A Collimated X-Ray Lithography Source Using a Kumakhov Lens

9303184 Piestrup拟议工作的主要目标是建造一个用于生产微集成电路的X射线光刻源原型。使用可用的10千瓦电子束，源将在距离辐射体2米处的6平方厘米范围内提供3-5毫瓦/厘米~2的均匀X射线分布。不带光学元件的跃迁辐射源将在1-4keV的光子能量范围内提供48 mW的X射线功率。此前，我们已经在3m的距离上获得了总功率15.2 mW，功率密度不均匀的1 mW/cm2。X射线的均匀和收集将通过一种新型的X射线毛细管(Kumakhov)光学装置来实现。I相测量和计算机模拟表明，在1到3个关键的光子能量范围内，可以获得良好的X射线透过透镜。现有的大电流加速器、X射线光束线和光学准直器可用于这项工作。过渡X射线光刻系统的性能优于激光等离子体源，并且比同步加速器源便宜得多。***

9303184 Piestrup The primary objective of the proposed work is the construction of a prototype x-ray-lithography source for the production of microintegrated circuits. Using an available 10-kW electron beam the source will deliver a uniform x-ray distribution of 3-5 mW/cm2 over an area of 6 cm2 at a distance of 2 m from the radiator. The transition-radiation source without optics will deliver 48 mW of x-ray power in the 1-4 keV photon energy range. Previously, we have obtained 15.2 mW of total power with a nonuniform power density of 1 mW/Cm2 at a distance of 3m. Uniformity and collection of the x-rays will be accomplished by a novel x-ray capillary (Kumakhov) optic. Phase I measurements and computer simulations show that good x-ray transmission through the lens can be obtained for the 1 to 3 key photon-energy range. An existing high-current accelerator, x-ray beamline and optic aligner are available for this work. A transition-x-ray lithography system promises performance that is superior to laser-plasma sources and is considerably less expensive than synchrotron sources. ***