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Engineering nanoscale material properties by controlled-temperature indentation

Engineering nanoscale material properties by controlled-temperature indentation
通过控制温度压痕工程纳米级材料特性
批准号:
DP0880255
负责人:
Prof James Williams
金额:
$30.85万
依托单位国家:
澳大利亚
项目类别:
Discovery Projects
财政年份:
2008
资助国家:
澳大利亚
项目状态:
已结题
起止时间:
2008-01-01 至 2011-12-31

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中文摘要
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英文摘要
The research is in a field of high national priority, namely nanotechnology. The technology is based on semiconductor modification at the nanoscale by nanoindentation. This project will further provide valuable opportunities for a number of research students and early-career researchers to gain skills as well as learn techniques and processes needed for Australia's nanotechnology workforce. Australia will further benefit as the skills and knowledge garnered from this work will be patented at every opportunity and transferred to a spin-off company, WRiota.
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Exploiting deep sub-surface temperature-induced phase-transformations for an improved approach to semiconductor laser-dicing
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Understanding the structure and unusual properties of ion implanted amorphous germanium
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Narrow band gap silicon: understanding and exploiting this new silicon phase
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  • 项目类别:
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  • 财政年份:
    2011
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A novel approach to direct nanopatterning of silicon for advanced phase-changed devices
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  • 负责人:
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  • 依托单位:
海外基金