CAREER: III-V Semiconductor Nanotubes: New Nanotechnology Building Blocks and New Functionalities
CAREER: III-V Semiconductor Nanotubes: New Nanotechnology Building Blocks and New Functionalities
批准号:
0747178
负责人:
Xiuling Li
金额:
$39.95万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2008
资助国家:
美国
项目状态:
已结题
起止时间:
2008-01-15 至 2013-08-31
中文摘要
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英文摘要
AbstractECCS-0747178Xiuling Li, University of Illinois at Urbana-Champaign Objective:The objective of this research is to establish a new type of nanotechnology building block, III-V semiconductor nanotube, and its functionalities. The approach is (1) to use semiconductor nanotubes as individual building block for the channel material of field effect transistors; (2) to functionalize semiconductor nanotubes by incorporating active epitaxial device structures in the tubular frame for optical resonators; and (3) to explore their applications for compact and effective chemical and biological sensing. Intellectual Merit:Semiconductor nanotubes open a new direction in III-V device physics and applications, by adding a degree of freedom, out-of-plane curvature. The top-down formation approach is expected to lead to large area integration. Results will advance the frontier of knowledge in semiconductor carrier transport, optical waveguiding, and strain engineering, and related fields. Broader Impact:The versatile functionalities of this new class of nanotechnology building blocks will inevitably impact many other technology of emerging importance, including drug delivery, homeland security, fuel leak detection in automobiles and spacecraft, and pollution mission. By engaging students in this emerging field of research, the proposed activities will help ensure their competence and leadership in today?s global environment. By recruiting and retaining women engineers through creating and maintaining a sense of community and leading by example, the PI will make a long lasting effect on the world class, broadly inclusive science and technology workforce. An outreach program targeting elementary school girls will cultivate the young minds at the earliest possible stage to respect and embrace a career in science and engineering.
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Collaborative Research: Non-Conventional Etching and MOCVD Regrowth for Beta-GaO/AlGaO 3D HEMTs
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批准号:2200651
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项目类别:Standard Grant
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资助金额:$24.85万
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财政年份:2021
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负责人:Xiuling Li
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依托单位:
Collaborative Research: Non-Conventional Etching and MOCVD Regrowth for Beta-GaO/AlGaO 3D HEMTs
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批准号:1809946
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项目类别:Standard Grant
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资助金额:$24.85万
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负责人:Xiuling Li
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I-Corps: Passive Electronics Miniaturization Technology
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批准号:1722234
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项目类别:Standard Grant
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资助金额:$5.0万
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负责人:Xiuling Li
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依托单位:
PFI:AIR-TT: Technology Translation: Rolled-up 3D Passive Electronic Component Prototype Development
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批准号:1701047
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项目类别:Standard Grant
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资助金额:$20.0万
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负责人:Xiuling Li
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依托单位:
Collaborative Research: Programmable Metal-Assisted Chemical Etching for Three-Dimensional Functional Metamaterials
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批准号:1462946
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项目类别:Standard Grant
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资助金额:$18.0万
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财政年份:2015
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负责人:Xiuling Li
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依托单位:
Lateral Epitaxial Growth of Nanowires for Electronics
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批准号:1508140
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项目类别:Standard Grant
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资助金额:$42.0万
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财政年份:2015
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负责人:Xiuling Li
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依托单位:
GOALI: Scaling-up Electronic Purification of Single Wall Carbon Nanotubes via Nanoscale Thermocapillary Flows for High Performance Transistors
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批准号:1436133
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项目类别:Standard Grant
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资助金额:$30.0万
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财政年份:2014
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负责人:Xiuling Li
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依托单位:
nano@illinois RET: Research Experience for Teachers Site in Nanotechnology (RET in Engineering and Computer Science Site)
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批准号:1407194
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项目类别:Standard Grant
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资助金额:$50.0万
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财政年份:2014
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负责人:Xiuling Li
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依托单位:
On-Chip 3D Spiral Inductors by Self-rolled-up Membranes: Extreme Miniaturization and Performance Enhancement
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批准号:1309375
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项目类别:Continuing Grant
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资助金额:$32.55万
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财政年份:2013
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负责人:Xiuling Li
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依托单位:
Collaborative:High Performance III-V Nanowire FETs Enabled by Controlled MOCVD Growth and ALD High-k Passivation
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批准号:1001928
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项目类别:Standard Grant
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资助金额:$25.0万
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财政年份:2010
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负责人:Xiuling Li
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依托单位:
Exploring the Mechanism of VLS Planar Nanowire Growth through Structural and Impurity Perturbation
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批准号:1006581
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资助金额:$39.54万
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依托单位:
The Growth and Characterization of GaN and InGaN Structures by Selective-Area Metalorganic Chemical Vapor Deposition
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批准号:9714289
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项目类别:Standard Grant
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资助金额:$6.0万
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财政年份:1997
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负责人:Xiuling Li
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依托单位:
国内基金
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