Development of plasma process equipment with pulsed plasma ablation technique

通过暴露在脉冲等离子体中，在硅衬底上沉积薄的非晶碳膜，其中原料气体主要来自绝缘体的烧蚀。绝缘子烧蚀采用电热脉冲等离子体推进器作为脉冲等离子体，绝缘棒材料为聚四氟乙烯(PTFE)。用X射线光电子能谱分析了沉积薄膜的元素组成。测量光谱表明，氟F1s的含量大于碳C1s的含量。在拉曼光谱中，清楚地观察到两个非常宽的重叠带，这两个带归因于G(石墨)和D(无序)峰。由纳米压头测得的最大硬度约为7 Gpa。因此，应将该膜视为氟化类金刚石膜。

Thin amorphous carbon films are deposited on silicon substrates by exposure to pulsed plasmas where the feed gas is mainly generated from the ablation of an insulator. An electrothermal pulsed plasma thruster is used as the pulsed plasma for the ablation of the insulator, and the material of the insulator rod is polytetrafluoroethylene (PTFE). X-ray photoelectron spectroscopy is used in order to understand the elemental compositions of the deposited films. The measured spectra show that the fraction of fluorine F1s is larger than that of carbon C1s. In Raman spectra, two, very broad overlapping bands, which are attributed to the G (graphite) and D (disorder) peaks, are clearly observed. The maximum hardness measured by a nanoindenter is about 7 GPa. Therefore, the films should be regarded as fluorinated DLC films.