Low temperature fabrication of silicon-based thin film transistors (TFTs) for flat panel displays - an entirely new approach
Low temperature fabrication of silicon-based thin film transistors (TFTs) for flat panel displays - an entirely new approach
批准号:
LP0777007
负责人:
Prof James Williams
金额:
$13.87万
依托单位国家:
澳大利亚
项目类别:
Linkage Projects
财政年份:
2008
资助国家:
澳大利亚
项目状态:
已结题
起止时间:
2008-09-23 至 2011-10-31
中文摘要
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英文摘要
This project represents an entirely new approach to low temperature crystallization of amorphous silicon, and its application to TFT fabrication in flat panel displays, and involves a partnership with the Australian high-tech company, WRiota. The research is in a field of high national priority, namely nanotechnology, since the technology is based on materials modification at the nanoscale by nanoindentation. This project will further provide valuable opportunities for a number of research students and ECRs to gain experience in both the industrial and academic worlds and skills needed for Australia's nanotechnology workforce.
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