STUDY OF ULTRA-FINE STRUCTURED OPTICAL COMPONENTS USIING MICROMACHINING

提出了一种利用电子束拉丝机和快速原子束刻蚀机制作亚波长光栅的方法。在非导电光学玻璃表面制作了150nm周期表面光栅。利用中性快原子束代替传统等离子体中的离子，实现了非导电表面的刻蚀。在不充电的情况下，获得了高纵横比的深刻蚀轮廓。采用该方法，光学玻璃表面的反射得到了明显的抑制。编制了计算亚波长光栅内强电磁场的程序。结果表明，光栅的周期和宽高比对反射特性有很大的影响。采用多孔氧化铝膜作为掩膜，在Si衬底上制备了周期为100nm、纵横比为6的亚波长光栅。在370nm ~ 800nm波长范围内，获得了较好的抗反射性能。此外，还在砷化镓发光二极管表面制备了亚波长光栅。利用砷化镓的蚀刻特性，制备了表面光栅的锥形轮廓，成功地提高了光栅的发光强度。此外，还对表面光栅与微致动器的组合进行了研究。

We proposed a fabrication technique for sub-wavelength grating using electron-beam drawing machine and fast atom beam etching machine. On the surface of nonconductive optical glass, 150nm period surface gratings were fabricated. The etching of the nonconductive surface was carried out by using advantageously the neutral fast atom beam instead of ions in the conventional etching plasma. Without charging the surface, the deep etched profile with high aspect ratio was obtained. Using the proposed method, the reflection from the optical glass surface was suppressed considerably.A program for calculating the rigorous electro-magnetic field in sub-wavelength grating was developed. It was revealed that the reflection properties were influenced very much by the period and aspect ratio of the gratings.Using porous alumina membrane as a mask, the sub-wavelength gratings having 100nm period and the aspect ratio of 6 were fabricated on Si substrate. In the wavelength region from 370nm to 800nm, the superior properties for anti-reflection were obtained. Moreover, sub-wavelength gratings were also fabricated on the surface of the gallium arsenic light emission diode. Using the etching property of GaAs, tapered profile of surface grating was fabricated and a increase of the light emission was successfully obtained. In addition, the combinations between the surface gratings and micro-actuators were also investigated.