MRI: Development of the Next Generation of Compact Coherent Extreme Ultraviolet Sources

0521649 RQ 1该项目的目标是开发新一代紧凑型相干极紫外（EUV）和软X射线光源，该光源将产生比以前更高的功率和更短的波长。 基于高电离等离子体柱中的放大自发辐射和高次谐波产生技术，将开发两种不同类型的具有互补特性的源。这些目标包括在100 eV光子能量区域中产生高平均功率相干光，这是技术上感兴趣的，以及在300-400 eV光谱区域中产生高平均功率相干光，这是生物科学上非常感兴趣的。拟议的仪器开发还将尝试将高次谐波源扩展到千电子伏（l1 nm）光谱区域。这些光源将使在桌面上实现EUV科学和工业计量成为可能，而空间相干光以前只能通过在大型同步加速器设施中使用波动器获得。预计新光源的能力增加将在表面，化学和材料动力学研究，生物学研究，密集等离子体诊断，EUV非线性光学以及开发新的计量工具和工业纳米探针等方面开辟各种新的研究领域。 拟议的EUV光源开发项目将对科学和技术、劳动力发展和多样性努力产生重要的广泛影响。首先，它将为50名研究生，本科生，博士后学生和教师提供在科学和工程前沿工作的机会，在广泛的学科（包括工程，物理，生物和材料科学）中开发和应用最前沿的EUV光源。其次，它将培养学生在两个领域的技术是重要的工业在21世纪世纪-高功率激光器和EUV光源。第三，它将通过与少数民族和妇女服务机构，包括斯佩尔曼学院和莫尔豪斯学院积极合作，提高劳动力的多样性。该开发项目还将加速EUV光在科学和技术中的应用。

0521649RoccaThe objective of this project is to develop a new generation of compact coherent Extreme Ultraviolet (EUV) and soft X-ray light sources that will generate higher powers and reach shorter wavelengths than previously possible. Two different type of sources with complementary characteristics will be developed based on the techniques of amplified spontaneous emission in a highly ionized plasma column and high harmonic generation. The goals include the generation of high average power coherent light in the 100 eV photon energy region that is of interest for technology, and in the 300-400 eV region of the spectrum that is of great interest for biological science. The proposed instrument development will also attempt extending high harmonic sources to the kilo-electron volt (l1 nm) spectral region. These sources will make it possible to implement EUV science and industrial metrology on a tabletop, with spatially-coherent light previously available only by using undulators at large synchrotron facilities. The increased capabilities of the new sources is expected open up a variety of new areas of investigation in surface, chemical and material dynamics studies, biological studies, dense plasma diagnostics, EUV non-linear optics, and the development of a new of metrology tools and nanoprobes for industry. The proposed EUV source development project will have important broad impacts on science and technology, on workforce development and diversity efforts. First, it will provide 50 graduate, undergraduate, post-doctoral students, and faculty enhanced opportunities to work at the frontiers of science and engineering, -developing and applying forefront EUV sources in a broad range of disciplines (including engineering, physics, biology and materials science). Second, it will train students in two areas of technology that are important for industry in the 21st century - high power lasers and EUV sources. Third, it will enhance workforce diversity through active collaborations with minority and women-serving institutions, including Spelman College and Morehouse College. This development project will also accelerate applications of EUV light in science and technology..