Low temperature fabrication of silicon-based thin film transistors (TFTs) for flat panel displays - an entirely new approach

用于平板显示器的硅基薄膜晶体管 (TFT) 的低温制造——一种全新方法

• 批准号: LP0777007
• 负责人: Prof James Williams
• 金额: $ 13.87万
• 依托单位: The Australian National University
• 依托单位国家: 澳大利亚
• 项目类别: Linkage Projects
• 财政年份: 2008
• 资助国家: 澳大利亚
• 起止时间: 2008-09-23 至 2011-10-31
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/LP0777007
• 关键词: Low; temperature; fabrication; silicon; based

This project represents an entirely new approach to low temperature crystallization of amorphous silicon, and its application to TFT fabrication in flat panel displays, and involves a partnership with the Australian high-tech company, WRiota. The research is in a field of high national priority, namely nanotechnology, since the technology is based on materials modification at the nanoscale by nanoindentation. This project will further provide valuable opportunities for a number of research students and ECRs to gain experience in both the industrial and academic worlds and skills needed for Australia's nanotechnology workforce.

该项目代表了一种全新的非晶硅低温结晶方法及其在平板显示器TFT制造中的应用，并与澳大利亚高科技公司WRiota建立了伙伴关系。 这项研究属于国家高度优先领域，即纳米技术，因为该技术是基于通过纳米压痕在纳米尺度上对材料进行改性。 该项目将进一步为一些研究生和ECR提供宝贵的机会，以获得工业和学术界的经验以及澳大利亚纳米技术劳动力所需的技能。