma.
Study on effect of discharge frequency on particle growth in high frequency plasma.
批准号:
07458093
负责人:
WATANABE Yukio
金额:
$1.02万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996
中文摘要
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英文摘要
Discharge frequency dependence of growth processes of particles in silane rf discharges have been studied in a size range above a few nanometers as parameters of discharge frequency. A seies of experiments have given the following results : particles nucleate and grow around the plasma/sheath boundary by the rf electrode for all discharge frequencies ; increasing the discharge frequency under a constant power, a growth rate of particles in the rapid growth phase decreases, while they begin to be observed earlier after the discharge initiation due to the increase in their density ; a density of particles of -10nm in size is comparable to or even higher than that of ions, and hence almost of them are neutral. These results can not be explained by the conventional thermal coagulation model, suggesting that high energy electrons above several 10's eV play an important role to ionize a part of neutral particles in their rapid growth. In order to explain properly most of these exprimental features, a particle coagulation model is proposed.
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Yukio Watanabe: "Contribution of short lifetime radicals to growth of particles in SiH_4 HF discharges and effects of particles on deposited films" J.Vac.Sci.Technol.A. 14,3. 995-1001 (1996)
Yukio Watanabe:“短寿命自由基对 SiH_4 HF 放电中颗粒生长的贡献以及颗粒对沉积薄膜的影响”J.Vac.Sci.Technol.A。
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通讯作者:
Y.Watanabe, M.Shiratani, T.Fukuzawa, H.Kawasaki, Y.Ueda, S.Singh and H.Ohkura: "Contribution of short lifetime radicals to growth of particles in SiH_4 HF discharges and effects of particles on deposited films" J.Vac. Sci. & Technol. A. Vol.14. 995-1001 (
Y.Watanabe、M.Shiratani、T.Fukuzawa、H.Kawasaki、Y.Ueda、S.Singh 和 H.Ohkura:“短寿命自由基对 SiH_4 HF 放电中粒子生长的贡献以及粒子对沉积薄膜的影响”
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Masaharu Shiratani: "In-situ polarization-sensitive laser-light scattering method for simultanious measurements of two dimensional spatial size and density distributions of particles in plasmas" J.Vac.Sci.Technol.A. 14,2. 603-607 (1996)
Masaharu Shiratani:“用于同时测量等离子体中粒子的二维空间尺寸和密度分布的原位偏振敏感激光散射方法”J.Vac.Sci.Technol.A。
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川崎仁晴: "高周波シランプラズマ中微粒子の成長過程と放電周波数の関係" 第42回応用物理学関係連合講演会講演予稿集. 29- (1995)
川崎仁治:《高频硅烷等离子体中细颗粒的生长过程与放电频率的关系》第42届应用物理学会演讲会论文集29-(1995)。
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Hiroharu Kawasaki: "Study on Growth Processes of Particles in rf SiH_4 Plasmas" Proc.3rd Int.Conf.Reactive Plasma/14th Symp.Plasma Processes. 3. 351-352 (1997)
Hiroharu Kawasaki:“rf SiH_4 等离子体中粒子生长过程的研究”Proc.3rd Int.Conf.Reactive Plasma/14th Symp.Plasma Processes。
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