A STUDY ON ELECTRIC CHARGE/LEVEL CHARACTERIZATION DEVICES FOR BIOLOGICAL MATERIALS WITH METAL/MICRO-GAP/SEMICONDUCTOR ARRAYS

金属/微间隙/半导体阵列生物材料电荷/液位表征装置的研究

• 批准号: 22360125
• 负责人: MORITA Mizuho
• 金额: $ 11.81万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2010
• 资助国家: 日本
• 起止时间: 2010-04-01 至 2014-03-31
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-22360125/
• 关键词: シリコン; シリコン酸化膜; 微小空隙; 電荷分析; センシングデバイス

The electrical sensing of deoxyribonucleic acid hybridization by capacitance-voltage measurements of metal/micro-gap/insulator/semiconductor structure devices has been demonstrated. The hybridization of deoxyribonucleic acid has been characterized from the shift of the capacitance-voltage curve for the sensing device. It has been demonstrated that a metal/micro-gap/insulator/semiconductor structure device can distinguish between deoxyribonucleic acid hybridization and un-hybridization. The electrical sensing operation of pure water by capacitance-voltage measurements of a metal/micro-gap/insulator/semiconductor array has been demonstrated.

通过测量金属/微间隙/绝缘体/半导体结构器件的电容-电压，实现了脱氧核糖核酸杂交的电学传感。脱氧核糖核酸的杂交已经从传感装置的电容-电压曲线的移动来表征。已经证明，金属/微间隙/绝缘体/半导体结构器件可以区分脱氧核糖核酸杂交和非杂交。通过金属/微间隙/绝缘体/半导体阵列的电容-电压测量，已经证明了纯水的电传感操作。

项目成果

Non-FET electrochemical DNA detection using metal-gap-oxide-silicon structures

使用金属间隙氧化物硅结构的非 FET 电化学 DNA 检测

• 发表时间: 2012
• 作者: Kentaro Kawai;Yuichi Doi;Takashi Furukawa;Junichi Uchikoshi;Kenta Arima;and Mizuho Morita
• 通讯作者: and Mizuho Morita

Sensing of DNA Solution by Silicon-Oxide-Gap-Oxide-Silicon Structure

通过二氧化硅-间隙-氧化物-硅结构传感 DNA 溶液

• 发表时间: 2010
• 作者: Taiji Kamiya;Ryuta Yamada;Junichi Uchikoshi;Kenta Arima and Mizuho Morita
• 通讯作者: Kenta Arima and Mizuho Morita

Efficient and Scalable Liquid Handling in Micro/Nano-fluidic System for biomedical applications

用于生物医学应用的微/纳米流体系统中的高效且可扩展的液体处理

• 发表时间: 2013
• 作者: Kentaro Kawai;Junichi Uchikoshi;Kenta Arima;and Mizuho Morita
• 通讯作者: and Mizuho Morita

Electrical Characteristics of Metal-Gap-Oxide-Silicon Structures

金属-间隙-氧化物-硅结构的电学特性

• 发表时间: 2011
• 作者: Yuichi Doi;Takashi Furukawa;Kentaro Kawai;Junichi Uchikoshi;Kenta Arima and Mizuho Morita
• 通讯作者: Kenta Arima and Mizuho Morita

Electrical Characteristics of Metal-Gap-Silicon and Metal-Gap-Oxide-Silicon Structures

金属-间隙-硅和金属-间隙-氧化物-硅结构的电学特性

• 发表时间: 2011
• 作者: Takashi Furukawa;Yuuichi Doi;Kentaro Kawai;Junichi Uchikoshi;Kenta Arima and Mizuho Morita
• 通讯作者: Kenta Arima and Mizuho Morita