STUDY FOR P-TYPE DOPING OF GaInN SINGLE CRYSTAL FILMS
STUDY FOR P-TYPE DOPING OF GaInN SINGLE CRYSTAL FILMS
批准号:
06650369
负责人:
NAGATOMO Takao
金额:
$1.28万
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
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英文摘要
Metalorganic Chemical Vapor Deposition Equipment was remodeled a hydrogen system into a nitrogen system by GRANT-IN-AID FOR SCIENTIFIC RESEARCH (1994). Magnesium-doping in the GaInN films have been investigated to get p-type condcution. Our study group has investigated epitaxial growth of GaN and GaInN films under the pressure of 700Torr, though we did growth of GaN and GaInN under the vacuum pressure of about 100 Torr. We considered that the growth conditions were almost established. The carrier densities of the films are decreased to an order of 10^<-16>cm^<-3>. GaN films converts p-type conduction by thermal annealing. The conditions of thermal annealing must be optimizied. GaN films with good quality of the carrier densities of an order of 10^<-16>cm^<-3> and the full width at half maximum value of 390 arcsec by the two crystal X-ray rocking curve are obtained. Mg-doped GaN films were grown at the same conditions and after that converted p-type conduction by thermal annealing in the nitrogen atmosphere above 600C.Blue-light emission with a wavelength of about 420nm was obtained using these GaN pn junctions. The refractive indices including the wavelength dependences of GaN, GaInN, and GaAlNare measued by elliposometry. These refractive indices are used to design GaN system laser diodes. It is possible to fabricate highly luminescent light-emitting diodes (LED) driving low voltage with double heterostructure deposited GaN and GaInN, or GaInN and GaAlN in turn. We advance to fabricate p-GaN/GaInN/n-GaN double heterostructure LEDs. Furthermore, we invesgate how to make the cavity for laser diodes using GaN system.and laser diodes.
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T.Morita, M.Miyawaki, K.Yokouchi, T.Nagatomo and O.Omoto: "Epitaxial Growth of GaN Films by MOVPE-Influence of Misorientation of Sapphire Substrates-" Extended Abstracts (The 43rd Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related So
T.Morita、M.Miyawaki、K.Yokouchi、T.Nagatomo 和 O.Omoto:“通过 MOVPE 进行 GaN 薄膜的外延生长 - 蓝宝石衬底的错误取向的影响 -”扩展摘要(第 43 届春季会议,1996 年);
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H. Ishikawa, T. Soga, T. Nagatomo, T. JImbo and M. Umeno: "Highly c-axis aligned GaN thin film grown on Si using GaP intermediate layer by metalorganic chemical vapor deposition." Proc. of Int'l Symp. on Blue Laser and Light Emitting Doides, Chaba Univ.,
H. Ishikawa、T. Soga、T. Nagatomo、T. Jimbo 和 M. Umeno:“通过金属有机化学气相沉积,使用 GaP 中间层在 Si 上生长高度 c 轴排列的 GaN 薄膜。”
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太田一生、浜口寛、奥村元、長友隆男、吉田貞史: "ECRプラズマを用いたガスソースMBE法による立方晶GaNの成長" 第43回応用物理学関係連合講演会講演予稿集26aZB-8. 244 (1996)
Issei Ota、Hiroshi Hamaguchi、Hajime Okumura、Takao Nagatomo、Sadafumi Yoshida:“使用 ECR 等离子体通过气源 MBE 方法生长立方氮化镓”第 43 届应用物理协会会议记录 26aZB-8 (1996)。
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T.Inukai,T.Sugihara,T.Nagatomo and O.Omoto: "Physical Properties of Gallium Indium Nitride Prepared by Photo-Assisted MOVPE" 13th Record of Alloy Semiconductor Physics and Electronics Symposium Izu-Nagaoka. 227-228 (1994)
T.Inukai、T.Sugihara、T.Nagatomo 和 O.Omoto:“光辅助 MOVPE 制备的氮化镓铟的物理性质”第 13 届合金半导体物理与电子学研讨会伊豆长冈记录。
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K.Yokouchi, T.Araki, T.Nagatomo and O.Omoto: "Epitaxial Growth of GaN Films on Silicon Substrates by MOVPE" Tech.Digest of the 6th In'tl Conf.on silicon Carbide and Related Materials, Kyoto, Japan. TuP-1 (Proceedings to be published). 255-256 (1996)
K.Yokouchi、T.Araki、T.Nagatomo 和 O.Omoto:“通过 MOVPE 在硅衬底上外延生长 GaN 薄膜”第六届国际碳化硅及相关材料会议技术文摘,日本京都。
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共 28 条
The clarification of the emission mechanism due to the energy transfer for the dye-doped electroluminescent devices
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批准号:13650352
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.92万
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财政年份:2001
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负责人:NAGATOMO Takao
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依托单位:
Development of Highly Efficient organic Electroluminescent Devices and Improvement of Their Stability
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批准号:09045058
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$1.79万
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财政年份:1997
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负责人:NAGATOMO Takao
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依托单位:
Basic Research on Tin Sulfide(SnS) Thin Film Solar Cells
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批准号:05045034
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$2.56万
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财政年份:1993
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负责人:NAGATOMO Takao
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依托单位:
海外基金